Evolution and Dynamics of Excimer Laser Vaporized YBa2Cu3O7−δ

1992 ◽  
Vol 285 ◽  
Author(s):  
R. C. Dye ◽  
R. Brainard ◽  
S. R. Foltyn ◽  
R. E. Muenchausen ◽  
X. D. Wu ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Excimer Laser ◽  
Film Growth ◽  
Pulsed Laser ◽  
Spot Size ◽  
Laser Deposition ◽  
Time Resolved ◽  
Plume Dynamics ◽  
Time Resolved Imaging

ABSTRACTPulsed laser deposition of thin films is a technology whose fundamental processes are often poorly understood. Because of the difficulty of monitoring in real time either the ablation process itself (the laser-solid interaction), or thin film growth (plume-substrate interaction), studies have largely relied on diagnostic studies of the ablated plume and the resulting film to infer details about other steps in the process. Information gained from this approach has helped improve the production of high-temperature superconducting thin films.We have studied plume dynamics during the in-situ pulsed laser deposition of YBa2Cu3O7−δ thin films. The 248 and 308 nm lines of an excimer laser were used to generate a plume from a bulk YBa2Cu3O7−δ target. Both fast intensified CCD imaging and spectral diagnostics were used to monitor plume dynamics. Variations in the plume distribution as a function of processing gas, pressure, fluence, energy, and spot size were monitored by film composition and spectral-and time-resolved imaging.

Ca2RuO4Thin Film Growth by Pulsed Laser Deposition

2004 ◽  
Vol 819 ◽  
Author(s):  
Xu Wang ◽  
Yan Xin ◽  
Hanoh Lee ◽  
Patricia A. Stampe ◽  
Robin J. Kennedy ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Electrical Transport ◽  
Film Growth ◽  
Pulsed Laser ◽  
High Sensitivity ◽  
Laser Deposition ◽  
Chemical Doping ◽  
Bulk Single Crystal ◽  
Electrical Transport Properties

AbstractBulk Ca2RuO4 is an antiferromagnetic Mott insulator with the metal-insulator transition above room temperature, and the Neel temperature at 113 K. There is strong coupling between crystal structures and magnetic, electronic phase transitions in this system. It exhibits high sensitivity to chemical doping and pressure that makes it very interesting material to study. We have epitaxially grown Ca2RuO4 thin films on LaAlO3 substrates by pulsed laser deposition technique. Growth conditions such as substrate temperature and O2 pressure were systematically varied in order to achieve high quality single-phase film. Crystalline quality and orientation of these films were characterized by X-ray diffractometry. Microstructure of the thin films was examined by transmission electron microscopy. The electrical transport properties were also measured and compared with bulk single crystal.

Pulsed Laser Deposition of Bi4Ti3O12 Thin Films on Sapphire Substrates

1994 ◽  
Vol 361 ◽  
Author(s):  
William Jo ◽  
T.W. Noh
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Narrow Range ◽  
Pulsed Laser ◽  
Growth Behavior ◽  
Laser Deposition ◽  
Sapphire Substrates ◽  
Deposition Parameters

ABSTRACTUsing pulsed laser deposition, Bi4Ti3O12 thin films were grown on (0001) and (1102) surfaces of Al2O3. Substrate temperature from 700 to 800 °C and oxygen pressure from 50 to 1000 mtorr were varied, and their effects on Bi4Ti3O12 film growth behavior was investigated. Only for a narrow range of deposition parameters, can highly oriented Bi4Ti3O12(104) films be grown on Al2O3(0001). Further, epitaxial BTO(004) films can be grown on Al2O3(1102). The growth behavior of preferential BTO film orientations can be explained in terms of atomic arrangements in the Bi4Ti3O12 and the Al2O3 planes.

scholarly journals Modeling of Thermal, Electronic, Hydrodynamic, and Dynamic Deposition Processes for Pulsed-Laser Deposition of Thin Films

