Annealing Effects on Capacitance–Voltage Characteristics of a-Si/SiNx Multilayer Prepared Using Hot-Wire Chemical Vapour Deposition

2011 ◽  
Vol 11 (4) ◽  
pp. 3414-3417 ◽  
Author(s):  
A. K. Panchal ◽  
D. K. Rai ◽  
C. S. Solanki
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hot Wire ◽  
Capacitance Voltage ◽  
Annealing Effects

Large-scale synthesis of single-crystal molybdenum trioxide nanobelts by hot-wire chemical vapour deposition

2015 ◽  
Vol 619 ◽  
pp. 406-410 ◽  
Author(s):  
Jianjun Chen ◽  
Mingming Wang ◽  
Xin Liao ◽  
Zhaoxiang Liu ◽  
Judong Zhang ◽  
...  
Keyword(s):  
Single Crystal ◽  
Chemical Vapour Deposition ◽  
Large Scale ◽  
Vapour Deposition ◽  
Molybdenum Trioxide ◽  
Chemical Vapour ◽  
Hot Wire ◽  
Large Scale Synthesis

Improved Efficiency of Single Junction Microcrystalline Silicon n-i-p Solar Cells with an i-Layer Made by Hot-Wire CVD

2007 ◽  
Vol 989 ◽  
Author(s):  
Hongbo Li ◽  
Ronald H.J. Franken ◽  
Robert L. Stolk ◽  
C. H.M. van der Werf ◽  
Jan-Willem A. Schuttauf ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Solar Cells ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hot Wire ◽  
Microcrystalline Silicon ◽  
Single Junction ◽  
Layer Deposition ◽  
P Cells

AbstractThe influence of the surface roughness of Ag/ZnO coated substrates on the AM1.5 J-V characteristics of microcrystalline silicon (μc-Si:H) solar cells with an i-layer made by the hot-wire chemical vapour deposition (HWCVD) technique is discussed. Cells deposited on substrates with an intermediate rms roughness show the highest efficiency. When using reverse hydrogen profiling during i-layer deposition, an efficiency of 8.5 % was reached for single junction μc-Si:H n-i-p cells, which is the highest for μc-Si:H n-i-p cells with a hot-wire i-layer.

scholarly journals Microdoping compensation of microcrystalline silicon obtained by hot-wire chemical vapour deposition

2000 ◽  
Vol 63 (3) ◽  
pp. 237-246 ◽  
Author(s):  
C Voz ◽  
D Peiró ◽  
M Fonrodona ◽  
D Soler ◽  
J Bertomeu ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hot Wire ◽  
Microcrystalline Silicon

scholarly journals Hot-Wire Chemical Vapour Deposition for Silicon Nitride Waveguides

2016 ◽  
Vol 72 (4) ◽  
pp. 269-272 ◽  
Author(s):  
T. Dominguez Bucio ◽  
A. Tarazona ◽  
A. Z. Khokhar ◽  
G. Z. Mashanovich ◽  
F. Y. Gardes
Keyword(s):  
Silicon Nitride ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hot Wire

Problem of catalyst ageing during the hot-wire chemical vapour deposition of thin silicon films

2009 ◽  
Vol 517 (11) ◽  
pp. 3370-3377 ◽  
Author(s):  
D. Hrunski ◽  
M. Scheib ◽  
M. Mertz ◽  
B. Schroeder
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Silicon Films ◽  
Hot Wire ◽  
Thin Silicon

scholarly journals Amorphous silicon thin film solar cells deposited entirely by hot-wire chemical vapour deposition at low temperature (<150 °C)

2009 ◽  
Vol 517 (12) ◽  
pp. 3575-3577 ◽  
Author(s):  
Fernando Villar ◽  
Aldrin Antony ◽  
Jordi Escarré ◽  
Daniel Ibarz ◽  
Rubén Roldán ◽  
...  
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Low Temperature ◽  
Amorphous Silicon ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Thin Film Solar Cells ◽  
Hot Wire ◽  
Silicon Thin Film
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