Development of Plasma Enhanced Chemical Vapor Deposition for Moisture Barrier On Polyethylene Terephthalate Substrates

2016 ◽  
Keyword(s):  
Chemical Vapor Deposition ◽  
Polyethylene Terephthalate ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Moisture Barrier

Functionalization and Environmental Stabilization of ZnO Nanobridge Sensors Fabricated using Carbonized Photoresist

2011 ◽  
Vol 1350 ◽  
Author(s):  
Ashley D. Mason ◽  
Chien-Chih Huang ◽  
Myra T. Koesdjojo ◽  
Nate D. Stephon ◽  
Vincent T. Remcho ◽  
...  
Keyword(s):  
Aqueous Solution ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Passivation Layer ◽  
Electrical Performance ◽  
Thin Coating ◽  
Environmental Sensitivity ◽  
Moisture Barrier ◽  
The Impact

ABSTRACTZnO nanobridge sensors were selectively grown and electrically connected using lithographically patterned carbonized photoresist (C-PR). As ZnO is known to dissolve in deionized (DI) water, parylene-A was investigated as a moisture barrier and potential functionalization platform. A chemical vapor deposition (CVD) process for parylene-A was developed and it was demonstrated that parylene-A coated ZnO NWs do not show any signs of dissolution after 24 hours in an aqueous solution. The impact of the parylene-A coating on the electrical performance and sensitivity of ZnO nanobridge devices was investigated. A comparison of UV, O2, and H2O sensitivity between uncoated and coated devices revealed that a thin coating of parylene-A attenuated all of these responses, suggesting the ability to modulate environmental sensitivity using this non-covalently bound polymer passivation layer.

scholarly journals Plasma Enhanced-Chemical Vapor Deposition of 2-Isopropenyl-2-Oxazoline to Promote the Adhesion between a Polyethylene Terephthalate Monofilament and the Rubber in a Tire

Coatings ◽  
2021 ◽  
Vol 11 (6) ◽  
pp. 708
Author(s):  
Carlo Maria Gaifami ◽  
Stefano Zanini ◽  
Luca Zoia ◽  
Claudia Riccardi
Keyword(s):  
Chemical Vapor Deposition ◽  
Polyethylene Terephthalate ◽  
Vapor Deposition ◽  
Chemical Characterization ◽  
Chemical Vapor ◽  
Peel Test ◽  
Vacuum System ◽  
Organic Thin Film ◽  
Plasma Parameters ◽  
Resorcinol Formaldehyde

A Plasma-Enhanced Chemical Vapor Deposition was chosen in order to deposit an organic thin film on polyethylene terephthalate monofilament to increase its adhesion with the rubber compound in a tire. The aim of the work is to find an alternative “green” method to the classical chemical dipping with Resorcinol Formaldehyde Latex: plasma treatments are environmentally friendly and easy to use. 2-isoprepenyl-2-oxazoline (2-iox) was employed as precursor and the treatments were performed in a vacuum system, both in a continuous regime and a pulsed regime. Initially, the coatings were deposited on polyethylene terephthalate sheets to study the wettability (by the measurement of contact angle) and the thickness (by profilometer) of the plasma polymer. The chemical characterization was investigated by Infrared and X-ray Photoelectron spectroscopies. Finally, the adhesion of the polyethylene terephthalate sheets was measured by Peel Test, using the coating as adhesive and as a pre-dip. The measurement of the peel force made it possible to optimize the plasma parameters that were applied on the monofilament. The adhesion was estimated by the measure of the extraction force and the evaluation of the coverage compared with those of the classical chemical treatment Resorcinol Formaldehyde Latex.

All hot wire chemical vapor deposition low substrate temperature transparent thin film moisture barrier

2013 ◽  
Vol 532 ◽  
pp. 84-88 ◽  
Author(s):  
D.A. Spee ◽  
M.R. Schipper ◽  
C.H.M. van der Werf ◽  
J.K. Rath ◽  
R.E.I. Schropp
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Substrate Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Moisture Barrier

Moisture barrier enhancement by spontaneous formation of silicon oxide interlayers in hot wire chemical vapor deposition of silicon nitride on poly(glycidyl methacrylate)

2014 ◽  
Vol 92 (7/8) ◽  
pp. 593-596 ◽  
Author(s):  
D.A. Spee ◽  
C.H.M. van der Werf ◽  
J.K. Rath ◽  
R.E.I. Schropp
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Nitride ◽  
Vapor Deposition ◽  
Glycidyl Methacrylate ◽  
Silicon Oxide ◽  
Chemical Vapour ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Moisture Barrier ◽  
X Ray

We deposited a silicon nitride (SiNx)–polymer hybrid multilayer moisture barrier in a hot wire chemical vapor deposition (HWCVD) process, entirely below 100 °C. The polymer, poly(glycidyl methacrylate) (PGMA), was deposited by initiated chemical vapour deposition and the SiNx in a dedicated HWCVD reactor. Line profile investigation of our barrier structures by cross-sectional scanning transmission electron microscopy and energy dispersive X-ray spectrometry reveals that, upon deposition of SiNx on top of our polymer layer, an intermediate layer of silicon oxide (SiOx) like material is formed. X-ray photoelectron spectroscopy measurements confirm the presence of this material and indicate the epoxy rings in the PGMA material open upon heating (to 100 °C) and exposure to atomic hydrogen and amine species in the HWCVD process. The oxygen atoms subsequently react with silicon and nitrogen containing radicals to form SiOxNy. The interlayer turns out to be highly beneficial for interlayer adhesion and this is considered to be one of the reasons for the excellent barrier properties of our multilayer.

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