The Role Of Thermal Conductivity In The Pulsed Laser Damage Sensitivity Of Optical Thin Films+

1988 ◽  
Author(s):  
Arthur H. Guenther ◽  
John K. McIver
Keyword(s):  
Thin Films ◽  
Thermal Conductivity ◽  
Pulsed Laser ◽  
Laser Damage

The role of Ag in the pulsed laser growth of YBCO thin films

1999 ◽  
Vol 85 (9) ◽  
pp. 6636-6641 ◽  
Author(s):  
R. Kalyanaraman ◽  
S. Oktyabrsky ◽  
J. Narayan
Keyword(s):  
Thin Films ◽  
Pulsed Laser ◽  
Ybco Thin Films

Role of vanadium content in ZnO thin films grown by pulsed laser deposition

2007 ◽  
Vol 254 (4) ◽  
pp. 1228-1231 ◽  
Author(s):  
M.E. Koleva ◽  
P.A. Atanasov ◽  
N.N. Nedialkov ◽  
H. Fukuoka ◽  
M. Obara
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Vanadium Content ◽  
Laser Deposition ◽  
Zno Thin Films

Role of oxygen pressure in growth of CeAlOx thin films on Si by pulsed laser deposition

2003 ◽  
Vol 94 (1) ◽  
pp. 594-597 ◽  
Author(s):  
L. Yan ◽  
L. B. Kong ◽  
J. S. Pan ◽  
C. K. Ong
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Oxygen Pressure ◽  
Pulsed Laser ◽  
Laser Deposition

Pulsed Laser Deposition Thin Films of Pr0.7Sr0.3MnO3:  The Role of Growth Temperature

2000 ◽  
Vol 12 (10) ◽  
pp. 2858-2868 ◽  
Author(s):  
B. Mercey ◽  
J. Wolfman ◽  
W. Prellier ◽  
M. Hervieu ◽  
Ch. Simon ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Growth Temperature ◽  
Pulsed Laser ◽  
Laser Deposition

scholarly journals Pulsed laser deposition of SrRuO3 thin-films: The role of the pulse repetition rate

APL Materials ◽  
2016 ◽  
Vol 4 (12) ◽  
pp. 126109 ◽  
Author(s):  
H. Schraknepper ◽  
C. Bäumer ◽  
F. Gunkel ◽  
R. Dittmann ◽  
R. A. De Souza
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Repetition Rate ◽  
Pulse Repetition Rate ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Pulse Repetition

O12.6 Fracture and Deformation of Thermal Oxide Films on Si (100) Using a Femtosecond Pulsed Laser

2005 ◽  
Vol 875 ◽  
Author(s):  
Joel P. McDonald ◽  
Vanita R. Mistry ◽  
Katherine E. Ray ◽  
Steven M. Yalisove
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Pulsed Laser ◽  
Damage Threshold ◽  
Laser Pulses ◽  
The Other ◽  
Laser Damage ◽  
Optical And Electrical Properties ◽  
Thermal Oxide ◽  
Femtosecond Pulsed Laser

AbstractFemtosecond pulsed laser damage of Silicon (100) with thermal oxide thin films was studied in order to further understand the optical and electrical properties of thin films and to evaluate their influence on the damage of the substrate. The damage threshold as a function of film thickness (2 – 1200 nm) was measured. The damage morphology produced by single laser pulses was also investigated. Two primary morphologies were observed, one in which the oxide film is completely removed, and the other in which the film is delaminated and expanded above the surface producing a bubble feature.

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