Structural Characterization of Ion Beam Synthesized Epitaxial ErSi2-x Layers

1995 ◽  
Vol 402 ◽  
Author(s):  
H. Bender ◽  
M. F. Wu ◽  
A. Vantomme ◽  
H. Pattyn ◽  
G. Langouche

AbstractThe results are discussed of the characterization by means of TEM, RBS and XRD of ErSi2-x layers prepared by ion beam synthesis on (111) silicon. It will be shown that high quality (buried) layers can be prepared by channelled implantation of the erbium, whereas unchannelled implantation leads to discontinuous polycrystalline surface layers. The epitaxial growth and vacancy ordering in the silicide are discussed.

2002 ◽  
Vol 194 (1) ◽  
pp. 47-55 ◽  
Author(s):  
E. Theodossiu ◽  
H. Baumann ◽  
W. Matz ◽  
A. M�cklich

2005 ◽  
Vol 98 (2) ◽  
pp. 024307 ◽  
Author(s):  
B. Johannessen ◽  
P. Kluth ◽  
C. J. Glover ◽  
G. de M. Azevedo ◽  
D. J. Llewellyn ◽  
...  

1998 ◽  
Vol 72 (26) ◽  
pp. 3488-3490 ◽  
Author(s):  
C. Bonafos ◽  
B. Garrido ◽  
M. López ◽  
A. Romano-Rodriguez ◽  
O. González-Varona ◽  
...  

1998 ◽  
Vol 514 ◽  
Author(s):  
S. Mantl ◽  
L. Kappius ◽  
A. Antons ◽  
M. Löken ◽  
F. Klinkhammer ◽  
...  

ABSTRACTWe report on the epitaxial growth of CoSi2 on silicon using ion beam synthesis and molecular beam allotaxy. The latter process uses molecular beam epitaxy to grow a silicide precipitate distribution embedded in single crystalline silicon and thermal annealing to form the epitaxial layer. Both, ion beam synthesis and molecular beam allotaxy, are capable to grow epitaxial buried and surface CoSi2 layers on Si(100) and Si(111) of high quality.


1989 ◽  
Vol 145 ◽  
Author(s):  
H. Temkin ◽  
L. R. Harriott ◽  
J. Weiner ◽  
R. A. Hamm ◽  
M. B. Panish

AbstractWe demonstrate a vacuum lithography process which uses a finely focused Ga ion beam to write the pattern which is then transferred to the InP pattern by low energy dry etching. Surface steps on the order of 1000-2000A in height, and lateral resolution limited only by size of the ion beam, can be efficiently prepared using moderate Ga ion fluences. The surfaces prepared by this process are damage free and suitable for epitaxial overgrowth. GaInAs/InP heterostructures grown on in-situ patterned substrates show excellent morphology and high luminescence efficiency.


1996 ◽  
Vol 272 (1) ◽  
pp. 99-106 ◽  
Author(s):  
D. Leinen ◽  
A. Caballero ◽  
A. Fernández ◽  
J.P. Espinós ◽  
A. Justo ◽  
...  

2000 ◽  
Vol 338-342 ◽  
pp. 309-312 ◽  
Author(s):  
A. Romano-Rodríguez ◽  
A. Pérez-Rodríguez ◽  
C. Serre ◽  
J.R. Morante ◽  
Jaume Esteve ◽  
...  

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