Ion-Beam Synthesis of Buried Yttrium Silicide

1989 ◽  
Vol 157 ◽  
Author(s):  
T.L. Alford ◽  
J.C. Barbour
Keyword(s):  
Single Crystal ◽  
Rutherford Backscattering Spectrometry ◽  
Ion Beam ◽  
Rutherford Backscattering ◽  
High Fluence ◽  
Uniform Thickness ◽  
Double Crystal ◽  
X Ray ◽  
Continuous Layer ◽  
Double Crystal Diffractometer

ABSTRACTBuried single-crystal YSi1.7 layers have been synthesized using high fluence implants of 330 keV yttrium ions into (111) Si held at 450°C followed by post-implant anneals of 1000°C . Rutherford backscattering spectrometry showed that an implant fluence of 3.6 X 1017 Y/cm2 forms a continuous layer of uniform thickness. Whereas, implant fluences of 1 — 2 x 1017 Y/cm2 form a thin continuous YSi1.7 layer with what are believed to be Y-silicide precipitates above and below the YSi1.7 layer. Strains resulting from the YSi1-7 layers were evaluated from x-ray rocking curves using a double crystal diffractometer.

Buried Silicide Synthesis and Strain in Cobalt-Implanted Silicon

1987 ◽  
Vol 102 ◽  
Author(s):  
J.C. Barbour ◽  
S.T. Picraux ◽  
B.L. Doyle
Keyword(s):  
Single Crystal ◽  
Room Temperature ◽  
Rutherford Backscattering Spectrometry ◽  
Silicide Formation ◽  
Critical Layer Thickness ◽  
Double Crystal ◽  
Rocking Curve ◽  
X Ray ◽  
Ion Channeling ◽  
Single Crystal Layer

ABSTRACTSilicon (001) substrates were implaynted with 350 keV Co at room temperature and 450°C with fluence of from l×l017 Co/cm2 to 6×1017 Co/cm . All samples were annealed at 1000°C in order to form the CoSi2 phase Concentration profiles were determined with Rutherford backscattering spectrometry (RBS), and the associated strain profiles were analyzed with double-crystal X-ray rocking curve measurements. Ion channeling was also used to characterize the silicide formation and crystal quality. An implantation of 6×1017 Co/cm2 at 450°C forms a single-crystal CoSi2 layer while lower fluences do not. A continuous, buried CoSi2 single-crystal layer is formed for the 3×1017 Co/cm2 sample implanted at 450°C and annealed at 1000°C. The continous CoSi2 layer is thicker than the critical layer thickness for a fully coherent film, and therefore the layer partially relaxes. A relaxation of 50% of the fully coherent value is observed for this buried silicide system.

Buried Silicide Synthesis and Strain in Cobalt-Implanted Silicon

1987 ◽  
Vol 107 ◽  
Author(s):  
J.C. Barbour ◽  
S.T. Picraux ◽  
B.L. Doyle
Keyword(s):  
Single Crystal ◽  
Room Temperature ◽  
Rutherford Backscattering Spectrometry ◽  
Concentration Profiles ◽  
Critical Layer Thickness ◽  
Double Crystal ◽  
Rocking Curve ◽  
X Ray ◽  
Ion Channeling ◽  
Single Crystal Layer

AbstractSilicon (001) substrates were implanted with 350 keV co at room temperature and 450°C with fluence of from 1x1017 Co/cm2 to 6x10 Co/cm2. All samples were annealed at 1000°C in order to form the CoSi2 phase. Concentration profiles were determined with Rutherford backscattering spectrometry (RBS), and the associated strain profiles were analyzed with double-crystal X-ray rocking curve measurements. Ion channeling was also used to characterize.the suicide formation and crystal quality. An implantation of 6x1017 Co/cm2 at 450°C forms a single-crystal CoSi2 layer while lower fluences do not. A continuous, buried CoSi2 single-crystal layer is formed for the 3x1017 Co/cm2 sample implanted at 450°C and annealed at 1000°C. The continous CoSi2 layer is thicker than the critical layer thickness for a fully coherent film, and therefore the layer partially relaxes. A relaxation of 50% of the fully coherent value is observed for this buried suicide system.

