Electron Injection-Induced Effects in GaN: Physics and Applications

2003 ◽  
Vol 764 ◽  
Author(s):  
Leonid Chernyak ◽  
William Burdett
Keyword(s):  
Carrier Transport ◽  
Minority Carrier ◽  
Minority Carrier Lifetime ◽  
Luminescent Properties ◽  
Electron Injection ◽  
Pronounced Increase ◽  
Minority Carrier Diffusion Length ◽  
Electron Beam Induced Current ◽  
P Type

AbstractElectron injection into p-type GaN and related compounds leads to a pronounced increase in the minority carrier lifetime. This increase is manifested in a multiple-fold elongation of the minority carrier diffusion length as is evident from the Electron Beam Induced Current (EBIC) measurements in-situ in a Scanning Electron Microscope. Minority carrier transport enhancement as a result of electron injection is consistent with the changes observed in the material's luminescent properties. Based on the activation energy for the electron injection-induced effects, we ascribe this phenomenon to charging of Mg-acceptor related levels. In addition, we demonstrate an impact of electron injection on responsivity of GaN p-i-n photodetectors.

Ultrasound Defect Engineering of Transition Metals Via Metal-Acceptor Pairs in Silicon

1995 ◽  
Vol 378 ◽  
Author(s):  
Ronald E. Bell ◽  
Serguei Ostapenko ◽  
Jacek Lagowski
Keyword(s):  
Minority Carrier ◽  
Diffusion Length ◽  
Surface Photovoltage ◽  
Defect Engineering ◽  
Acceptor Reaction ◽  
Minority Carrier Diffusion Length ◽  
Enhanced Diffusion ◽  
Type Silicon ◽  
P Type

AbstractExperimental evidence is provided for ultrasound stimulated dissociation of metal-acceptor pairs in silicon, and also for enhanced diffusion of metal interstitials which may lead to enhanced pairing. The first effect is found dominant in Fe-doped p-type silicon where ultrasound causes low temperature dissociation of Fe-B pairs. This is in contrast to Cr-doped p-type silicon where ultrasound enhances the formation of Cr-B pairs due to enhanced diffusivity of Cr by as much as two orders of magnitude.In this study, the metal-acceptor reaction was monitored in situ via corresponding changes of the minority carrier diffusion length measured by non-contact surface photovoltage. Ultrasound-stimulated pair reaction can be utilized for metal diagnostics for the silicon IC industry. Thus, with ultrasound, Cr-B pairing can be reduced from months to hours, making possible the identification of Cr via pairing kinetics in a reasonable period of time.

Impact of NiSi2 Precipitates Electronic Structure on the Minority Carrier Lifetime in n-and p-Type Silicon

2007 ◽  
Vol 131-133 ◽  
pp. 155-160 ◽  
Author(s):  
M.V. Trushin ◽  
O.F. Vyvenko ◽  
Michael Seibt
Keyword(s):  
Electronic Structure ◽  
Minority Carrier ◽  
Electronic States ◽  
Minority Carrier Lifetime ◽  
Nickel Silicide ◽  
Minority Carrier Diffusion Length ◽  
Carrier Diffusion ◽  
Type Silicon ◽  
L Value ◽  
P Type

Minority carrier diffusion lengths were measured for the set of n- and p-type silicon samples with NiSi2 precipitates of different electronic structure. We found that the type of precipitate electronic states in the upper part of band gap had no influence on the recombination activity of NiSi2 precipitates. Minority carrier diffusion length L was found to be related to the precipitate density N and L ~ 2 × N -1/3 for n-type Si samples and L ~ 1 × N -1/3 for p-Si samples. Hydrogenation of the p-type Si sample with nanoscale nickel silicide precipitates resulted in an increase of the L value up to a factor of 3, while in n-Si L remained practicaly the same. The only hole emission in the samples of both conductivity types was detected in MCTS measurements and the cross section for the hole capture with the electronic states of the precipitaes was estimated to be as large as 10-11 cm-2.

