Surface Morphology of LPE SiGe Layers Grown on (100) Si Substrates

1997 ◽  
Vol 485 ◽  
Author(s):  
A. M. Sembian ◽  
I. Silier ◽  
K. Davies ◽  
A. Gutjahr ◽  
K. Lyutovich ◽  
...  
Keyword(s):  
Liquid Phase ◽  
Surface Morphology ◽  
Cooling Rate ◽  
Liquid Phase Epitaxy ◽  
Growth Conditions ◽  
Cooling Rates ◽  
Si Substrates ◽  
Significant Change

AbstractWe have investigated the surface morphology of thick SiGe layers grown on Si(100) substrates. SiGe layers containing different Ge concentrations (from 0 to 16 at.%) and having thickness of about 15μm are prepared by liquid phase epitaxy (LPE) method using various growth conditions. The wavelength of undulation of SiGe layers is found to be increasing when we adopt low cooling rates during LPE process. The roughness of the layer does not show any significant change with cooling rate.

Properties of SiGe Alloys Grown on Si Substrates by Liquid Phase Epitaxy

1987 ◽  
Vol 102 ◽  
Author(s):  
M.I. Alonso ◽  
H.-P. Trah ◽  
E. Bauser ◽  
H. Cerva ◽  
H.P. Strunki
Keyword(s):  
Liquid Phase ◽  
Single Crystal ◽  
Cooling Rate ◽  
Liquid Phase Epitaxy ◽  
Composition Range ◽  
Saturation Temperature ◽  
Entire Composition Range ◽  
Growth Morphology ◽  
Si Substrates

ABSTRACTSi1−zGez single crystal layers were grown on Si(iii) by liquid phase epitaxy (LPE) over the entire composition range (0 ≤ x ( 1). Using Sn as solvent all compositions were produced; alloys with compositions 0 ≤ x ≤ 0.75 were obtained using In as solvent; the range 0.75 ≤ x ≤ 1 was covered with Bi solvent. The solvents used, the composition of the solution, the saturation temperature, and the cooling rate, were found to strongly influence the growth morphology.

TEM study of very thin InGaAsP layers grown by liquid-phase epitaxy

1990 ◽  
Vol 48 (4) ◽  
pp. 672-673
Author(s):  
N.A. Bert ◽  
A.O. Kosogov
Keyword(s):  
Liquid Phase ◽  
Liquid Phase Epitaxy ◽  
Chemical Vapor ◽  
Growth Conditions ◽  
Dark Field ◽  
Organic Chemical ◽  
Simple Liquid ◽  
Cross Sectional ◽  
Conventional Procedure ◽  
Double Heterostructures

The very thin (<100 Å) InGaAsP layers were grown not only by molecular beam epitaxy and metal-organic chemical vapor deposition but recently also by simple liquid phase epitaxy (LPE) technique. Characterization of their thickness, interfase abruptness and lattice defects is important and requires TEM methods to be used.The samples were InGaAsP/InGaP double heterostructures grown on (111)A GaAs substrate. The exact growth conditions are described in Ref.1. The salient points are that the quarternary layers were being grown at 750°C during a fast movement of substrate and a convection caused in the melt by that movement was eliminated. TEM cross-section specimens were prepared by means of conventional procedure. The studies were conducted in EM 420T and JEM 4000EX instruments.The (200) dark-field cross-sectional imaging is the most appropriate TEM technique to distinguish between individual layers in 111-v semiconductor heterostructures.

