Low Temperature Silicon Nitride by Hot Wire Chemical Vapour Deposition for the Use in Impermeable Thin Film Encapsulation on Flexible Substrates

2011 ◽  
Vol 11 (9) ◽  
pp. 8202-8205 ◽  
Author(s):  
D. A. Spee ◽  
C. H. M. van der Werf ◽  
J. K. Rath ◽  
R. E. I. Schropp
Keyword(s):  
Thin Film ◽  
Silicon Nitride ◽  
Low Temperature ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Flexible Substrates ◽  
Hot Wire ◽  
Thin Film Encapsulation

scholarly journals Amorphous silicon thin film solar cells deposited entirely by hot-wire chemical vapour deposition at low temperature (<150 °C)

2009 ◽  
Vol 517 (12) ◽  
pp. 3575-3577 ◽  
Author(s):  
Fernando Villar ◽  
Aldrin Antony ◽  
Jordi Escarré ◽  
Daniel Ibarz ◽  
Rubén Roldán ◽  
...  
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Low Temperature ◽  
Amorphous Silicon ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Thin Film Solar Cells ◽  
Hot Wire ◽  
Silicon Thin Film

scholarly journals Hot-Wire Chemical Vapour Deposition for Silicon Nitride Waveguides

2016 ◽  
Vol 72 (4) ◽  
pp. 269-272 ◽  
Author(s):  
T. Dominguez Bucio ◽  
A. Tarazona ◽  
A. Z. Khokhar ◽  
G. Z. Mashanovich ◽  
F. Y. Gardes
Keyword(s):  
Silicon Nitride ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hot Wire

Materials Issues in the Application of Silicon Nitride Films in Silicon MEMS

2001 ◽  
Vol 687 ◽  
Author(s):  
David F. Moore ◽  
Roger M. Bostock ◽  
Paul Boyle ◽  
Ewan H. Conradie
Keyword(s):  
Thin Film ◽  
Silicon Nitride ◽  
Young’S Modulus ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Young's Modulus ◽  
Chemical Vapour ◽  
Fibre Length ◽  
Wide Range ◽  
Optic Fibre

AbstractThis paper reviews bulk micromachining of Si, with particular reference to the microassembly and packaging of optical and electronic components. Taking as an example the use of 2.3 [.proportional]m thick silicon nitride microclips to hold an optic fibre in place in a silicon V-groove, the potential of thin film packaging is briefly assessed. The fabrication process is to: [i] deposit a controlled stress silicon nitride layer onto a blank (100) oriented silicon wafer by chemical vapour deposition (standard LPCVD but silicon rich); [ii] pattern the silicon nitride clip mask shape by optical lithography and reactive ion etching; and [iii] remove the underlying silicon to form a V-shaped groove with an anisotropic liquid etch process using the silicon nitride as a mask. From the measured deflection of a silicon nitride beam when a force is applied, the Young's modulus is 400 GPa. The beams are rugged and a clipping force of 10 N per metre of optic fibre length is achieved.This approach to applying the mechanical properties of thin films is compatible with standard thin film technology, enables precise microassembly, and has great potential to reduce manufacturing costs in a wide range of sensors and microsystems. In some applications high temperature processing must be avoided, even early on in the manufacturing process. Using low temperature processing, robust clips from silicon nitride made by plasma enhanced chemical vapour deposition (PECVD and hydrogen rich) are made, but the Young's modulus of this material is typically 40 GPa and the clipping force is correspondingly small. The paper concludes by assessing the prospects for other thin film materials in mechanical MEMS and packaging.

Low-temperature growth of graphene nanoplatelets by hot-wire chemical vapour deposition

2021 ◽  
Vol 411 ◽  
pp. 126995
Author(s):  
Nur Afira binti Anuar ◽  
Nurul Hidayah Mohamad Nor ◽  
Rozidawati binti Awang ◽  
Hideki Nakajima ◽  
Sarayut Tunmee ◽  
...  
Keyword(s):  
Low Temperature ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Graphene Nanoplatelets ◽  
Hot Wire ◽  
Temperature Growth ◽  
Low Temperature Growth

Thin film micro- and polycrystalline silicon nip cells on stainless steel made by hot-wire chemical vapour deposition

2006 ◽  
Vol 501 (1-2) ◽  
pp. 276-279 ◽  
Author(s):  
H. Li ◽  
R.L. Stolk ◽  
C.H.M. van der Werf ◽  
M.Y.S. Rusche ◽  
J.K. Rath ◽  
...  
Keyword(s):  
Thin Film ◽  
Stainless Steel ◽  
Chemical Vapour Deposition ◽  
Polycrystalline Silicon ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hot Wire
Sign in / Sign up

Export Citation Format

Share Document