Metallization Issues in Advanced Ceramic Substrates:- Microstructural. Microchemistry and Thermal Conductivity in Aln
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AbstractMicrochemical and microstructural study has been carried out on the tungsten-aluminum nitride (W-AlN) thick film metallization interface. A reaction has been found to occur with the formation of precipitates at AlN grain boundaries and also within the AlN grains; a thin crystalline grain boundary film was also observed. The interface morphology and chemistry is compared to the molybdenum/manganese-aluminum nitride (MoMn-AlN) interface. The effects of morphology and microchemical variations upon thermal conductivity are discussed.
2019 ◽
Vol 12
(06)
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pp. 1950082
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1990 ◽
Vol 13
(2)
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pp. 313-319
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2020 ◽
Vol 13
(4)
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pp. 1250-1258
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1977 ◽
Vol 35
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pp. 124-125
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1988 ◽
Vol 46
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pp. 628-629
1988 ◽
Vol 46
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pp. 606-607