Ultrananocrystalline Diamond in the Laboratory and the Cosmos

MRS Bulletin ◽  
2001 ◽  
Vol 26 (10) ◽  
pp. 771-776 ◽  
Author(s):  
Dieter M. Gruen

Diamond is one of the most intriguing and potentially useful materials known to science. It is the hardest substance that we know, and it has the highest sound velocity and the highest thermal conductivity of any material. Because diamond is so difficult to fabricate, the challenge is to take meaningful advantage of its extraordinary properties. The chemical vapor deposition (CVD) of diamond overcomes many of the fabrication problems and has become the focus of an important research and development effort worldwide. Although the General Electric Corp. succeeded about 50 years ago in the synthesis of diamond by high-pressure, high-temperature techniques, the low-pressure, or CVD, methods were developed only about 20 years ago in the former Soviet Union, Japan, and the United States. This presentation will deal with a more recent development in diamond CVD that allows one to control the crystallite size in such a way as to synthesize phase-pure nanocrystalline diamond films, which have many unique and fascinating properties not shared by other forms of diamond.

2016 ◽  
Vol 4 (21) ◽  
pp. 4778-4785 ◽  
Author(s):  
Wen Yuan ◽  
Liping Fang ◽  
Zhen Feng ◽  
Zexiang Chen ◽  
Jianwu Wen ◽  
...  

In this study, triethylamine (TEA) dissolved in the methanol was used as a liquid nitrogen source to synthesize nitrogen-doped ultrananocrystalline diamond (N-UNCD) films on silicon substrates via microwave plasma enhanced chemical vapor deposition (MPCVD).


2018 ◽  
Vol 924 ◽  
pp. 927-930
Author(s):  
Mariana A. Fraga ◽  
Andre Contin ◽  
Graziela S. Savonov ◽  
Divani C. Barbosa ◽  
Rodrigo S. Pessoa ◽  
...  

The growth of diamond films on different substrates has been studied extensively to support the emerging technologies ranging from mechanical to nano/microelectronics. It is known that the performance of these applications is affected by diamond film properties, such as structure and morphology. Using chemical vapor deposition (CVD) technique, we have deposited ultrananocrystalline diamond (UNCD) and microcrystalline diamond (MCD) films on 4H-SiC substrates and investigated their basic material properties. The understanding and exploitation of the material properties are fundamental to evaluate the potential of UNCD-on-SiC and MCD-on-SiC structures for fabrication of electronic devices and sensors.


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