Modelling and Characterization of Submicron P-Channel MOSFET's Locally Degraded by Hot Carrier Injection
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ABSTRACTThe influence of the localized defective channel region formed by hot carrier injection on the basic characteristics of P-channel transistors is systematically investigated and modeled. A practical method of parameter extraction in stressed P-MOSFET's is proposed. It is based on the comparison of Ids(Vg) characteristics before and after stress in weak and strong inversion.
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1988 ◽
Vol 31
(11)
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pp. 1573-1581
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2019 ◽
Vol 19
(10)
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pp. 6746-6749
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