Correlation of Fe-Rich Defect Centre and Minority Carrier Lifetime in p-Type Multicrystalline Silicon

2013 ◽  
Vol 440 ◽  
pp. 82-87 ◽  
Author(s):  
Mohammad Jahangir Alam ◽  
Mohammad Ziaur Rahman
Keyword(s):  
Carrier Lifetime ◽  
Minority Carrier ◽  
Minority Carrier Lifetime ◽  
Multicrystalline Silicon ◽  
Recombination Lifetime ◽  
Spatially Resolved ◽  
Carrier Recombination ◽  
Negative Role ◽  
P Type ◽  
The Impact

A comparative study has been made to analyze the impact of interstitial iron in minority carrier lifetime of multicrystalline silicon (mc-Si). It is shown that iron plays a negative role and is considered very detrimental for minority carrier recombination lifetime. The analytical results of this study are aligned with the spatially resolved imaging analysis of iron rich mc-Si.

Efficient lateral minority carrier transport in proton‐implanted p‐type silicon

1995 ◽  
Vol 67 (1) ◽  
pp. 88-90 ◽  
Author(s):  
D. C. Leung ◽  
P. R. Nelson ◽  
O. M. Stafsudd ◽  
J. B. Parkinson ◽  
G. E. Davis
Keyword(s):  
Carrier Transport ◽  
Minority Carrier ◽  
Type Silicon ◽  
P Type

Resistivity dependence of minority carrier lifetime and cell performance in p-type dendritic web silicon ribbon

2001 ◽  
Vol 45 (12) ◽  
pp. 1973-1978 ◽  
Author(s):  
Mohamed Hilali ◽  
Abasifreke Ebong ◽  
Ajeet Rohatgi ◽  
Daniel L Meier
Keyword(s):  
Carrier Lifetime ◽  
Minority Carrier ◽  
Minority Carrier Lifetime ◽  
Cell Performance ◽  
Silicon Ribbon ◽  
P Type

Improved minority carrier lifetime in p-type GaN segments prepared by vacancy-guided redistribution of Mg

2021 ◽  
Vol 119 (18) ◽  
pp. 182106
Author(s):  
K. Shima ◽  
R. Tanaka ◽  
S. Takashima ◽  
K. Ueno ◽  
M. Edo ◽  
...  
Keyword(s):  
Carrier Lifetime ◽  
Minority Carrier ◽  
Minority Carrier Lifetime ◽  
P Type

Development of High-Performance GaAs Solar Cells on Large-Grain Polycrystalline Ge Substrates

1995 ◽  
Vol 403 ◽  
Author(s):  
R. Venkatasubramanian ◽  
B. O'Quinn ◽  
J. S. Hills ◽  
M. L. Timmons ◽  
D. P. Malta
Keyword(s):  
Solar Cells ◽  
High Performance ◽  
Carrier Lifetime ◽  
Minority Carrier ◽  
Minority Carrier Lifetime ◽  
Cross Sectional ◽  
Plan View ◽  
Electron Beam Induced Current ◽  
Induced Defects

AbstractThe characterization of MOCVD-grown GaAs-AlGaAs materials and GaAs p+n junctions on poly-Ge substrates is presented. Minority carrier lifetime in GaAs-AIGaAs double-hetero (DH) structures grown on these substrates and the variation of lifetimes across different grainstructures are discussed. Minority-carrier diffusion lengths in polycrystalline GaAs p+-n junctions were evaluated by cross-sectional electron-beam induced current (EBIC) scans. The junctions were also studied by plan-view EBIC imaging. Optimization studies of GaAs solar cell on poly-Ge are discussed briefly. The effect of various polycrystalline substrate-induced defects on performance of GaAs solar cells are presented.

The effect of oxide precipitates on minority carrier lifetime in p-type silicon

2011 ◽  
Vol 110 (5) ◽  
pp. 053713 ◽  
Author(s):  
J. D. Murphy ◽  
K. Bothe ◽  
M. Olmo ◽  
V. V. Voronkov ◽  
R. J. Falster
Keyword(s):  
Carrier Lifetime ◽  
Minority Carrier ◽  
Minority Carrier Lifetime ◽  
Type Silicon ◽  
P Type
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