High-density remote plasma sputtering of high-dielectric-constant amorphous hafnium oxide films

2013 ◽  
Vol 250 (5) ◽  
pp. 957-967 ◽  
Author(s):  
Flora M. Li ◽  
Bernhard C. Bayer ◽  
Stephan Hofmann ◽  
Stuart P. Speakman ◽  
Caterina Ducati ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Hafnium Oxide ◽  
High Dielectric Constant ◽  
Oxide Films ◽  
High Density ◽  
Remote Plasma ◽  
Plasma Sputtering ◽  
High Dielectric

ChemInform Abstract: Deposition, Annealing and Characterization of High-Dielectric Constant Metal Oxide Films.

ChemInform ◽  
2010 ◽  
Vol 26 (41) ◽  
pp. no-no
Author(s):  
H. TREICHEL ◽  
A. MITWALSKY ◽  
G. TEMPEL ◽  
G. ZORN ◽  
D. A. BOHLING ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Metal Oxide ◽  
High Dielectric Constant ◽  
Oxide Films ◽  
Metal Oxide Films ◽  
High Dielectric

Structural–optical study of high-dielectric-constant oxide films

2006 ◽  
Vol 253 (1) ◽  
pp. 322-327 ◽  
Author(s):  
M. Losurdo ◽  
M.M. Giangregorio ◽  
M. Luchena ◽  
P. Capezzuto ◽  
G. Bruno ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
High Dielectric Constant ◽  
Oxide Films ◽  
Optical Study ◽  
High Dielectric

Deposition, annealing and characterisation of high-dielectric-constant metal oxide films

1995 ◽  
Vol 5 (3) ◽  
pp. 163-175 ◽  
Author(s):  
H. Treichel ◽  
A. Mitwalsky ◽  
G. Tempel ◽  
G. Zorn ◽  
D. A. Bohling ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Metal Oxide ◽  
High Dielectric Constant ◽  
Oxide Films ◽  
Metal Oxide Films ◽  
High Dielectric

Super high-dielectric-constant oxide films for next-generation nanoelectronics and supercapacitors for energy storage

MRS Bulletin ◽  
2020 ◽  
Vol 45 (3) ◽  
pp. 231-238 ◽  
Author(s):  
Orlando Auciello ◽  
Geunhee Lee ◽  
Chunya Wu ◽  
Yuanning Chen ◽  
Jesus J. Alcantar-Peña ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Energy Storage ◽  
High Dielectric Constant ◽  
Oxide Films ◽  
Next Generation ◽  
High Dielectric ◽  
Image Position

Abstract

An interfacial investigation of high-dielectric constant material hafnium oxide on Si substrate

2005 ◽  
Vol 488 (1-2) ◽  
pp. 167-172 ◽  
Author(s):  
S.C. Chen ◽  
J.C. Lou ◽  
C.H. Chien ◽  
P.T. Liu ◽  
T.C. Chang
Keyword(s):  
Dielectric Constant ◽  
Hafnium Oxide ◽  
High Dielectric Constant ◽  
Si Substrate ◽  
High Dielectric
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