Silicon layers grown over SiO2 by liquid phase epitaxy: Electron Microscopical study

1990 ◽  
Vol 48 (4) ◽  
pp. 566-567
Author(s):  
F. Banhart ◽  
F.O. Phillipp ◽  
R. Bergmann ◽  
E. Czech ◽  
M. Konuma ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Liquid Phase ◽  
Plasma Etching ◽  
Liquid Phase Epitaxy ◽  
Three Dimensional ◽  
Microscopical Study ◽  
Sample Temperature ◽  
Structural Defects ◽  
Si Substrates ◽  
Etched Surface

Defect-free silicon layers grown on insulators (SOI) are an essential component for future three-dimensional integration of semiconductor devices. Liquid phase epitaxy (LPE) has proved to be a powerful technique to grow high quality SOI structures for devices and for basic physical research. Electron microscopy is indispensable for the development of the growth technique and reveals many interesting structural properties of these materials. Transmission and scanning electron microscopy can be applied to study growth mechanisms, structural defects, and the morphology of Si and SOI layers grown from metallic solutions of various compositions.The treatment of the Si substrates prior to the epitaxial growth described here is wet chemical etching and plasma etching with NF3 ions. At a sample temperature of 20°C the ion etched surface appeared rough (Fig. 1). Plasma etching at a sample temperature of −125°C, however, yields smooth and clean Si surfaces, and, in addition, high anisotropy (small side etching) and selectivity (low etch rate of SiO2) as shown in Fig. 2.

Size, shape, and ordering of SiGe/Si(001) islands grown by means of liquid phase epitaxy under far-nonequilibrium growth conditions

2005 ◽  
Vol 86 (14) ◽  
pp. 142101 ◽  
Author(s):  
M. Hanke ◽  
T. Boeck ◽  
A.-K. Gerlitzke ◽  
F. Syrowatka ◽  
F. Heyroth ◽  
...  
Keyword(s):  
Liquid Phase ◽  
Liquid Phase Epitaxy ◽  
Growth Conditions ◽  
Nonequilibrium Growth

scholarly journals Surface morphology analysis of GaInAsSb films grown by liquid phase epitaxy

2006 ◽  
Vol 36 (3b) ◽  
pp. 1070-1073 ◽  
Author(s):  
L. Tirado-Mejía ◽  
J. G. Ramírez ◽  
M. E. Gómez ◽  
H. Ariza-Calderón
Keyword(s):  
Liquid Phase ◽  
Surface Morphology ◽  
Liquid Phase Epitaxy ◽  
Morphology Analysis

Growth Peculiarities and Magnetic Properties of (LuBi)3Fe5O12 Films by LPE Method

2013 ◽  
Vol 200 ◽  
pp. 256-260 ◽  
Author(s):  
I.I. Syvorotka ◽  
Igor M. Syvorotka ◽  
S.B. Ubizskii
Keyword(s):  
Magnetic Properties ◽  
Liquid Phase ◽  
Surface Morphology ◽  
Film Thickness ◽  
Faraday Rotation ◽  
Liquid Phase Epitaxy ◽  
Magnetization Reversal ◽  
Room Temperature ◽  
Mirror Surface ◽  
Different Types

The series of (LuBi)3Fe5O12 film were grown on (111) oriented GGG substrate with diameters 1, 2 and 3 inch by liquid phase epitaxy using Bi2O3-base flux. Different types of surface morphology on the grown films were observed. The films’ surface was smooth and mirror while the film thickness was less than 13 μm and becomes rough for thickness above this value. The grown films were characterized by measuring magnetization loops and magneto-optic Faraday rotation under magnetization reversal as well as ferromagnetic resonance (FMR). All films with mirror surface demonstrate the in-plane magnetization, high Faraday rotation and FMR linewidth about 0.8 Oe at 9.1 GHz and room temperature.

Effects of growth temperature on the surface morphology of silicon thin films on (111) silicon monocrystalline substrate by liquid phase epitaxy

2004 ◽  
Vol 266 (4) ◽  
pp. 467-474 ◽  
Author(s):  
Toru Ujihara ◽  
Eiji Kanda ◽  
Kazuo Obara ◽  
Kozo Fujiwara ◽  
Noritaka Usami ◽  
...  
Keyword(s):  
Thin Films ◽  
Liquid Phase ◽  
Surface Morphology ◽  
Liquid Phase Epitaxy ◽  
Growth Temperature ◽  
Silicon Thin Films

