Rapid Growth of Thick, IC Quality GaAs From a Flowing Solution

Single crystal layers of gallium arsenide have been grown on <111> and <100> oriented GaAs substrates using a flowing solution of gallium saturated with GaAs. With this novel technique, growth rates as high as 9.Oµm/min have been achieved for 5 minutes, while rates of approximately Aµmlmin are typically achieved for 20 minutes of growth. These figures are in good agreement with a previously developed theoretical model and are about two orders of magnitude greater than those for conventional, static solution, liquid phase epitaxy (LPE) for layer thicknesses greater than lµm. Undoped, p-doped and n-doped layers of high crystallographic and electronic quality have been grown. A description of the technique and some of the electro-optical properties are presented in this paper.