Growth and Properties of PbTiO3/PLT Heterostructures

1994 ◽  
Vol 361 ◽  
Author(s):  
Yeongkwan Kim ◽  
Y.H. Han ◽  
A. Erbil ◽  
L.A. Boatner
Keyword(s):  
Thin Films ◽  
Metalorganic Chemical Vapor Deposition ◽  
Three Dimensional ◽  
Chemical Vapor ◽  
Crystalline Perfection ◽  
Pole Figures ◽  
Substrate Dependence ◽  
Superlattice Structures ◽  
Very High ◽  
Orientational Relationship

ABSTRACTFerroelectric superlattice structures composed of three-dimensionally epitaxial PbTiO3 and PLT thin films have been successfully grown on SrTiO3 substrates by metalorganic chemical vapor deposition. The modulation structures were confirmed by θ-2θ XRD, and the excellent in-plane orientational relationship between the superlattice film and the substrate by (100), (110), and (111)-pole figures. The φ-scans through the (110) and (111) reflections were used as additional evidence for three-dimensional epitaxy. The substrate dependence of the epitaxial orientation of PLT and PbTiO3 single-layered thin films was investigated. PbTiO3 thin films with very high crystalline perfection can be successfully grown on KTaO3 substrates.

scholarly journals Optical Properties of Epitaxial Plt Thin Films

1995 ◽  
Vol 401 ◽  
Author(s):  
Y. Kim ◽  
A. Erbil ◽  
L. A. Boatner ◽  
L. Steingart ◽  
T. Mensah ◽  
...  
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Metalorganic Chemical Vapor Deposition ◽  
Lattice Mismatch ◽  
Three Dimensional ◽  
Chemical Vapor ◽  
Refractive Indices ◽  
Dispersion Formula ◽  
Epitaxial Heterostructures ◽  
Good Agreement

AbstractMetalorganic chemical vapor deposition (MOCVD) was used to prepare epitaxial or highly oriented PLT (Pb1-xLaxTiO3) thin films with x in the range of 0.21 to 0.34. The growth of PLT films resulted in three-dimensional epitaxial heterostructures on (100) surface of the MgO and the KTaO3 substrates. The PLT film grown on the KTaO3 (100) substrate has a significantly lower minimum channeling yield compared to that on the MgO (100) substrate because of the smaller lattice mismatch. The thickness and the refractive indices in the wavelength range of 435 to 1,523 nm were measured by the prism coupling method. The measured film thickness of 570 nm was in good agreement with that from RBS measurements. The refractive index of PLT film is smaller than that of PbTiO3, its difference at 632.8 nm is about 2.5 %. The dispersion of the refractive index was well fitted to a Sellmeier dispersion formula.

Observations on the Growth of YBa2Cu3O7 Thin Films at Very High Laser Fluences

1995 ◽  
Vol 388 ◽  
Author(s):  
Rand R. Biggers. ◽  
M. Grant Norton ◽  
I. Maartense ◽  
T.L. Peterson ◽  
E. K. Moser ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Surface ◽  
Chemical Vapor ◽  
Growth Conditions ◽  
Organic Chemical ◽  
High Fluences ◽  
Laser Fluences ◽  
High Laser ◽  
High Laser Fluences ◽  
Very High

AbstractThe pulsed-laser deposition (PLD) technique utilizes one of the most energetic beams available to form thin films of the superconducting oxide YBa2Cu3O7 (YBCO). IN this study we examine the growth of YBCO at very high laser fluences (25 to 40 J/cm2); a more typical fluence for PLD would be nearer to 3 J/cm2. the use of high fluences leads to unique film microstructures which, in some cases, appear to be related to the correspondingly higher moveabilities of the adatoms. Films grown on vicinal substrates, using high laser fluences, exhibited well-defined elongated granular morphologies (with excellent transition temperature, Tc, and critical current density, Jc). Films grown on vicinal substrates using off-axis magnetron sputtering, plasma-enhanced metal organic chemical vapor deposition (PE-MOCVD), or PLD at more typical laser fluences showed some similar morphologies, but less well-defined. Under certain growth conditions, using high laser fluences with (001) oriented substrates, the YBCO films can exhibit a mixture of a- and c-axis growth where both crystallographic orientations nucleate on the substrate surface at the same time, and grow in concert. the ratio of a-axis oriented to c-axis oriented grains is strongly affected by the pulse repetition rate of the laser.

Mechanistic study of metalorganic chemical vapor deposition of (Ba,Sr)TiO3 thin films

2000 ◽  
Vol 87 (10) ◽  
pp. 7430-7437 ◽  
Author(s):  
Y. Gao ◽  
C. L. Perkins ◽  
S. He ◽  
P. Alluri ◽  
T. Tran ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Mechanistic Study ◽  
Metalorganic Chemical

Growth of Epitaxial BaTiO3 Thin Films at 600°C by Metalorganic Chemical Vapor Deposition

1994 ◽  
Vol 361 ◽  
Author(s):  
D.L. Kaiser ◽  
M.D. Vaudin ◽  
L.D. Rotter ◽  
Z.L. Wang ◽  
J.P. Cline ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Electron Diffraction ◽  
Harmonic Generation ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Second Harmonic ◽  
Chemical Vapor ◽  
X Ray ◽  
Metalorganic Chemical

ABSTRACTMetalorganic chemical vapor deposition (MOCVD) was used to deposit epitaxial BaTiO3 thin films on (100) MgO substrates at 600°C. The metalorganic precursors employed in the deposition experiments were hydrated Ba(thd)2 (thd = C11H19O2) and titanium isopropoxide. The films were analyzed by means of transmittance spectroscopy, wavelength dispersive x-ray spectrometry, secondary ion mass spectrometry depth profiling, x-ray diffraction, high resolution transmission electron microscopy, selected area electron diffraction, nanoscale energy dispersive x-ray spectrometry and second harmonic generation measurements. There was no evidence for interdiffusion between the film and substrate. The x-ray and electron diffraction studies showed that the films were oriented with the a-axis normal to the substrate surface, whereas second harmonic generation measurements showed that the films had some c-axis character.

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