Radiation Effects in Radwaste Glasses : A Reappraisal of Alpha-Recoil Aging as Simulated by Ion Implantation.

1981 ◽  
Vol 6 ◽  
Author(s):  
J.C. Dran ◽  
Y. Langevin ◽  
M. Maurette ◽  
J.C. Petit

ABSTRACTNew results on the etchability of lead implanted silicate glasses are presented which are satisfactorily accounted for by a Monte Carlo Model of etching. These results strongly support the radiation damage origin of the ion-induced modification of the chemical reactivity of glass. Major artefacts of ion implantation are then discarded as possible causes of the observed effects and consequently this technique is shown to be a valuable tool for the study of α-recoil aging in H.L.W. glasses.

2011 ◽  
Vol 414 (3) ◽  
pp. 2215-2228 ◽  
Author(s):  
T. Prod’homme ◽  
A. G. A. Brown ◽  
L. Lindegren ◽  
A. D. T. Short ◽  
S. W. Brown

1983 ◽  
Vol 26 ◽  
Author(s):  
A. M. Ougouag ◽  
A. J. Machiels

ABSTRACTTwo approaches for modeling radiation damage growth are presented and evaluated in the light of existing data. It results that purely geometric and statistical considerations about the distribution and overlap of damage are insufficient for accounting for the differences observed in leaching data from ion implantation and actinide doping experiments. It is shown, however, that the incorporation of effects such as those induced by the proximity of a free surface and the directionality of the irradiation into the kinetics of radiation damage ingrowth has the capability for accounting for the differences.


1998 ◽  
Author(s):  
Dennis J. Gallagher ◽  
Raymond Demara ◽  
Gary Emerson ◽  
Wayne W. Frame ◽  
Alan W. Delamere

1985 ◽  
Vol 8 (7) ◽  
pp. 364-365 ◽  
Author(s):  
J. Sedláček ◽  
L. Nondek

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