Optical Behavior of Sputter-Deposited Aluminum Nitride: Relationship to Film Cheiistry

1985 ◽  
Vol 47 ◽  
Author(s):  
C. J. G. Kubiak ◽  
C. R. Aita ◽  
F. S. Hickernell ◽  
S. J. Joseph
Keyword(s):  
Aluminum Nitride ◽  
Sputter Deposition ◽  
Aluminum Target ◽  
Reactive Sputter Deposition ◽  
Sputter Deposited ◽  
Excited Nitrogen ◽  
Amorphous Quartz ◽  
Quartz Substrates ◽  
Optical Behavior

ABSTRACTFilms which are nominally aluminum nitride were grown by reactive sputter deposition using an aluminum target and rf-excited nitrogen discharges operated at power levels from 100 to 800W. Depositions were made on water-cooled (111)-cut Si and amorphous quartz substrates. The optical behavior of these films and its relationship to chemistry is discussed in the present paper.

Phase Mapping Sputter Deposited Wide Band-Gap Metal Oxides

1992 ◽  
Vol 242 ◽  
Author(s):  
C.R. Aita ◽  
R.C. Lee ◽  
C.-K. Kwok ◽  
E.A. Kolawa
Keyword(s):  
Metal Oxides ◽  
Band Gap ◽  
Wide Band ◽  
Oxide Phase ◽  
Deposition Process ◽  
Sputter Deposition ◽  
Wide Band Gap ◽  
Growth Environment ◽  
Reactive Sputter Deposition ◽  
Sputter Deposited

ABSTRACTReactive sputter deposition is a widely-used process for growing films of high melting point materials near room temperature and desirable metastable structures not attainable in material grown under conditions of thermodynamic equilibrium. Both categories include wide band-gap metal oxides. A first step towards reproducible growth is to develop a “phase map” for the metal-oxygen system of interest. The map graphically relates independent sputter deposition process parameters, the growth environment, and the metallurgical phase(s) formed in the film. This paper shows how phase maps are constructed and used to observe general trends in oxide phase formation sequence, with examples from the Nb-O, Y-O, and Zr-O systems.

Measurement of intrinsic stresses during growth of aluminum nitride thin films by reactive sputter deposition

1993 ◽  
Vol 74 (4) ◽  
pp. 2411-2414 ◽  
Author(s):  
W. J. Meng ◽  
J. A. Sell ◽  
G. L. Eesley ◽  
T. A. Perry
Keyword(s):  
Thin Films ◽  
Aluminum Nitride ◽  
Sputter Deposition ◽  
Reactive Sputter Deposition

Dielectric Tensor Characterization for Overcoated Amorphous TbFe Alloys

1986 ◽  
Vol 80 ◽  
Author(s):  
M. Ruane ◽  
A. Jain ◽  
R. Rosenvold ◽  
M. Mansuripur
Keyword(s):  
Protective Layer ◽  
Estimation Algorithm ◽  
Optical Signal ◽  
Dielectric Tensor ◽  
Amorphous Thin Films ◽  
Sputter Deposited ◽  
Reflectivity Data ◽  
Quartz Substrates ◽  
Optical Behavior ◽  
Made In

AbstractAmorphous thin films of TbFe. sputter-deposited on quartz substrates with compositions supporting polar Kerr magneto-optical behavior, and overcoated with a transparent protective layer, are studied to determine their dielectric tensor elements. Refleetivity measurements over a range of angles of incidence are made in an apparatus that corrects for the overcoat layer and exploits magnetization reversal to enhance the measurement of r⊥, the complex reflectivity associated with the magneto-optical signal. Conventional Fresnel reflectivities are also found. The theoretical model for reflectivities from a thick film magneto-optical medium at oblique incidenci is developed and used within a Levenberg-Marquardt nonlinear estimation algorithm to estimate sequentially the dielectric tensor elements, considering their widely varying magnitudes and sensitivities to errors in reflectivity data. The interpretation of the dielectric elements in terms of magneto-optical performance and structural perpendicular anisotropy is discussed.

scholarly journals Effects of Alloying Elements on the Corrosion Behavior of Sputter–deposited Zr–(12–21)Cr–W Alloys in 0.5 M NaCl Solution

1970 ◽  
Vol 25 ◽  
pp. 75-82
Author(s):  
Basu Ram Aryal ◽  
Jagadeesh Bhattarai
Keyword(s):  
Corrosion Test ◽  
Open Circuit Potential ◽  
Chemical Society ◽  
Open Circuit ◽  
Sputter Deposition ◽  
Nacl Solution ◽  
Corrosion Rates ◽  
Sputter Deposited ◽  
Stable Passivity ◽  
Zirconium Metal

