Ultrasmooth, Conducting Films Composed of Mo/Si Multilayers

1995 ◽  
Vol 403 ◽  
Author(s):  
D. G. Stearns ◽  
S. L. Baker ◽  
M. A. Wall
Keyword(s):  
Electron Transport ◽  
Magnetron Sputtering ◽  
Layer Thickness ◽  
Multilayer Films

AbstractWe investigate the variation of microstructure and electron transport with layer thickness in Mo/Si multilayer films deposited by magnetron sputtering.

Modulation Structure and Superhardness Effect of VC/TiN Nano-Multilayer Films

2012 ◽  
Vol 184-185 ◽  
pp. 1080-1083
Author(s):  
Jian Ling Yue ◽  
Wei Shi ◽  
Ge Yang Li
Keyword(s):  
Elastic Modulus ◽  
Magnetron Sputtering ◽  
Layer Thickness ◽  
Coherent Structure ◽  
Multilayer Films ◽  
Critical Layer ◽  
Maximum Hardness ◽  
Critical Layer Thickness ◽  
The Relationship

A series of VC/TiN nano-multilayer films with various TiN layer thicknesses were synthesized by magnetron sputtering method. The relationship between the modulation structure and superhardness effect of the multilayer films were investigated. The results reveal that TiN below a critical layer thickness grows coherently with VC layers in multilayers. Correspondingly, the hardness and elastic modulus of the multilayers increase significantly. The maximum hardness and modulus achieved in these multilayers is 40.7GPa and 328GPa.With further increase in the TiN layer thickness, coherent structure of multilayers are destroyed, resulting in a remarkable decrease of hardness and modulus. The superhardness effect of multilayers is related to the three directional strains generated from the coherent structure.

Microstructure, Mechanical Properties and Thermal Stability of TiAlN/Si3N4 Nano-Multilayer Films Deposited by Reactive Magnetron Sputtering

2009 ◽  
Vol 79-82 ◽  
pp. 489-492
Author(s):  
Jiang Ling Yue ◽  
Yan Sheng Yin ◽  
Ge Yang Li
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Layer Thickness ◽  
Multilayer Films ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si3n4 Layer ◽  
Superlattice Structure

A series of TiAlN/Si3N4 nano-multilayer films with various Si3N4 layer thicknesses were prepared by reactive magnetron sputtering. These multilayers were then annealed at temperatures ranging from 600 to 900°C in air for 1 hour. The composition, microstructure, and mechanical properties of the films were characterized by energy dispersive x-ray spectroscopy, x-ray diffraction, scanning electron microscopy, and nanoindentation. It reveals that under the template effect of TiAlN layers in multilayers, as-deposited amorphous Si3N4 is crystallized and grows coherently with TiAlN layers when Si3N4 layer thickness is below 0.6 nm. Correspondingly, the hardness and elastic modulus of the multilayers increase significantly. With further increase in the layer thickness, Si3N4 transforms into amorphous, resulting in a decrease of hardness and modulus. The TiAlN/Si3N4 nano-multilayers could retain their superlattice structure even up to 900°C. The small decrease in the hardness of multilayers annealed below 800°C was correlated to the release of compressive stress in multilayers. However, oxidation was found on the surface of multilayers when annealed at 800°C, which resulted in a marked decrease in the hardness of multilayers. The multilayers presented higher hardness as compared with the monolithic TiAlN film.

scholarly journals Recent Studies on the Fabrication of Multilayer Films by Magnetron Sputtering and Their Irradiation Behaviors

Coatings ◽  
2021 ◽  
Vol 11 (12) ◽  
pp. 1468
Author(s):  
Jinyang Ni ◽  
Jin Li ◽  
Jie Jian ◽  
Jianchao He ◽  
Hongsheng Chen ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Layer Thickness ◽  
Microstructure Evolution ◽  
Deposition Temperature ◽  
Multilayer Films ◽  
Individual Layer ◽  
Substrate Distance ◽  
Deposition Parameters ◽  
Temperature Rate ◽  
Irradiation Behavior

Multilayer films with high-density layer interfaces have been studied widely because of the unique mechanical and functional properties. Magnetron sputtering is widely chosen to fabricate multilayer films because of the convenience in controlling the microstructure. Essentially, the properties of multilayer films are decided by the microstructure, which could be adjusted by manipulating the deposition parameters, such as deposition temperature, rate, bias, and target–substrate distance, during the sputter process. In this review, the influences of the deposition parameters on the microstructure evolution of the multilayer films have been summarized. Additionally, the impacts of individual layer thickness on the microstructure evolution as well as the irradiation behavior of various multilayer films have been discussed.

