A 20.15% efficiency Si solar cell achieved by means of a high fill factor design and field-effect passivation

Author(s):  
Ming Lu ◽  
Liang-Xing Wang
2008 ◽  
Vol 1101 ◽  
Author(s):  
Chang-Wei Liu ◽  
Zingway Pei ◽  
Shu-Tong Chang ◽  
Ren-Yui Ho ◽  
Min-Wei Ho ◽  
...  

AbstractOne of the parameters that limit the efficiency of a thin film solar cell, especially the a-Si and the nc-Si solar cell is the cell thickness. Although thicker film can absorb most of the sun light, the optical generated carriers will recombination through the numerous gap states in the film that obtained lower short circuit current and fill factor. In the controversy, thinner film could not absorb enough sun light that also limit the short circuit current. In this works, we utilize nanowire structure to solve the conflict between the light absorption and the carrier transport. The designed structure has ZnO:Al nanowire array on the substrate. The p-i-n a-Si solar cell structure is grown along the surface of each ZnO: Al nanowire sequentially. Under sunlight illumination, the light is absorbed in the axis direction of the nanowire. However, the carrier transport is along the radial direction of the solar cell. Therefore, the long nanowire could absorb most of the solar light. In the mean time, the thickness of the solar cell still is thin enough for photo-generated carrier transport. The dependence of short circuit current, open circuit voltage and fill factor to the length, diameter and density of ZnO:Al nanowires were simulated.


2012 ◽  
Vol 29 (8) ◽  
pp. 087302 ◽  
Author(s):  
Qing-Yi Shao ◽  
A-Qing Chen ◽  
Kai-Gui Zhu ◽  
Juan Zhang

2011 ◽  
Vol 95 (7) ◽  
pp. 1587-1589 ◽  
Author(s):  
B. Zimmermann ◽  
H.-F. Schleiermacher ◽  
M. Niggemann ◽  
U. Würfel

2000 ◽  
Vol 609 ◽  
Author(s):  
M. Mulato ◽  
F. Lemmi ◽  
S. E. Ready ◽  
J. P. Lu ◽  
K. Van Schuylenbergh ◽  
...  

ABSTRACTThe pixel cross-talk is investigated in two-dimensional amorphous silicon (a-Si:H) imager arrays based on the new high fill factor design. In this configuration a continuous a-Si:H sensor extends over the whole surface of the imager, and a buried insulator material with low dielectric constant is used to separate the sensor from the underlying active matrix readout circuit. We find that the lateral conduction between neighboring pixels is mainly determined by the quality of the buried insulator-sensor interface, rather than the specific buried material itself. Minimum cross-talk values below 1% are obtained for different insulator materials including silicon oxynitride and thicker polymer based resins. The quality of this interface also affects trapping and recombination of the photogenerated carriers, influencing important imager properties such as sensitivity and image lag.


2017 ◽  
Vol 13 (4) ◽  
pp. 49-54
Author(s):  
Sooyoung Park ◽  
Gyungbae Shim ◽  
Sanguk Han ◽  
Shihyun Ahn ◽  
Cheolmin Park ◽  
...  

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