Remote Hydrogen Microwave Plasma CVD of Silicon Carbonitride Films From a Tetramethyldisilazane Source. Part 2: Compositional and Structural Dependencies of Film Properties

2007 ◽  
Vol 13 (11) ◽  
pp. 601-608 ◽  
Author(s):  
A. M. Wrobel ◽  
I. Blaszczyk-Lezak
Keyword(s):  
Microwave Plasma ◽  
Silicon Carbonitride ◽  
Plasma Cvd ◽  
Film Properties ◽  
Microwave Plasma Cvd

Silicon carbonitride by remote microwave plasma CVD from organosilicon precursor: Growth mechanism and structure of resulting Si:C:N films

2007 ◽  
Vol 253 (17) ◽  
pp. 7211-7218 ◽  
Author(s):  
I. Blaszczyk-Lezak ◽  
A.M. Wrobel ◽  
M.P.M. Kivitorma ◽  
I.J. Vayrynen ◽  
A. Tracz
Keyword(s):  
Growth Mechanism ◽  
Microwave Plasma ◽  
Silicon Carbonitride ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd

Silicon Carbonitride Films Produced by Remote Hydrogen Microwave Plasma CVD Using a (Dimethylamino)dimethylsilane Precursor

2005 ◽  
Vol 11 (1) ◽  
pp. 44-52 ◽  
Author(s):  
I. Blaszczyk-Lezak ◽  
A. M. Wrobel ◽  
M. P. M. Kivitorma ◽  
I. J. Vayrynen
Keyword(s):  
Microwave Plasma ◽  
Silicon Carbonitride ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd

Diamond Chemical Vapor Deposition: Gas Compositions and film Properties

1994 ◽  
Vol 339 ◽  
Author(s):  
Peter K. Bachmann ◽  
Hans-Jürgen Hagemann ◽  
Hartmut Lade ◽  
Dieter Leers ◽  
Frederike Picht ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Cvd ◽  
Film Properties ◽  
Heat Spreader ◽  
Deposition Parameters ◽  
Microwave Plasma Cvd ◽  
Vacuum Window ◽  
Diamond Chemical Vapor Deposition ◽  
Deposition Technology

ABSTRACTRate, crystallinity and phase purity of vapor-grown diamond deposits are discussed. Emphasis is on microwave plasma CVD of diamond from C/H-, C/H/O-, C/H/F-, C/H/CI- and C/H/N-gas mixtures.The manufacture of wear-resistant diamond thin films, diamond vacuum window membranes and thick diamond heat spreader plates are used as examples to outline the influence of various deposition parameters on the performance of finished products and to describe the use of ternary gas phase compositional diagrams as tools for minimization of deposition technology and product optimization efforts.

scholarly journals Large area microwave plasma CVD of diamond using composite right/left-handed materials

2021 ◽  
Vol 116 ◽  
pp. 108394
Author(s):  
Justas Zalieckas ◽  
Paulius Pobedinskas ◽  
Martin Møller Greve ◽  
Kristoffer Eikehaug ◽  
Ken Haenen ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Plasma Cvd ◽  
Large Area ◽  
Left Handed ◽  
Microwave Plasma Cvd
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