Properties of A—Sin:H Films Prepared by Glow Discharge of Si2H6—Nh3 Gas Mixture
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AbstractThe electrical and optical properties of a—SiNx:H films prepared by the glow discharge of Si2H6-NH3 gas mixture have been investigated in a wide range of the molar ratio of NH3 to Si2H6 The maxima of the dark—and the photo—conductivity are observed at the molar ratio of about 10-1. At this molar ratio the deposition rate is about33 Å/sec. The optical gap and the compositional ratio of nitrogen to silicon change smoothly from those of a—Si:H to those of a—Si3N4. It is found that the valency control is possible in a—SiNx:H films prepared at a high deposition rate.
2018 ◽
Vol 937
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pp. 83-87
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2020 ◽
Vol 59
(SF)
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pp. SFFA04
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2006 ◽
Vol 3
(6)
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pp. 1527-1530
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2017 ◽
Vol 29
(4)
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pp. 2860-2867
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