Sem and Aes Analysis of Ion Implanted Graphite
Keyword(s):
ABSTRACTIon-implantation of graphite is characterized with respect to lattice damage and the distribution of implanted ions. Both the depth profile of the implanted ions and of the lattice damage are shown to follow the models previously developed for ion-implanted semiconductors. Auger electron spectroscopy (AES) is used to monitor the implantation profile. The surface damage is examined by scanning electron microscopy (SEM) while microcrystalline regions in an amorphous background are observed by scanning transmission electron microscopy (STEM).
1981 ◽
Vol 39
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pp. 286-287
2002 ◽
Vol 17
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pp. 2929-2934
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1970 ◽
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pp. 6-7
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Vol 38
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pp. 242-245
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Vol 263
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pp. 16954-16962
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