On the Polytypic Transformations in SiC

2012 ◽  
Vol 18-19 ◽  
pp. 89-96
Author(s):  
Maya Marinova ◽  
Alkyoni Mantzari ◽  
Ariadne Andreadou ◽  
Efstathios K. Polychroniadis
Keyword(s):  
Liquid Phase ◽  
Liquid Phase Epitaxy ◽  
Growth Conditions ◽  
Small Energy ◽  
Long Period ◽  
Stacking Order

In the present work we report on the polytypic transformations taking place in nanoscale dimensions within 6H-SiC crystals. The examined crystals were grown by Liquid Phase Epitaxy using a mixture of Si and Al as solvents. The study concentrated on the differences from the “correct” stacking order of the Si-C bilayers for 6H-SiC leading to the formation of other polytypes. A great variety of sequences was found, which resulted to the appearance of rare short and long period polytypes or individual lamellae having their “own” stacking inside the 6H-SiC matrix. These nanostructured faults which deteriorate the quality of the grown material indicate also their “sensitivity” to any small or even infinitesimal change of the growth conditions, due to the very small energy among them.

Liquid Phase Epitaxial Growth and Characterization of GaAs on InP Substrates

1994 ◽  
Vol 340 ◽  
Author(s):  
Dong-Keun Kim ◽  
Hyung-Jong Lee ◽  
Byung-Teak Lee
Keyword(s):  
Liquid Phase ◽  
Surface Morphology ◽  
Growth Conditions ◽  
Gaas Layer ◽  
Misfit Dislocations ◽  
Double Crystal ◽  
Transmission Electron ◽  
Grating Region ◽  
Inp Substrates ◽  
Undoped Gaas

ABSTRACTOptimum growth conditions were investigated to obtain high quality heteroepitaxial GaAs layers on InP substrates by liquid phase epitaxy (LPE). Addition of about 0.005wt% of Se to the Ga growth melt effectively suppressed dissolution of the InP substrates into the melt during the initial stage of the growth, resulting in a significantly improved surface morphology. The crystallinity and the surface morphology could be further improved by growing undoped GaAs layers on thin Se-doped buffer GaAs as well as using InP substrates patterned with grating structure. The transmission electron microscopy observation indicated that the misfit dislocations interact with each other at the grating region, resulting in a lower dislocation density in the upper GaAs layer. The (400) double crystal X-ray diffraction peaks of the undoped GaAs showed fullwidth- at-half-maximum of about 380 arcsec, which is comparable with the previously reported values using more sophisticated growth techniques.

On the Nanostructure of SiC

2010 ◽  
Vol 12 ◽  
pp. 99-104
Author(s):  
Maya Marinova ◽  
Efstathios K. Polychroniadis
Keyword(s):  
Silicon Carbide ◽  
Liquid Phase ◽  
Structural Properties ◽  
Liquid Phase Epitaxy ◽  
Stacking Faults ◽  
Growth Conditions ◽  
Small Energy ◽  
Long Period ◽  
Stacking Order

The present work deals with the structural properties of silicon carbide in nanoscale dimensions. The examined crystals were 6H-SiC grown by Liquid Phase Epitaxy. The study was concentrated on the stacking faults and any other differences from the “correct” stacking order of the Si-C bilayers for this polytype. Three main types of stacking faults were observed: (i) Cubic lamellae with thickness of four and two Si-C bilayers, always occurring in reverse stacking with respect to each other and separated by at least one unit cell of 6H-SiC; (ii) “twinned” 6H-SiC lamellae separated by a two-bilayer thick cubic inclusion. As a result the sequence in the “twinned” 6H-SiC changes from (3+3-) to (3-3+). (iii) Lamellae showing fringes, the interrelated distance of which suggests inclusion with sequence (22). Further, a high variety of sequences was found, leading to the appearance of rare long period polytypes or individual lamellae having their “own” stacking inside the 6H-SiC matrix. These nanostructured faults which deteriorate the quality of the grown material indicate also their “sensitivity” to any small or even infinitesimal change of the growth conditions, due to the very small energy among them.

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