Effects of Bias Pulsing on Etching of SiO2 Pattern in Capacitively-Coupled Plasmas for Nano-Scale Patterning of Multi-Level Hard Masks

2016 ◽  
Vol 16 (5) ◽  
pp. 5143-5149 ◽  
Author(s):  
Sechan Kim ◽  
Gyuhyun Choi ◽  
Heeyeop Chae ◽  
Nae-Eung Lee
2016 ◽  
Vol 16 (11) ◽  
pp. 11817-11822
Author(s):  
Gyuhyun Choi ◽  
Sechan Kim ◽  
Haegyu Jang ◽  
Heeyeop Chae ◽  
Nae-Eung Lee

2012 ◽  
Vol 521 ◽  
pp. 141-145 ◽  
Author(s):  
Yong-Xin Liu ◽  
Wei Jiang ◽  
Xiao-Song Li ◽  
Wen-Qi Lu ◽  
You-Nian Wang

2011 ◽  
Vol 99 (2) ◽  
pp. 021501 ◽  
Author(s):  
Ankur Agarwal ◽  
Shahid Rauf ◽  
Ken Collins

2021 ◽  
Vol 28 (12) ◽  
pp. 123505
Author(s):  
Shali Yang ◽  
Tianxiang Zhang ◽  
Hanlei Lin ◽  
Hao Wu ◽  
Qiang Zhang

2021 ◽  
Vol 104 (4) ◽  
Author(s):  
Quan-Zhi Zhang ◽  
Jing-Yu Sun ◽  
Wen-Qi Lu ◽  
Julian Schulze ◽  
Yu-Qing Guo ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document