Optical Techniques for the Determination of Pulsed Laser Damage in Thin Films

2009 ◽  
pp. 226-226-9
Author(s):  
TW Walker ◽  
AH Guenther ◽  
PE Nielsen
2005 ◽  
Vol 875 ◽  
Author(s):  
Joel P. McDonald ◽  
Vanita R. Mistry ◽  
Katherine E. Ray ◽  
Steven M. Yalisove

AbstractFemtosecond pulsed laser damage of Silicon (100) with thermal oxide thin films was studied in order to further understand the optical and electrical properties of thin films and to evaluate their influence on the damage of the substrate. The damage threshold as a function of film thickness (2 – 1200 nm) was measured. The damage morphology produced by single laser pulses was also investigated. Two primary morphologies were observed, one in which the oxide film is completely removed, and the other in which the film is delaminated and expanded above the surface producing a bubble feature.


2008 ◽  
Vol 5 (5) ◽  
pp. 1270-1273 ◽  
Author(s):  
M. Campoy-Quiles ◽  
J. Nelson ◽  
P. G. Etchegoin ◽  
D. D. C. Bradley ◽  
V. Zhokhavets ◽  
...  

1993 ◽  
Author(s):  
S. D. Walck ◽  
J. S. Zabinski ◽  
M. S. Donley ◽  
A. E. Day ◽  
J. E. Bultman

2009 ◽  
Vol 15 (S2) ◽  
pp. 1316-1317
Author(s):  
G Drazic ◽  
E Sarantopoulou ◽  
Z Kollia ◽  
A-C Cefalas ◽  
S Kobe

Extended abstract of a paper presented at Microscopy and Microanalysis 2009 in Richmond, Virginia, USA, July 26 – July 30, 2009


2011 ◽  
Vol 21 (7) ◽  
pp. 074008 ◽  
Author(s):  
H Nazeer ◽  
M D Nguyen ◽  
L A Woldering ◽  
L Abelmann ◽  
G Rijnders ◽  
...  

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