The synergistic effect of the simultaneous additions of tungsten and zirconium in thesputter-deposited amorphous or nanocrystalline Zr-(12-21)Cr-W alloys is studied in 0.5 MNaCl solution open to air at 25°C using corrosion tests and open circuit potentialmeasurements. Corrosion rates of the sputter-deposited Zr-(12-21)Cr-W alloys containing10-80 at % tungsten (that is, 0.95-1.85 x 10-2 mm.y-1) are more than one order of magnitudelower than that of the sputter-deposited tungsten and even lower than those of zirconium aswell as chromium in 0.5 M NaCl solution. The addition of 8-73 at % zirconium content inthe sputter-deposited binary W-(12-21)Cr alloys seems to be more effective to improve thecorrosion-resistant properties of the sputter-deposited ternary Zr-Cr-W alloys containing12-21 at % chromium in 0.5 M NaCl solution. The sputter-deposited Zr-(17-21)Cr-W alloyscontaining an adequate amounts of zirconium metal showed the more stable passivity andshowed higher corrosion resistance than those of alloy-constituting elements in 0.5 M NaClsolution open to air at 25°C.Keywords: Zr-(12-21)Cr-W alloys, sputter deposition, corrosion test, open circuit potential,0.5 M NaCl.DOI:  10.3126/jncs.v25i0.3305Journal of Nepal Chemical Society Volume 25, 2010 pp 75-82

scholarly journals Sputter Deposited Metal Layers Embedded in Composites—From Fundamentals to Applications

Coatings ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 190
Author(s):  
Florian Cougnon ◽  
Mathias Kersemans ◽  
Wim Van Paepegem ◽  
Diederik Depla
Keyword(s):  
Thin Films ◽  
Heat Flux ◽  
Sputter Deposition ◽  
Image Correlation ◽  
Fiber Reinforced Polymers ◽  
Thermal Probe ◽  
Reinforced Polymers ◽  
Magnetron Sputter Deposition ◽  
Sputter Deposited ◽  
Metal Layers

Due to the low heat flux towards the substrate, magnetron sputter deposition offers the possibility to deposit thin films on heat sensitive materials such as fiber-reinforced polymers, also known as composite materials. Passive thermal probe measurements during the sputter deposition of metal layers show indeed that the temperature increase remains well below 25 °C for film thicknesses up to 600 nm. The latter thickness threshold is based on the influence of embedded metal films on the adhesion of the composite plies. Films thicker than this threshold deteriorate the mechanical integrity of the composite. The introduction of the uncured composite in the vacuum chamber strongly affects the base pressure by outgassing of impurities from the composite. The impurities affect the film properties as illustrated by their impact on the Seebeck coefficient of sputter deposited thermocouples. The restrictions to embed thin films in composites, as illustrated by both the heat flux measurements, and the study on the influence of impurities, are however not insurmountable. The possibility to use embedded thin films will be briefly demonstrated in different applications such as digital volume image correlation, thermocouples, and de-icing.

scholarly journals Stable Cu2O Photoelectrodes by Reactive Ion Beam Sputter Deposition

2018 ◽  
Vol 2018 ◽  
pp. 1-7
Author(s):  
Ching-Hsiu Chen ◽  
Assamen Ayalew Ejigu ◽  
Liang-Chiun Chao
Keyword(s):  
Electrode Materials ◽  
Variable Temperature ◽  
Ion Beam ◽  
Sputter Deposition ◽  
Flow Rates ◽  
Vacancy Defects ◽  
Photoluminescence Study ◽  
P Type ◽  
Quartz Substrates ◽  
Ion Beam Sputter Deposition

Cu2O has been deposited on quartz substrates by reactive ion beam sputter deposition. Experimental results show that by controlling argon/oxygen flow rates, both n-type and p-type Cu2O samples can be achieved. The bandgap of n-type and p-type Cu2O were found to be 2.3 and 2.5 eV, respectively. The variable temperature photoluminescence study shows that the n-type conductivity is due to the presence of oxygen vacancy defects. Both samples show stable photocurrent response that photocurrent change of both samples after 1,000 seconds of operation is less than 5%. Carrier densities were found to be 1.90 × 1018 and 2.24 × 1016 cm−3 for n-type and p-type Cu2O, respectively. Fermi energies have been calculated, and simplified band structures are constructed. Our results show that Cu2O is a plausible candidate for both photoanodic and photocathodic electrode materials in photoelectrochemical application.

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