A Photoemission Study of the Epitaxial Growth of Si on Gap(110)

1987 ◽  
Vol 94 ◽  
Author(s):  
David W. Niles ◽  
Ming Tang ◽  
Hartmut Höchst
Keyword(s):  
Fermi Level ◽  
Epitaxial Growth ◽  
Valence Band ◽  
Surface State ◽  
Photoemission Spectroscopy ◽  
Fermi Level Position ◽  
Ultraviolet Photoemission Spectroscopy ◽  
Photoemission Study ◽  
Valence Band Discontinuity

ABSTRACTWe have used angular resolved ultraviolet photoemission spectroscopy to study the epitaxial growth of Si on GaP(110). Surface state emission obscures the top of the valence band (TVB). The Fermi level for the clean GaP(110) surface is 1.20±0.05eV above the TVB. 1ML (monolayer) of Si pins the Fermi level position at 1.40±0.05eV above the TVB. Further deposition of Si leads to a valence band discontinuity ΔEv=1.07 ±0.10eV.

Photoemission Study of the α-Sn/Cdte(110) Interface Growth

1987 ◽  
Vol 94 ◽  
Author(s):  
Ming Tang ◽  
David W. Niles ◽  
Isaac Hernández-Calderón ◽  
Hartmut Hóchst
Keyword(s):  
Synchrotron Radiation ◽  
Fermi Level ◽  
Valence Band ◽  
Valence Band Maximum ◽  
Photoemission Spectroscopy ◽  
Mbe Growth ◽  
Band Maximum ◽  
Interface Growth ◽  
Interfacial Growth ◽  
Photoemission Study

ABSTRACTAngular Resolved Photoemission Spectroscopy with Synchrotron radiation has been used to study the MBE growth of α-Sn on CdTe(110). Sn grows epitaxially and the Fermi level pins at 0.72eV above the CdTe valence band maximum. Outdiffusion or segregation of Cd in the α-Sn layer is not observed. For small Sn coverages the Sn4d core spectra show a second component which may be due to the initial interfacial growth of SnTe.

Valence band ultraviolet photoemission spectroscopy of Dy/W(100)

Vacuum ◽  
2002 ◽  
Vol 67 (3-4) ◽  
pp. 429-433 ◽  
Author(s):  
N Moslemzadeh ◽  
S.D Barrett ◽  
V.R Dhanak ◽  
G Miller
Keyword(s):  
Valence Band ◽  
Photoemission Spectroscopy ◽  
Ultraviolet Photoemission Spectroscopy

Growth and Characterization of the Binary Defect Alloy Cu2-xSe and the Relation to II–VI/I–III–VI Heterojunction Formation

1995 ◽  
Vol 378 ◽  
Author(s):  
Art J. Nelson ◽  
K. Sinha ◽  
John Moreland
Keyword(s):  
Electronic Structure ◽  
Valence Band ◽  
Photoemission Spectroscopy ◽  
Interfacial Chemistry ◽  
Valence Band Offset ◽  
Force Microscopy ◽  
Atomic Force ◽  
Valence Band Discontinuity

AbstractSynchrotron radiation soft x-ray photoemission spectroscopy was used to investigate the development of the electronic structure at the CdS/Cu2Se heterojunction interface. Cu2−xSe layers were deposited on GaAs (100) by molecular beam epitaxy from Cu2Se sources. Raman spectra reveal a strong peak at 270 cm−1, indicative of the Cu2−xSe phase. Atomic force microscopy reveals uniaxial growth in a preferred (100) orientation. CdS overlayers were then deposited in-situ, at room temperature, in steps on these epilayers. Photoemission measurements were acquired after each growth in order to observe changes in the valence band electronic structure as well as changes in the Se3d and Cd4d core lines. The results were used to correlate the interfacial chemistry with the electronic structure and to directly determine the CdS/Cu2−xSe and heterojunction valence band discontinuity and the consequent heterojunction band diagram. These results are compared to the valence band offset (ΔEv) for the CdS/CuInSe2 heterojunction interface.

