Diamond Chemical Vapor Deposition: Gas Compositions and film Properties

1994 ◽  
Vol 339 ◽  
Author(s):  
Peter K. Bachmann ◽  
Hans-Jürgen Hagemann ◽  
Hartmut Lade ◽  
Dieter Leers ◽  
Frederike Picht ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Cvd ◽  
Film Properties ◽  
Heat Spreader ◽  
Deposition Parameters ◽  
Microwave Plasma Cvd ◽  
Vacuum Window ◽  
Diamond Chemical Vapor Deposition ◽  
Deposition Technology

ABSTRACTRate, crystallinity and phase purity of vapor-grown diamond deposits are discussed. Emphasis is on microwave plasma CVD of diamond from C/H-, C/H/O-, C/H/F-, C/H/CI- and C/H/N-gas mixtures.The manufacture of wear-resistant diamond thin films, diamond vacuum window membranes and thick diamond heat spreader plates are used as examples to outline the influence of various deposition parameters on the performance of finished products and to describe the use of ternary gas phase compositional diagrams as tools for minimization of deposition technology and product optimization efforts.

scholarly journals A Brief Review on Recent Development of Carbon Nanotubes by Chemical Vapor Deposition

2021 ◽  
Vol 4 (2) ◽  
pp. 68-71
Author(s):  
S. A. Razak ◽  
N. N. Nordin ◽  
M. A. Sulaiman ◽  
M. Yusoff ◽  
M. N. Masri
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Arc Discharge ◽  
Synthesis Method ◽  
Chemical Vapor ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd ◽  
Discharge Laser

Development of carbon nanotubes was done by several methods like arc discharge, laser ablation, silane solution, flame synthesis method but the standard or famous technique using chemical vapor deposition (CVD). CVD is one of the approaches to develop CNT, due to easy control of the reaction course and high purity of the obtained materials. Various type of CVD present like thermal CVD, plasma enhanced CVD, or microwave plasma CVD. These kinds of types give the different advantage and drawbacks to the production of CNT and its preparations.

Promoting secondary nucleation using methane modulations during diamond chemical vapor deposition to produce smoother, harder, and better quality films

2003 ◽  
Vol 18 (2) ◽  
pp. 296-304 ◽  
Author(s):  
N. Ali ◽  
V.F. Neto ◽  
J. Gracio
Keyword(s):  
Growth Rate ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Plasma Cvd ◽  
Secondary Nucleation ◽  
Microwave Plasma Cvd ◽  
Hot Filament Cvd ◽  
Hot Filament

In this paper, we present results obtained from a comparison study relating to the deposition of diamond films using two processes, namely, time-modulated chemical vapor deposition (TMCVD) and conventional CVD. Polycrystalline diamond films were deposited onto silicon substrates using both hot-filament CVD and microwave plasma CVD systems. The key feature of TMCVD is that it modulates methane (CH4) flow during diamond CVD, whereas in conventional CVD the CH4 flow is kept constant throughout the deposition process. Films grown using TMCVD were smoother, harder, and displayed better quality than similar films grown using constant CH4 flow during CVD. The advantage of using TMCVD is that it promotes secondary nucleation to occur on existing diamond crystals. Pulsing CH4, consecutively, at high and low concentrations allows the depositing film to maintain its quality in terms of diamond-carbon phase. Films grown under constant CH4 flow during diamond CVD displayed a columnar growth mode, whereas with the time modulated films the growth mode was different. The mechanism of film growth during TMCVD is presented in this paper. The growth rate of films obtained using the hot filament CVD system with constant CH4 flow was higher than the growth rate of time modulated films. However, using the microwave-plasma CVD system, the effect was the contrary and the time-modulated films were grown at a higher rate. The growth rate results are discussed in terms of substrate temperature changes during TMCVD.

scholarly journals Large area microwave plasma CVD of diamond using composite right/left-handed materials

2021 ◽  
Vol 116 ◽  
pp. 108394
Author(s):  
Justas Zalieckas ◽  
Paulius Pobedinskas ◽  
Martin Møller Greve ◽  
Kristoffer Eikehaug ◽  
Ken Haenen ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Plasma Cvd ◽  
Large Area ◽  
Left Handed ◽  
Microwave Plasma Cvd

Deposition of large area uniform diamond films by microwave plasma CVD

Vacuum ◽  
2018 ◽  
Vol 147 ◽  
pp. 134-142 ◽  
Author(s):  
J. Weng ◽  
F. Liu ◽  
L.W. Xiong ◽  
J.H. Wang ◽  
Q. Sun
Keyword(s):  
Microwave Plasma ◽  
Diamond Films ◽  
Plasma Cvd ◽  
Large Area ◽  
Microwave Plasma Cvd

scholarly journals Synthesis of Microwave Plasma CVD Diamond-Film on Variously-Coated Carbon-Steel Substrates.

1996 ◽  
Vol 47 (7) ◽  
pp. 611-615
Author(s):  
Hiroyuki TANAKA ◽  
Toshiaki TANAKA ◽  
Hideaki SOHMA ◽  
Masato YOSHIDA ◽  
Akira SAKAI ◽  
...  
Keyword(s):  
Carbon Steel ◽  
Diamond Film ◽  
Microwave Plasma ◽  
Cvd Diamond ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd ◽  
Cvd Diamond Film ◽  
Steel Substrates ◽  
Coated Carbon

High-speed synthesis of heavily boron-doped diamond films by in-liquid microwave plasma CVD

2019 ◽  
Vol 92 ◽  
pp. 41-46 ◽  
Author(s):  
Yohei Harada ◽  
Ryota Hishinuma ◽  
Nicolae Spătaru ◽  
Yusei Sakurai ◽  
Kazuya Miyasaka ◽  
...  
Keyword(s):  
High Speed ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Plasma Cvd ◽  
Boron Doped Diamond ◽  
Boron Doped ◽  
Microwave Plasma Cvd
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