Optical behavior near the fundamental absorption edge of sputter‐deposited microcrystalline aluminum nitride

1989 ◽  
Vol 66 (9) ◽  
pp. 4360-4363 ◽  
Author(s):  
C. R. Aita ◽  
C. J. G. Kubiak ◽  
F. Y. H. Shih
Keyword(s):  
Aluminum Nitride ◽  
Absorption Edge ◽  
Fundamental Absorption Edge ◽  
Sputter Deposited ◽  
Optical Behavior

Optical Behavior of Sputter-Deposited Aluminum Nitride: Relationship to Film Cheiistry

1985 ◽  
Vol 47 ◽  
Author(s):  
C. J. G. Kubiak ◽  
C. R. Aita ◽  
F. S. Hickernell ◽  
S. J. Joseph
Keyword(s):  
Aluminum Nitride ◽  
Sputter Deposition ◽  
Aluminum Target ◽  
Reactive Sputter Deposition ◽  
Sputter Deposited ◽  
Excited Nitrogen ◽  
Amorphous Quartz ◽  
Quartz Substrates ◽  
Optical Behavior

ABSTRACTFilms which are nominally aluminum nitride were grown by reactive sputter deposition using an aluminum target and rf-excited nitrogen discharges operated at power levels from 100 to 800W. Depositions were made on water-cooled (111)-cut Si and amorphous quartz substrates. The optical behavior of these films and its relationship to chemistry is discussed in the present paper.

Optical Constants of GaSe at the Fundamental Absorption Edge

1977 ◽  
Vol 81 (2) ◽  
pp. 665-670 ◽  
Author(s):  
G. Antonioli ◽  
D. Bianchi ◽  
V. Canevari ◽  
U. Emiliani ◽  
P. Podini
Keyword(s):  
Absorption Edge ◽  
Optical Constants ◽  
Fundamental Absorption Edge

Nonlinear light absorption in GaSe crystals at the fundamental absorption edge

1996 ◽  
Vol 6 (1-2) ◽  
pp. 117-120 ◽  
Author(s):  
M. Kalafi ◽  
H. Bidadi ◽  
H. Tajalli ◽  
V. Salmanov
Keyword(s):  
Absorption Edge ◽  
Light Absorption ◽  
Fundamental Absorption Edge

Spectroscopy of Zinc Oxide Thin Films near the Fundamental Absorption Edge

2021 ◽  
Author(s):  
V. T. Avanesyan ◽  
P. S. Provotorov ◽  
V. M. Stozharov ◽  
M. M. Sychev ◽  
A. A. Eruzin
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Absorption Edge ◽  
Fundamental Absorption Edge ◽  
Oxide Thin Films
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