Optical Monitoring of Y-Ba-Cu-O Ion Beam Sputtering

1990 ◽  
Vol 201 ◽  
Author(s):  
J.D. Klein ◽  
A. Yen
Keyword(s):  
Ion Beam ◽  
Emission Spectra ◽  
Optical Monitoring ◽  
Ion Beam Sputtering ◽  
Beam Voltage ◽  
Multichannel Analyser ◽  
Beam Sputtering

AbstractEmission spectra resulting from ion beam sputtering an Y-Ba-Cu-O target were observed as a function of beam voltage and time using an optical multichannel analyser. The observed spectra were clean with several peaks attributed to each of Y, Ba, and Ar. A well defined O peak and a weak CuO peak were available for comparison. The intensities of the cation peaks were linear with respect to beam voltage above 450 V. Presputtering of a previously stored target was characterized by the diminishment of an initially large H peak as the cation peaks emerged.

Aluminum nitride films synthesized by dual ion beam sputtering

2004 ◽  
Vol 19 (12) ◽  
pp. 3521-3525 ◽  
Author(s):  
Sheng Han ◽  
Hong-Ying Chen ◽  
Chih-Hsuan Cheng ◽  
Jian-Hong Lin ◽  
Han C. Shih
Keyword(s):  
Crystal Structure ◽  
Aluminum Nitride ◽  
Ion Beam ◽  
Diffraction Field ◽  
Ion Beam Sputtering ◽  
X Ray Diffraction ◽  
Axis Orientation ◽  
Beam Voltage ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Aluminum nitride films were deposited by varying the voltages of argon ion beams from 400 to 1200 V in dual ion beam sputtering. The crystal structure, microstructure, and elemental distributions of the aluminum nitride films were analyzed by x-ray diffraction, field emission scanning electron microscopy, and secondary ion mass spectroscopy, respectively. The aluminum nitride films exhibited the 〈002〉 preferred orientation at an optimal ion beam voltage of 800 V. The orientation changed to a mixture of {100} and {002} planes above 800 V, accounting for radiation damage. The thickness of the film increases with increasing ion beam voltage, reaching a steady state value of 210 nm at an ion beam voltage of 1200 V. Under optimal condition (800 V), the c-axis orientation of the aluminum nitride 〈002〉 film was obtained with a dense and high-quality crystal structure.

Examination of Ion Beam-Target Angle Effects by Optical Spectroscopic Profiling

1991 ◽  
Vol 235 ◽  
Author(s):  
J. D. Klein ◽  
A. Yen
Keyword(s):  
Ion Beam ◽  
Emission Spectra ◽  
Optical Emission ◽  
Target Surface ◽  
Normal Incidence ◽  
Ion Beam Sputtering ◽  
Similar Shape ◽  
Beam Sputtering ◽  
Optical Emission Spectra ◽  
Optical Fiber Bundle

ABSTRACTThe optical emission spectra resulting from ion beam sputtering a SrTiO3 target were observed as a function of position. A collimated optical fiber bundle parallel to the plane of die sputter target was translated vertically and horizontally to spectroscopically profile the sputter process. Three different angles of incidence of the beam to die target were examined for evidence of bombardment of candidate substrate positions by undesirable species. When the ion beam was at normal incidence to the target or 22.5* from normal incidence the Ar and O contours were of similar shape. However, when die target was inclined at an angle of 45* to die incident ion beam die O contours deviated markedly. Under these conditions it appears that there is a substantial oxygen flux in a direction normal to die target surface. Under these conditions die placement of a substrate facing die sputter target would probably result in undesirable bombardment of die growing film by energetic oxygen.

Bi-Te Thin Film Produced by Ion Beam Sputtering: Impact of Beam Voltage in the Seebeck Coefficient

2017 ◽  
Vol 4 (12) ◽  
pp. 12383-12390 ◽  
Author(s):  
A.L. Pires ◽  
I.F. Cruz ◽  
S. Ferreira-Teixeira ◽  
P.M. Resende ◽  
A.M. Pereira
Keyword(s):  
Thin Film ◽  
Seebeck Coefficient ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Voltage ◽  
Beam Sputtering

Optical Spectroscopic Profiling of Ion Beam Sputtering

1991 ◽  
Vol 223 ◽  
Author(s):  
J. D. Klein ◽  
A. Yen
Keyword(s):  
Fiber Bundle ◽  
Ion Beam ◽  
Rf Sputtering ◽  
Emission Spectra ◽  
Incident Beam ◽  
Optical Emission ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Optical Emission Spectra ◽  
Optical Fiber Bundle

ABSTRACTThe optical emission spectra resulting from ion beam sputtering a BaTiO3 target were observed as a function of position. A collimated optical fiber bundle parallel to the plane of the sputter target was translated vertically and horizontally to spectroscopically profile the sputter process. The Ar contours provide an image of the incident beam and its distortion by the presence of the target. Comparison of the Ar and O contours indicate that the oxygen atmosphere in the vicinity of the target is determined by sputtering events as well as the incident beam. The shapes of the Ba and Ti contours are elliptical with some differences in intensity gradients. Comparison is made with species contours observed during rf sputtering of an Y-Ba-Cu-O target.

Broadband optical monitoring of optical thin films in large ion-beam sputtering machine

2016 ◽  
Author(s):  
David Hofman ◽  
Benoit SASSOLAS ◽  
Christophe Michel ◽  
Laurent Balzarini ◽  
Laurent Pinard ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Optical Monitoring ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Optical monitoring of high throughput ion beam sputtering deposition

2015 ◽  
Author(s):  
Ove Lyngnes ◽  
Ulf Brauneck ◽  
Jinsong Wang ◽  
Ralf Erz ◽  
Sandeep Kohli ◽  
...  
Keyword(s):  
High Throughput ◽  
Ion Beam ◽  
Optical Monitoring ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Beam Sputtering
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