Large Area High Density Sub-20 nm SiO2 Nanostructures Fabricated by Block Copolymer Template for Nanoimprint Lithography

ACS Nano ◽  
2009 ◽  
Vol 3 (9) ◽  
pp. 2601-2608 ◽  
Author(s):  
Hui Joon Park ◽  
Myung-Gyu Kang ◽  
L. Jay Guo
Keyword(s):  
Block Copolymer ◽  
Nanoimprint Lithography ◽  
High Density ◽  
Large Area ◽  
20 Nm

Macroscopic high density nanodisc arrays of zinc oxide fabricated by block copolymer self-assembly assisted nanoimprint lithography

2012 ◽  
Vol 22 (41) ◽  
pp. 21871 ◽  
Author(s):  
Vignesh Suresh ◽  
Meiyu Stella Huang ◽  
M. P. Srinivasan ◽  
Sivashankar Krishnamoorthy
Keyword(s):  
Zinc Oxide ◽  
Block Copolymer ◽  
Self Assembly ◽  
Nanoimprint Lithography ◽  
High Density

Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media

2014 ◽  
Vol 25 (39) ◽  
pp. 395301 ◽  
Author(s):  
XiaoMin Yang ◽  
Shuaigang Xiao ◽  
Wei Hu ◽  
Justin Hwu ◽  
René van de Veerdonk ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Nanoimprint Lithography ◽  
Bit Patterned Media ◽  
Patterned Media ◽  
20 Nm

Porous metallic nanocone arrays for high-density SERS hot spots via solvent-assisted nanoimprint lithography of block copolymer

RSC Advances ◽  
2015 ◽  
Vol 5 (93) ◽  
pp. 76085-76091 ◽  
Author(s):  
Yunha Ryu ◽  
Gumin Kang ◽  
Chang-Won Lee ◽  
Kyoungsik Kim
Keyword(s):  
Block Copolymer ◽  
Hot Spots ◽  
Nanoimprint Lithography ◽  
Selective Etching ◽  
High Density ◽  
Sers Substrate

We present a facile method of fabricating SERS substrate by combining solvent-assisted nanoimprint lithography and selective etching of block copolymer.

scholarly journals Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Nanomaterials ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 956
Author(s):  
Philipp Taus ◽  
Adrian Prinz ◽  
Heinz D. Wanzenboeck ◽  
Patrick Schuller ◽  
Anton Tsenov ◽  
...  
Keyword(s):  
Electron Beam Lithography ◽  
Nanoimprint Lithography ◽  
Silicon Oxide ◽  
Three Dimensional ◽  
Single Layer ◽  
Fabrication Technology ◽  
Large Area ◽  
Structural Colors ◽  
Biomimetic Structures ◽  
Morpho Butterfly

Biomimetic structures such as structural colors demand a fabrication technology of complex three-dimensional nanostructures on large areas. Nanoimprint lithography (NIL) is capable of large area replication of three-dimensional structures, but the master stamp fabrication is often a bottleneck. We have demonstrated different approaches allowing for the generation of sophisticated undercut T-shaped masters for NIL replication. With a layer-stack of phase transition material (PTM) on poly-Si, we have demonstrated the successful fabrication of a single layer undercut T-shaped structure. With a multilayer-stack of silicon oxide on silicon, we have shown the successful fabrication of a multilayer undercut T-shaped structures. For patterning optical lithography, electron beam lithography and nanoimprint lithography have been compared and have yielded structures from 10 µm down to 300 nm. The multilayer undercut T-shaped structures closely resemble the geometry of the surface of a Morpho butterfly, and may be used in future to replicate structural colors on artificial surfaces.

Cross-linked block copolymer templated assembly of nanoparticle arrays with high density and position selectivity

2016 ◽  
Vol 384 ◽  
pp. 400-405 ◽  
Author(s):  
Zhicheng Liu ◽  
Tongxin Chang ◽  
Haiying Huang ◽  
Lu Bai
Keyword(s):  
Block Copolymer ◽  
High Density ◽  
Nanoparticle Arrays
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