Stoichiometric Determination of Graphite Intercalation Compounds Using Rutherford Backscatiering Spectrometry

1983 ◽  
Vol 27 ◽  
Author(s):  
L. Salamanca-Riba ◽  
B.S. Elman ◽  
M.S. Dresselhaus ◽  
T. Venkatesan
Keyword(s):  
Experimental Error ◽  
Rutherford Backscattering Spectrometry ◽  
Rutherford Backscattering ◽  
Intercalation Compounds ◽  
Graphite Intercalation Compounds ◽  
X Ray ◽  
Donor And Acceptor ◽  
Graphite Intercalation ◽  
Non Destructive

ABSTRACTRutherford backscattering spectrometry (RBS) is used to characterize the stoichiometry of graphite intercalation compounds (GIC). Specific application is made to several stages of different donor and acceptor compounds and to commensurate and incommensurate intercalants. A deviation from the theoretical stoichiometry is measured for most of the compounds using this non-destructive method. Within experimental error, the RBS results agree with those obtained from analysis of the (00ℓ) x-ray diffractograms and weight uptake measurements on the same samples.

Tetragonal Phase in Ge Doped HfO2 Films on Si Investigated by X-ray Absorption Spectroscopy

2009 ◽  
Vol 1194 ◽  
Author(s):  
Leonardo Miotti ◽  
Karen Paz Bastos ◽  
Cláudio Radtke ◽  
Gerald Lucovsky
Keyword(s):  
Absorption Spectroscopy ◽  
Tetragonal Phase ◽  
Rutherford Backscattering Spectrometry ◽  
Rutherford Backscattering ◽  
Rapid Thermal Anneal ◽  
X Ray ◽  
X Ray Absorption ◽  
Ge Doping

AbstractThe stabilization of the tetragonal phase of 5 nm thick HfO2 films by Ge doping is investigated using x-ray absorption spectroscopy around O and Ge Kedges and by Rutherford backscattering spectrometry. We show that Ge concentrations higher than ˜5at.% are not stable during rapid thermal anneal at temperatures as low as 750°C and that the tetragonal phase of HfO2 is achieved at this Ge concentration.

Pulsed Laser Deposition of Epitaxial LiNbO3 Films on Sapphire Substrates Using a Single Crystal Targets

1994 ◽  
Vol 361 ◽  
Author(s):  
See-Hyung Lee ◽  
Tae W. Noh ◽  
Jai-Hyung Lee ◽  
Young-Gi Kim
Keyword(s):  
Single Crystal ◽  
Pulsed Laser Deposition ◽  
Pole Figure ◽  
Oxygen Pressure ◽  
Rutherford Backscattering Spectrometry ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
X Ray ◽  
Sapphire Substrates ◽  
Crystallographic Orientations

ABSTRACTPulsed laser deposition was used to grow epitaxial LiNbO3 films on sapphire(0001) substrates with a single crystal LiNbO3 target. Using deposition temperatures below 450 °C, LiNbO3 films with correct stoichiometry could be grown without using Li-rich targets. Rutherford backscattering spectrometry measurements showed that the oxygen to niobium ratio is 3.00 ± 0.15 to 1.00. It was also found that the crystallographic orientations of the LiNbO3 films could be controlled by adjusting the oxygen pressure during deposition. An x-ray pole figure shows that epitaxial LiNbO3 films were grown on sapphire(0001), but with twin boundaries.

Defect structure analysis of polycrystalline materials by computer-controlled double-crystal diffractometer with position-sensitive detector

1983 ◽  
Vol 16 (1) ◽  
pp. 89-95 ◽  
Author(s):  
R. Yazici ◽  
W. Mayo ◽  
T. Takemoto ◽  
S. Weissmann
Keyword(s):  
Position Sensitive Detector ◽  
Polycrystalline Materials ◽  
Sensitive Detector ◽  
Double Crystal ◽  
Rocking Curve ◽  
X Ray ◽  
Local Lattice ◽  
Position Sensitive ◽  
The Individual ◽  
Double Crystal Diffractometer

The method represents an extension of a previously developed X-ray double-crystal diffractometer method when a film was used to record the crystallite reflections, each reflecting crystallite being regarded as the second crystal of a double-crystal diffractometer. By utilizing a position-sensitive detector (PSD) with interactive computer controls, the tedious and limiting task of data acquisition and analysis is greatly simplified. The specimen is irradiated with crystal-monochromated radiation and the numerous microscopic spots emanating from the reflecting crystallites are recorded separately by the position-sensitive detector and its associated multichannel analyzer at each increment of specimen rotation. An on-line minicomputer simultaneously collects these data and applies the necessary corrections. This process is then automatically repeated through the full rocking-curve range. The computer carries out the rocking-curve analysis of the individual crystallite reflections as well as that of the entire reflecting crystallite population. The instrument is provided with a specimen translation device which permits analysis of large sections of solid specimens. Thus, sites of local lattice defects induced either mechanically, chemically or by radiation can rapidly be established and quantitatively determined in terms of rocking-curve parameters as well as imaged by X-ray topography, by inserting a film in front of the PSD. The versatility and usefulness of the method is demonstrated by examples given from studies of fracture, fatigue and stress-corrosion cracking of commercial alloys.

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