Memory Characteristics of Metal-Oxide-Semiconductor Structures Based on Ge Nanoclusters-Embedded GeOx Films Grown at Low Temperature

2012 ◽  
Vol 12 (3) ◽  
pp. 2076-2080 ◽  
Author(s):  
Tzu-Shun Lin ◽  
Li-Ren Lou ◽  
Ching-Ting Lee ◽  
Tai-Cheng Tsai
Keyword(s):  
Low Temperature ◽  
Metal Oxide ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Semiconductor Structures ◽  
Memory Characteristics

Low-temperature solid phase epitaxy for integrating advanced source/drain metal-oxide-semiconductor structures

2010 ◽  
Vol 96 (6) ◽  
pp. 063102 ◽  
Author(s):  
A. Gouyé ◽  
I. Berbezier ◽  
L. Favre ◽  
G. Amiard ◽  
M. Aouassa ◽  
...  
Keyword(s):  
Low Temperature ◽  
Metal Oxide ◽  
Solid Phase ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Solid Phase Epitaxy ◽  
Semiconductor Structures

Interface/border trap characterization of Al2O3/AlN/GaN metal-oxide-semiconductor structures with an AlN interfacial layer

2015 ◽  
Vol 106 (5) ◽  
pp. 051605 ◽  
Author(s):  
Shenghou Liu ◽  
Shu Yang ◽  
Zhikai Tang ◽  
Qimeng Jiang ◽  
Cheng Liu ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Interfacial Layer ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Semiconductor Structures
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