1994 ◽  
Vol 354 ◽  
Author(s):  
C. L. Liu ◽  
J. N. Leboeuf ◽  
R. F. Wood ◽  
D. B. Geohegan ◽  
J. M. Donate ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Cell Model ◽  
Pulsed Laser ◽  
Nonequilibrium Thermodynamic ◽  
Laser Deposition ◽  
Computational Techniques ◽  
Special Focus ◽  
Rapid Phase

AbstractVarious physical processes during laser ablation of solids for pulsed-laser deposition (PLD) are studied using a variety of computational techniques. In the course of our combined theoretical and experimental effort, we have been trying to work on as many aspects of PLD processes as possible, but with special focus on the following areas: (a) the effects of collisional interactions between the particles in the plume and in the background on the evolving flow field and on thin film growth, (b) interactions between the energetic particles and the growing thin films and their effects on film quality, (c) rapid phase transformations through the liquid and vapor phases under possibly nonequilibrium thermodynamic conditions induced by laser-solid interactions, (d) breakdown of the vapor into a plasma in the early stages of ablation through both electronic and photoionization processes, (c) hydrodynamic behavior of the vapor/plasma during and after ablation. The computational techniques used include finite difference (FD) methods, particle-in-cell model, and atomistic simulations using molecular dynamics (MD) techniques.

scholarly journals Challenges for Pulsed Laser Deposition of FeSe Thin Films

Micromachines ◽  
2021 ◽  
Vol 12 (10) ◽  
pp. 1224
Author(s):  
Yukiko Obata ◽  
Igor A. Karateev ◽  
Ivan Pavlov ◽  
Alexander L. Vasiliev ◽  
Silvia Haindl
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Mechanical Strain ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Superconducting Properties ◽  
Surface Protection ◽  
Sensor Applications ◽  
Interface Control

Anti-PbO-type FeSe shows an advantageous dependence of its superconducting properties with mechanical strain, which could be utilized as future sensor functionality. Although superconducting FeSe thin films can be grown by various methods, ultrathin films needed in potential sensor applications were only achieved on a few occasions. In pulsed laser deposition, the main challenges can be attributed to such factors as controlling film stoichiometry (i.e., volatile elements during the growth), nucleation, and bonding to the substrate (i.e., film/substrate interface control) and preventing the deterioration of superconducting properties (i.e., by surface oxidization). In the present study, we address various technical issues in thin film growth of FeSe by pulsed laser deposition, which pose constraints in engineering and reduce the application potential for FeSe thin films in sensor devices. The results indicate the need for sophisticated engineering protocols that include interface control and surface protection from chemical deterioration. This work provides important actual limitations for pulsed laser deposition (PLD) of FeSe thin films with the thicknesses below 30 nm.

Laser fluence and spot size effect on compositional and structural properties of BiFeO 3 thin films grown by Pulsed Laser Deposition

2017 ◽  
Vol 634 ◽  
pp. 107-111 ◽  
Author(s):  
N. Jaber ◽  
J. Wolfman ◽  
C. Daumont ◽  
B. Négulescu ◽  
A. Ruyter ◽  
...  
Keyword(s):  
Thin Films ◽  
Size Effect ◽  
Pulsed Laser Deposition ◽  
Structural Properties ◽  
Laser Fluence ◽  
Pulsed Laser ◽  
Spot Size ◽  
Laser Deposition

Carbon nitride thin films prepared by nitrogen ion assisted pulsed laser deposition of graphite using KrF excimer laser

1999 ◽  
Vol 339 (1-2) ◽  
pp. 38-43 ◽  
Author(s):  
Kazuhiro Yamamoto ◽  
Yoshinori Koga ◽  
Shuzo Fujiwara ◽  
Fumio Kokai ◽  
Jacob I. Kleiman ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Excimer Laser ◽  
Carbon Nitride ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Nitrogen Ion ◽  
Krf Excimer Laser

A Perspective of Pulsed Laser Deposition (PLD) in Surface Engineering: Alumina Coatings and Substrates

