Correlation between electrical direct current resistivity and plasmonic properties of CMOS compatible titanium nitride thin films

S. Viarbitskaya; J. Arocas; O. Heintz; G. Colas-Des-Francs; D. Rusakov; U. Koch; J. Leuthold; L. Markey; A. Dereux; J.-C. Weeber

doi:10.1364/oe.26.009813

Correlation between electrical direct current resistivity and plasmonic properties of CMOS compatible titanium nitride thin films

Optics Express ◽

10.1364/oe.26.009813 ◽

2018 ◽

Vol 26 (8) ◽

pp. 9813 ◽

Cited By ~ 1

Author(s):

S. Viarbitskaya ◽

J. Arocas ◽

O. Heintz ◽

G. Colas-Des-Francs ◽

D. Rusakov ◽

...

Keyword(s):

Thin Films ◽

Titanium Nitride ◽

Direct Current ◽

Cmos Compatible

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Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2005.08.214 ◽

2006 ◽

Vol 494 (1-2) ◽

pp. 146-150 ◽

Cited By ~ 43

Author(s):

M. Benegra ◽

D.G. Lamas ◽

M.E. Fernández de Rapp ◽

N. Mingolo ◽

A.O. Kunrath ◽

...

Keyword(s):

Thin Films ◽

Residual Stresses ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Direct Current ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Pulsed Direct Current

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Microstructure and hydrogen impermeability of titanium nitride thin films deposited by direct current reactive magnetron sputtering

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2016.06.278 ◽

2016 ◽

Vol 688 ◽

pp. 44-50 ◽

Cited By ~ 18

Author(s):

Tong Zhou ◽

Dawei Liu ◽

Ying Zhang ◽

Taoyuan Ouyang ◽

Jinping Suo

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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A Platform for CMOS Compatible Plasmonics: High Plasmonic Quality Titanium Nitride Thin Films on Si (001) with an MgO Interlayer

Advanced Photonics Research ◽

10.1002/adpr.202000210 ◽

2021 ◽

pp. 2000210

Author(s):

Kai Ding ◽

Dhruv Fomra ◽

Alexander V. Kvit ◽

Hadis Morkoç ◽

Nathaniel Kinsey ◽

...

Keyword(s):

Thin Films ◽

Titanium Nitride ◽

Cmos Compatible

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Structure and properties of titanium nitride thin films deposited at low temperatures using direct current magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579155 ◽

1994 ◽

Vol 12 (2) ◽

pp. 476-483 ◽

Cited By ~ 68

Author(s):

F. Elstner ◽

A. Ehrlich ◽

H. Giegengack ◽

H. Kupfer ◽

F. Richter

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Direct Current ◽

Low Temperatures ◽

Structure And Properties ◽

Direct Current Magnetron Sputtering

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GLANCING INCIDENCE X-RAY STUDIES OF TITANIUM NITRIDE THIN FILMS USING A NEW MULTIPURPOSE LABORATORY SPECTROMETER

Le Journal de Physique Colloques ◽

10.1051/jphyscol:1989716 ◽

1989 ◽

Vol 50 (C7) ◽

pp. C7-169-C7-173

Author(s):

R.C BUSCHERT ◽

P. N. GIBSON ◽

W. GISSLER ◽

J. HAUPT ◽

T. A. CRABB

Keyword(s):

Thin Films ◽

Titanium Nitride ◽

X Ray

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Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition

Materials Letters ◽

10.1016/j.matlet.2016.08.147 ◽

2016 ◽

Vol 185 ◽

pp. 295-298 ◽

Cited By ~ 10

Author(s):

Lin-Ao Zhang ◽

Hao-Nan Liu ◽

Xiao-Xia Suo ◽

Shuo Tong ◽

Ying-Lan Li ◽

...

Keyword(s):

Thin Films ◽

Titanium Nitride ◽

Ion Beam ◽

Ion Beam Assisted Deposition

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Alternative Surface Reaction Route in the Atomic Layer Deposition of Titanium Nitride Thin Films for Electrode Applications

ACS Applied Electronic Materials ◽

10.1021/acsaelm.0c01079 ◽

2021 ◽

Vol 3 (2) ◽

pp. 999-1005

Author(s):

Hyeok Jae Lee ◽

Jin Ha Hwang ◽

Ji-Yong Park ◽

Sang Woon Lee

Keyword(s):

Thin Films ◽

Atomic Layer Deposition ◽

Titanium Nitride ◽

Surface Reaction ◽

Atomic Layer ◽

Reaction Route ◽

Layer Deposition

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CMOS-Compatible Synthesis of Large-Area, High-Mobility Graphene by Chemical Vapor Deposition of Acetylene on Cobalt Thin Films

ACS Nano ◽

10.1021/nn202012m ◽

2011 ◽

Vol 5 (9) ◽

pp. 7198-7204 ◽

Cited By ~ 82

Author(s):

Michael E. Ramón ◽

Aparna Gupta ◽

Chris Corbet ◽

Domingo A. Ferrer ◽

Hema C. P. Movva ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Mobility ◽

Chemical Vapor ◽

Large Area ◽

Cobalt Thin Films ◽

Cmos Compatible

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Epitaxy of titanium nitride thin films grown by nitrogen implantation

Thin Solid Films ◽

10.1016/0040-6090(96)08568-9 ◽

1996 ◽

Vol 281-282 ◽

pp. 32-35 ◽

Cited By ~ 4

Author(s):

Y. Kasukabe ◽

J. Ootubo ◽

S. Takeda ◽

S. Nagata ◽

M. Kishimoto ◽

...

Keyword(s):

Thin Films ◽

Titanium Nitride ◽

Nitrogen Implantation

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A correlation of Auger electron spectroscopy, x‐ray photoelectron spectroscopy, and Rutherford backscattering spectrometry measurements on sputter‐deposited titanium nitride thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574092 ◽

1986 ◽

Vol 4 (6) ◽

pp. 2463-2469 ◽

Cited By ~ 104

Author(s):

Brad J. Burrow ◽

Alan E. Morgan ◽

Russell C. Ellwanger

Keyword(s):

Thin Films ◽

Titanium Nitride ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Rutherford Backscattering Spectrometry ◽

Rutherford Backscattering ◽

X Ray ◽

Sputter Deposited

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