Synthesis of Nanocomposite thin film Ti/Al Multilayers and Ti-Aluminides

1996 ◽  
Vol 457 ◽  
Author(s):  
R. Banerjee ◽  
X. D. Zhang ◽  
S. A. Dregia ◽  
H. L. Fraser
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Layer Thickness ◽  
Thermodynamic Model ◽  
Interfacial Reactions ◽  
Experimental Results ◽  
Structural Transitions ◽  
Nanocomposite Thin Film ◽  
Multilayered Thin Films

ABSTRACTNanocomposite Ti/Al multilayered thin films have been deposited by magnetron sputtering. These multilayers exhibit interesting structural transitions on reducing the layer thickness of both Ti and Al. Ti transforms from its bulk stable hep structure to fee and Al transforms from fee to hep. The effect of ratio of Ti layer thickness to Al layer thickness on the structural transitions has been investigated for a constant bilayer periodicity of 10 nm by considering three different multilayers: 7.5 nm Ti / 2.5 nm Al, 5 nm Ti / 5 nm Al and 2.5 nm Ti / 7.5 nm Al. The experimental results have been qualitatively explained on the basis of a thermodynamic model. Preliminary experimental results of interfacial reactions in Ti/Al bilayers resulting in the formation of Ti-aluminides are also presented in the paper.

Round-robin test for the measurement of layer thickness of multilayer films by secondary ion mass spectrometry depth profiling

2017 ◽  
Vol 49 (11) ◽  
pp. 1057-1063 ◽  
Author(s):  
Kyung Joong Kim ◽  
Jong Shik Jang ◽  
Joe Bennett ◽  
David Simons ◽  
Mario Barozzi ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Layer Thickness ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Multilayer Films ◽  
Round Robin ◽  
Round Robin Test ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

Effects of ZnO layer on anisotropy magnetoresistance of Ni81Fe19 films

2014 ◽  
Vol 28 (06) ◽  
pp. 1450043 ◽  
Author(s):  
Shuyun Wang ◽  
Yuanmei Gao ◽  
Tiejun Gao ◽  
Yuan He ◽  
Hui Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Layer Thickness ◽  
Magnetic Thin Films ◽  
Anisotropic Magnetoresistance ◽  
Experimental Conditions ◽  
Method Effects ◽  
20 Nm

A series of Ta (4 nm)/ ZnO (t nm )/ Ni 81 Fe 19 (20 nm)/ ZnO (t nm )/ Ta (3 nm) magnetic thin films were prepared on lower experimental conditions by magnetron sputtering method. Effects of ZnO layer thickness and substrate temperature on anisotropic magnetoresistance and magnetic properties of these Ni 81 Fe 19 films have been investigated. The experiment results show that the anisotropic magnetoresistance value of the Ni 81 Fe 19 film is enhanced with the increasing of the inserted ZnO layer thickness. When the ZnO thickness is 2 nm, the anisotropic magnetoresistance value achieves the maximum. In addition, the anisotropic magnetoresistance of the Ni 81 Fe 19 film is also enhanced with the increasing of substrate temperature, and when the temperature is 450°C, the anisotropic magnetoresistance reaches the maximum. The anisotropic magnetoresistance value of 20 nm Ni 81 Fe 19 films with 2 nm ZnO layer can achieve 3.63% at 450°C which is enhanced 11.6% compare with the films without ZnO layer.

Exchange Spring Type Magnet Realized in FePt/Fe Multilayers Deposited by Magnetron Sputtering

2005 ◽  
Vol 872 ◽  
Author(s):  
Yousong Gu ◽  
Dayong Zhang ◽  
Xiaoyuan Zhan ◽  
Zhen Ji ◽  
Xiaolan Zhen ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Magnetron Sputtering ◽  
Layer Thickness ◽  
Lattice Constants ◽  
Si Substrates ◽  
Energy Product ◽  
Layer Deposition ◽  
Different Temperatures ◽  
Spring Type ◽  
Type Magnet

AbstractSeries of FePt/Fe multilayers with different layer thicknesses have been deposited on Si substrates by magnetron sputtering and post annealing at different temperatures and durations. The structure, surface morphology, composition, and magnetic properties of the deposited films have been characterized by XRD, SEM, EDX and VSM. It is found that after annealing at temperatures above 500°C, FePt phase undergoes a phase transition from disorder fcc into ordered fct structure, and become a hard magnetic phase. For [FePt/Fe]n multilayer with varying Fe layer thickness, lattice constants and grain sizes change with Fe layer thickness and annealing temperature. The coercivities of [FePt/Fe]n multilayers decrease with Fe layer deposition time, and the energy product (BH)max shows a maximum with Fe layer thickness. Optimization on layer thickness leads a high (BxH)max value of 15.2MGOe for [FePt(8min)/Fe(4min)]8. The effects of quick annealing and Ag underlayer on the structure and magnetic properties were also studied.

Dependence of Hot Electron Transport on Base Layer Thickness of Magnetic Tunnel Transistor

2004 ◽  
Vol 43 (5A) ◽  
pp. 2479-2483 ◽  
Author(s):  
Takakazu Hirose ◽  
Yuji Fujiwara ◽  
Mutsuko Jimbo ◽  
Tadashi Kobayashi ◽  
Shigeru Shiomi ◽  
...  
Keyword(s):  
Electron Transport ◽  
Layer Thickness ◽  
Base Layer ◽  
Hot Electron ◽  
Tunnel Transistor ◽  
Hot Electron Transport
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