2008 ◽  
Vol 384 ◽  
pp. 185-212 ◽  
Author(s):  
Adele Carradò ◽  
Hervé Pelletier ◽  
Felix Sima ◽  
Carmen Ristoscu ◽  
Agnès Fabre ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Excimer Laser ◽  
Surface Engineering ◽  
Mechanical Characteristics ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
In Vitro Tests ◽  
Tribological Behaviour ◽  
Alumina Coatings

In this article, two original studies of the alumina as porous substrate and PLD (pulsed laser deposition) thin films in view of its biomedical and tribological applications are presented. The first biomedical study aimed to evaluate the role of Al2O3 on thin deposited nanostructures. For this purpose, cerium stabilized zirconia doped hydroxyapatite thin films were deposited by PLD onto high purity, high density alumina substrates with different low porosities. For deposition, an UV KrF* (λ=248 nm, τ ~ 25 ns) excimer laser was used for the multi-pulse irradiation of the targets. The nanostructured surface morphologies of the thin films with micro droplets were evidenced by atomic force microscopy and scanning electron microscopy and the compositions with a Ca/P ratio of 1.7 by energy dispersive spectroscopy. The films were seeded with mesenchymal stem cells for in vitro tests. The cells showed good attachment and spread and covered uniformly the surface of the samples. Different functions of substrate porosities are observed in the efficiency of developing long filopodia and of obtaining the optimal intracellular organization. The second study aimed to understand the influence of micro-structural and mechanical characteristics on the tribological behaviour of stainless steel samples with PLD alumina coatings produced using an UV KrF* (λ=248 nm, τ ~ 20 ns) excimer laser and a sintered alumina target. Various microscopic observation techniques were used in order to connect the tribological response to the amorphous microstructure of the coatings. The results correspond to the determination of the mechanical characteristics by nanoindentation tests, scratch tests, and a tribological behaviour analysis of the treated steel against 100Cr6. The films were stoichiometric, partially crystallized with an amorphous matrix and their surfaces had few particulates deposited on. The obtained values of hardness and elastic modulus of the films were in good agreements with literature data.

A Comparative Characterization Study of Molybdenum Oxide Thin Films Grown Using Femtosecond and Nanosecond Pulsed Laser Deposition

MRS Advances ◽  
2016 ◽  
Vol 1 (37) ◽  
pp. 2585-2590 ◽  
Author(s):  
Harsha K. Puppala ◽  
Anthony T. Pelton ◽  
Robert A. Mayanovic
Keyword(s):  
Thin Films ◽  
Heterogeneous Catalysis ◽  
Pulsed Laser Deposition ◽  
Molybdenum Oxide ◽  
Film Growth ◽  
Growth Models ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Nanosecond Laser ◽  
Oxide Thin Films

ABSTRACTGroup 6 transition metal oxide thin films are in large demand for photocatalysis, heterogeneous catalysis, fuel cell, battery and electronic applications. Pulsed laser deposition offers an inexpensive method for the preparation of nanostructured thin films that may be suitable for heterogeneous catalysis. We have synthesized molybdenum oxide thin films using two types of pulsed laser deposition (PLD). The first method utilizes femtosecond laser-based PLD (f-PLD) while the second method uses an excimer (nanosecond) laser-based PLD (n-PLD). The PLD films have been deposited using f-PLD and, separately, n-PLD on glass and silicon substrates and subsequently annealed to 450 °C for up to 20 hours in air using a Linkam stage. SEM, XRD and Raman spectroscopic characterization shows that the f-PLD films are substantially more textured and partially crystalline prior to annealing whereas the n-PLD-grown thin films are much smoother and predominantly amorphous. A 3-dimensional nano-crystalline structure is evident in the post-annealed f-PLD synthesized thin films, which is desirable for catalytic applications. XPS elemental analysis shows that the stoichiometry of the f-PLD and n-PLD thin films is consistent with the presence of MoO2 and MoO3. Our results are discussed in terms of thin film growth models suitable for f-PLD vs n-PLD.

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