Compliant Substrates for Reduction of Strain Relief in Mismatched Overlayers

1996 ◽  
Vol 441 ◽  
Author(s):  
Carrie Carter-Coman ◽  
Robert Bicknell-Tassius ◽  
April S. Brown ◽  
Nan Marie Jokerst

AbstractThin film compliant substrates can be used to extend the critical thickness in mismatched overlayers. A metastability model has been coupled with recent experimental strain relief data to determine the critical thickness of InGaAs epilayers grown on GaAs compliant substrates of variable thickness. The results of this model are also compared to other compliant substrate critical thickness models.

1997 ◽  
Vol 71 (10) ◽  
pp. 1344-1346 ◽  
Author(s):  
Carrie Carter-Coman ◽  
Robert Bicknell-Tassius ◽  
April S. Brown ◽  
Nan Marie Jokerst

2013 ◽  
Vol 60 (7) ◽  
pp. 2338-2345 ◽  
Author(s):  
Yung-Yu Hsu ◽  
Kylie Lucas ◽  
Dan Davis ◽  
Brian Elolampi ◽  
Roozbeh Ghaffari ◽  
...  

Nanoscale ◽  
2019 ◽  
Vol 11 (8) ◽  
pp. 3748-3756
Author(s):  
Ailton J. Garcia Jr. ◽  
Leonarde N. Rodrigues ◽  
Saimon Filipe Covre da Silva ◽  
Sergio L. Morelhão ◽  
Odilon D. D. Couto Jr. ◽  
...  

Overcoming the critical thickness limit in pseudomorphic growth of lattice mismatched heterostructures is a fundamental challenge in heteroepitaxy.


2013 ◽  
Vol 14 (6) ◽  
pp. 1636-1642 ◽  
Author(s):  
Haosheng Wu ◽  
Stephen Kustra ◽  
Evan M. Gates ◽  
Christopher J. Bettinger

Sign in / Sign up

Export Citation Format

Share Document