Local Vibrational Mode Spectroscopy of Impurities in Semiconductors

1985 ◽  
Vol 46 ◽  
Author(s):  
R. C. Newman

AbstractInfrared band—mode and LVM absorption is illustrated for a range of impurities and impurity—complexes in silicon and gallium arsenide. We discuss the effects of changes in the local force constants and contributions to the dipole moment resulting from displacements of host lattice atoms. The difficulties in establishing absolute calibrations relating the strength of the absorption to the concentration of defects are highlighted. Our purpose is to show how the measurements lead to characterization of crystals and how they complement other diagnostic techniques to evaluate effects of irradiation, heat treatments, diffusions etc.

2015 ◽  
Vol 62 ◽  
pp. 447-459
Author(s):  
Bruce A. Joyce

Ronald Charles (Ron) Newman was one of the most versatile semiconductor physicists of his generation and is distinguished for his work in several different areas, most notably epitaxial growth and the behaviour of impurities and dopants in a range of device-related materials, mainly silicon and gallium arsenide. His most significant contributions came from the application of local vibrational-mode spectroscopy to studies of the segregation and diffusion of oxygen and hydrogen in silicon. The results were of fundamental importance in the fabrication of integrated circuits.


1989 ◽  
Vol 54 (15) ◽  
pp. 1442-1444 ◽  
Author(s):  
J. Schneider ◽  
B. Dischler ◽  
H. Seelewind ◽  
P. M. Mooney ◽  
J. Lagowski ◽  
...  

1991 ◽  
Vol 69 (2) ◽  
pp. 971-974 ◽  
Author(s):  
J. Wagner ◽  
M. Maier ◽  
R. Murray ◽  
R. C. Newman ◽  
R. B. Beall ◽  
...  

1999 ◽  
Vol 33 (11) ◽  
pp. 1163-1165 ◽  
Author(s):  
A. A. Klechko ◽  
V. V. Litvinov ◽  
V. P. Markevich ◽  
L. I. Murin

2006 ◽  
Vol 957 ◽  
Author(s):  
Esther Alarcon-Llado ◽  
Ramon Cusco ◽  
Luis Artus ◽  
German Gonzalez-Diaz ◽  
Ignacio Martil ◽  
...  

ABSTRACTIn this work we investigate the lattice damage induced in ZnO implanted with potential group V acceptors by means of Raman scattering. ZnO samples were implanted with N and P to high doses and Raman spectra were obtained prior and after rapid thermal annealing (RTA). Characteristic disorder-activated modes are observed in the spectra that can be used to assess the degree of lattice damage. ZnO samples were also implanted with native Zn+ and O+ ions under similar conditions to study specific effects of implantation with N+ and P+. As revealed by the intensity of disorder-activated bands, the implantation induced lattice damage is considerably higher for Zn+ than for the lighter O+ ion. In samples implanted with N+ additional Raman peaks emerge that are not observed either in the samples implanted with the native Zn+ and O+ ions or in the samples implanted with P+, thus pointing to a local vibrational mode of N or a N complex as the origin of these modes. Disorder-activated features are fully removed by RTA, indicating a high degree of lattice recovery by RTA even for the heavily damaged ZnO samples implanted with Zn+.


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