Experimental and Theoretical Analysis of Resonant Tunneling Through a-Si:H/a-Si1−xCx:H Double-Barrier in p-i-n Structure
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ABSTRACTa-Si:H/a-Si1−x Cx:H double-barrier structure imbedded in the i layer were fabricated by glow discharge. By using the built-in field in the i layer and the external applied bias, the effects of photo-excited carriers driven by electric field in the i layer tunneling through the double-barrier quantum well were examined. Distinct current bumps are distinctly observed when the quantum well structure is imbedded in the middle section of the i layer. A simple theoretical analysis was developed to study the quantum transport behavior.
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2003 ◽
Vol 17
(03)
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pp. 105-109
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1987 ◽
Vol 140
(1)
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pp. K23-K25
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Influence on Characteristics of RTD Due to Variation of Different Parameters and Material Properties
2017 ◽
Vol 26
(04)
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pp. 1740022
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2006 ◽
Vol 33
(2)
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pp. 355-358
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1993 ◽
Vol 07
(06)
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pp. 379-388
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