scholarly journals Analytical Studies of Metal Insulator Semiconductor Schottky Barrier Diodes

2014 ◽  
Vol 11 (2) ◽  
pp. 121-127 ◽  
Author(s):  
Niraj Kumar ◽  
Anjana Kumari ◽  
Manisha Samarth ◽  
Rajiv Kumar ◽  
Tarun Dey
Keyword(s):  
Diffusion Equation ◽  
Schottky Diode ◽  
Interfacial Layer ◽  
Schottky Contact ◽  
Thermionic Emission ◽  
Apparent Effect ◽  
Metal Insulator ◽  
Metal Insulator Semiconductor ◽  
Current Voltage ◽  
Ideal Diode

The current –voltage data of the metal –insulator semiconductor Schottky diode are simulated using thermionic emission diffusion equation taking into account the inter facial layer parameters.The computed current – voltage data are fitted into ideal thermionic emission diffusion equation to see the apparent effect of interfacial parameters on current transport.In presence of interfacial layer the Schottky contact behave as an ideal diode of apparently high barrier height. The behavior of apparent height and ideality factor with the presence of inter facial layer is discussed.

scholarly journals Forward current-voltage characteristics simulation of 4H-SiC silicon carbide Schottky diode for power electronics

2017 ◽  
Vol 5 (1) ◽  
pp. 11
Author(s):  
S.B. Rybalka ◽  
E.Yu. Krayushkina ◽  
A.A. Demidov ◽  
O.A. Shishkina ◽  
B.P. Surin
Keyword(s):  
Schottky Diode ◽  
Schottky Contact ◽  
Thermionic Emission ◽  
Analytical Models ◽  
Drift Diffusion ◽  
Continuity Equations ◽  
Forward Current ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
The Ideal

Forward current-voltage characteristics of 4H-SiC Schottky diode with Ni Schottky contact have been simulated based on in the physical analytical models based on Poisson’s equation, drift-diffusion and continuity equations. On the base of analysis of current-voltage characteristics in terms of classical thermionic emission theory it is established that the proposed simulation model of Schottky diode corresponds to the “ideal” diode with average ideality factor n»1.1 at low temperature ~300 K. It is determined that effective Schottky barrier height equals 1.1 eV for Ni/4H-SiC Schottky diode.

Rectifying and Schottky characteristics of a-SixGe1−xOy with metal contacts

2014 ◽  
Vol 92 (7/8) ◽  
pp. 606-610 ◽  
Author(s):  
Md Muztoba ◽  
Mukti Rana
Keyword(s):  
Ohmic Contact ◽  
Infrared Detector ◽  
Schottky Contact ◽  
Thermionic Emission ◽  
Emission Model ◽  
Metal Contacts ◽  
Temperature Changes ◽  
Barrier Heights ◽  
Current Voltage ◽  
Semiconductor Contacts

Metal–semiconductor contacts are a vital part of semiconductor devices as they can form a Schottky barrier or an Ohmic contact. The nature of the contact plays an important role in determining the electrical and physical characteristics of the device and hence is of paramount importance in the operation of the device. In the current work we report the design, fabrication, and current–voltage (I-V) characteristics of microbolometers, a type of infrared detector where the change in temperature changes the resistance of the sensing layer. Eight different types of microbolometers were fabricated using a-SixGe1−x or a-SixGe1−xOy sensing layers and Ti, Cr, Al, Au, Ni, or Ni0.80Cr0.20 metals contacts. It has been observed that bolometers with an a-Si0.15Ge0.85 (Si was lightly p-doped) sensing layer formed a Schottky contact with Ti, Au, Cr, and Al contact metals, while bolometers with a-Si0.15Ge0.85 (Si was heavily n-doped) sensing layers formed an Ohmic contact with Au. For microbolometers with a Si0.15Ge0.85O0.039 sensing layer, both Ni and Ni0.80Cr0.20 contact metals formed the Ohmic contact. For a-SixGe1−x and a-SixGe1−xOy microbolometers, Au and Ni0.80Cr0.20 were used as the absorber layers, respectively. The I–V characteristics of the microbolometers were analyzed with a thermionic emission model. A linear dependence on the Ge composition was approximated to find the effective Richardson constant. The theory predicts Richardson constants of 112 and 50 A/cm2K2 for Si and Ge, respectively. Barrier heights of all devices are calculated and the reasons for the formation of the Ohmic and Schottky contacts are discussed.

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