Reactive sputter deposition of zirconium nitride/aluminum nitride multilayers: Chemical competition effects and structural characterizations

1991 ◽  
Vol 9 (4) ◽  
pp. 2183-2190 ◽  
Author(s):  
W. J. Meng ◽  
J. A. Sell ◽  
R. A. Waldo
Keyword(s):  
Aluminum Nitride ◽  
Sputter Deposition ◽  
Zirconium Nitride ◽  
Reactive Sputter Deposition ◽  
Competition Effects ◽  
Structural Characterizations

Optical Behavior of Sputter-Deposited Aluminum Nitride: Relationship to Film Cheiistry

1985 ◽  
Vol 47 ◽  
Author(s):  
C. J. G. Kubiak ◽  
C. R. Aita ◽  
F. S. Hickernell ◽  
S. J. Joseph
Keyword(s):  
Aluminum Nitride ◽  
Sputter Deposition ◽  
Aluminum Target ◽  
Reactive Sputter Deposition ◽  
Sputter Deposited ◽  
Excited Nitrogen ◽  
Amorphous Quartz ◽  
Quartz Substrates ◽  
Optical Behavior

ABSTRACTFilms which are nominally aluminum nitride were grown by reactive sputter deposition using an aluminum target and rf-excited nitrogen discharges operated at power levels from 100 to 800W. Depositions were made on water-cooled (111)-cut Si and amorphous quartz substrates. The optical behavior of these films and its relationship to chemistry is discussed in the present paper.

Measurement of intrinsic stresses during growth of aluminum nitride thin films by reactive sputter deposition

1993 ◽  
Vol 74 (4) ◽  
pp. 2411-2414 ◽  
Author(s):  
W. J. Meng ◽  
J. A. Sell ◽  
G. L. Eesley ◽  
T. A. Perry
Keyword(s):  
Thin Films ◽  
Aluminum Nitride ◽  
Sputter Deposition ◽  
Reactive Sputter Deposition

Reactive sputter deposition of titanium dioxide

2000 ◽  
Vol 360 (1-2) ◽  
pp. 122-127 ◽  
Author(s):  
Rand Dannenberg ◽  
Phil Greene
Keyword(s):  
Titanium Dioxide ◽  
Sputter Deposition ◽  
Reactive Sputter Deposition
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