Valence-band discontinuity between GaN and AIN measured by x-ray photoemission spectroscopy

1995 ◽  
Vol 24 (4) ◽  
pp. 225-227 ◽  
Author(s):  
G. Martin ◽  
S. Strite ◽  
A. Botchkarev ◽  
A. Agarwal ◽  
A. Rockett ◽  
...  
Keyword(s):  
Valence Band ◽  
Photoemission Spectroscopy ◽  
X Ray ◽  
Valence Band Discontinuity

HETEROJUNCTION BAND DISCONTINUITY CHANGE BY ULTRATHIN INTRALAYER: Na

1993 ◽  
Vol 07 (07) ◽  
pp. 459-464 ◽  
Author(s):  
SHIHONG XU ◽  
XIANMING LIU ◽  
MAOSHENG MA ◽  
JINGSHENG ZHU ◽  
YUHENG ZHANG ◽  
...  
Keyword(s):  
Valence Band ◽  
Photoemission Spectroscopy ◽  
Band Offset ◽  
Valence Band Discontinuity

The changes of band offset of Ge-GaAs(100) heterojunction are observed by means of an ultrathin Na intralayer with the photoemission spectroscopy. 1 ML Na intralayer increases the valence-band discontinuity of Ge-GaAs by 0.19 eV on the average.

Valence‐band discontinuity between GaN and AlN measured by x‐ray photoemission spectroscopy

1994 ◽  
Vol 65 (5) ◽  
pp. 610-612 ◽  
Author(s):  
G. Martin ◽  
S. Strite ◽  
A. Botchkarev ◽  
A. Agarwal ◽  
A. Rockett ◽  
...  
Keyword(s):  
Valence Band ◽  
Photoemission Spectroscopy ◽  
X Ray ◽  
Valence Band Discontinuity

Ultraviolet-photoemission-spectroscopy study of the interaction of atomic hydrogen with cleaved InP: A valence-band contribution

1991 ◽  
Vol 43 (18) ◽  
pp. 14581-14588 ◽  
Author(s):  
F. Proix ◽  
C. A. Sébenne ◽  
B. El Hafsi ◽  
K. Hricovini ◽  
R. Pinchaux ◽  
...  
Keyword(s):  
Valence Band ◽  
Atomic Hydrogen ◽  
Photoemission Spectroscopy ◽  
Spectroscopy Study ◽  
Ultraviolet Photoemission Spectroscopy

scholarly journals Electron Band Alignment at Interfaces of Semiconductors with Insulating Oxides: An Internal Photoemission Study

2014 ◽  
Vol 2014 ◽  
pp. 1-30 ◽  
Author(s):  
Valeri V. Afanas'ev
Keyword(s):  
Valence Band ◽  
High Mobility ◽  
Band Alignment ◽  
Photoemission Spectroscopy ◽  
Light Elements ◽  
Bandgap Width ◽  
Electron Band ◽  
Internal Photoemission ◽  
Wide Gap ◽  
Photoemission Study

Evolution of the electron energy band alignment at interfaces between different semiconductors and wide-gap oxide insulators is examined using the internal photoemission spectroscopy, which is based on observations of optically-induced electron (or hole) transitions across the semiconductor/insulator barrier. Interfaces of various semiconductors ranging from the conventional silicon to the high-mobility Ge-based (Ge,Si1-xGex,Ge1-xSnx) andAIIIBVgroup (GaAs,InxGa1-xAs, InAs, GaP, InP, GaSb, InSb) materials were studied revealing several general trends in the evolution of band offsets. It is found that in the oxides of metals with cation radii larger than≈0.7 Å, the oxide valence band top remains nearly at the same energy (±0.2 eV) irrespective of the cation sort. Using this result, it becomes possible to predict the interface band alignment between oxides and semiconductors as well as between dissimilar insulating oxides on the basis of the oxide bandgap width which are also affected by crystallization. By contrast, oxides of light elements, for example, Be, Mg, Al, Si, and Sc exhibit significant shifts of the valence band top. General trends in band lineup variations caused by a change in the composition of semiconductor photoemission material are also revealed.

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