Ductility Enhancement and Mechanical Properties of Ibad Ceramic thin films

1990 ◽  
Vol 201 ◽  
Author(s):  
J. K. Hirvonen ◽  
T. G. Tetreault ◽  
G. Parker ◽  
C. J. McHargue
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Low Temperature ◽  
Ion Beam ◽  
Grain Structure ◽  
Fine Grained ◽  
Ceramic Thin Films ◽  
Ion Beam Assisted Deposition ◽  
Ceramic Films

AbstractThin ceramic films (A12O3 ZrO2, Si3N4, and BN) have been prepared by ion beam assisted deposition (IBAD) and their mechanical properties examined. The films exhibit extreme ductility and adhesion, with the former property possibly attributed to the very fine grained, quasi-amorphous grain structure noted for low temperature IBAD coatings.

Preparation of carbon nitride thin films by ion beam assisted deposition and their mechanical properties

1997 ◽  
Vol 308-309 ◽  
pp. 239-244 ◽  
Author(s):  
M Kohzaki ◽  
A Matsumuro ◽  
T Hayashi ◽  
M Muramatsu ◽  
K Yamaguchi
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Carbon Nitride ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition

Mechanical Properties of AlN Thin Films Prepared by Ion Beam Assisted Deposition

2000 ◽  
Vol 647 ◽  
Author(s):  
Shuichi Miyabe ◽  
Toshiyuki Okawa ◽  
Nobuaki Kitazawa ◽  
Yoshihisa Watanabe ◽  
Yoshikazu Nakamura
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Residual Stress ◽  
Beam Energy ◽  
Ion Beam ◽  
High Energy ◽  
Columnar Structure ◽  
Ion Beam Assisted Deposition ◽  
Film Hardness ◽  
Nitrogen Ion

AbstractAluminum nitride (AlN) thin films were prepared by ion-beam assisted deposition method, and the influence of the nitrogen ion beam energy on their microstructure and mechanical properties was studied by changing the ion beam energy from 0.1 to 1.5 keV. Films prepared with a low-energy ion beam show a columnar structure, while films prepared with a high-energy ion beam show a granular structure. The film hardness is found to decrease with increasing nitrogen ion beam energy. It is also found that the film hardness does not change drastically after annealing in nitrogen atmosphere at 500 °C, yielding the residual stress relaxation. It is proposed that the film hardness is dependent on the film microstructure, which can be controlled with the nitrogen ion beam energy, rather than the residual stress in the films.

Ion beam assisted deposition of metallic and ceramic thin films

1997 ◽  
Vol 127-128 ◽  
pp. 673-676 ◽  
Author(s):  
T. Šikola ◽  
J. Spousta ◽  
L. Ditrichová ◽  
L. Beneš ◽  
V. Peřina ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Ceramic Thin Films ◽  
Ion Beam Assisted Deposition

Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition

2016 ◽  
Vol 185 ◽  
pp. 295-298 ◽  
Author(s):  
Lin-Ao Zhang ◽  
Hao-Nan Liu ◽  
Xiao-Xia Suo ◽  
Shuo Tong ◽  
Ying-Lan Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Nitride ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition

Optical and electrical properties of p-type zinc oxide thin films synthesized by ion beam assisted deposition

2005 ◽  
Vol 492 (1-2) ◽  
pp. 203-206 ◽  
Author(s):  
Zhi Yan ◽  
Zhi Tang Song ◽  
Wei Li Liu ◽  
Qing Wan ◽  
Fu Min Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Electrical Properties ◽  
Ion Beam ◽  
Optical And Electrical Properties ◽  
Oxide Thin Films ◽  
Ion Beam Assisted Deposition ◽  
P Type
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