scholarly journals Tribomechanical Properties of a Carbon-Based Nanolayer Prepared by Nitrogen Ion Beam Assisted Deposition for Finger Joint Replacements

2018 ◽  
Vol 2018 ◽  
pp. 1-9 ◽  
Author(s):  
Tomas Horazdovsky ◽  
Radka Vrbova
Keyword(s):  
Ion Beam ◽  
Titanium Substrate ◽  
Surface Hardness ◽  
Ion Bombardment ◽  
Ti6al4v Alloy ◽  
Wear Testing ◽  
Ion Beam Assisted Deposition ◽  
Nitrogen Ion ◽  
Ion Assistance ◽  
Carbon Based

This paper presents the tribomechanical test results of Ti6Al4V alloy modified by carbon-based nanolayers with a thickness of 20 nm and 40 nm, prepared by nitrogen ion beam assisted deposition. The presence of carbon and nitrogen compounds was observed in the modified surface after ion bombardment. Nonstoichiometric TiNx was mainly detected near the interface nanolayer/titanium substrate and in the substrate itself. Ion bombardment led to an improved surface hardness of ~13 GPa in comparison to unmodified Ti6Al4V titanium alloy (~5.5 GPa) and alloy coated by carbon nanolayer without nitrogen ion assistance (~7 GPa). The decreasing of friction coefficient was achieved from 0.5–0.6 for untreated Ti6Al4V alloy to 0.1 for treated Ti6Al4V alloy. Wear testing using a joint wear simulator proved that the modified Ti6Al4V alloy has a higher resistance compared to the unmodified Ti6Al4V alloy. The primary local wear fault of the treated surface was observed after 240,000 cycles in comparison to enormous wear on the untreated surface after just 10,000 cycles. Treating the Ti6Al4V load-bearing components of implants with carbon-based nanolayers assisted by nitrogen ions is very promising in terms of extending the lifetime of implants and thereby reduces patient burden.

scholarly journals Protective Sliding Carbon-Based Nanolayers Prepared by Argon or Nitrogen Ion-Beam Assisted Deposition on Ti6Al4V Alloy

2016 ◽  
Vol 2016 ◽  
pp. 1-9 ◽  
Author(s):  
Petr Vlcak ◽  
Ivan Jirka
Keyword(s):  
Coefficient Of Friction ◽  
Ion Beam ◽  
Reference Sample ◽  
Surface Hardness ◽  
Ti6al4v Alloy ◽  
Ion Beam Assisted Deposition ◽  
The Coefficient Of Friction ◽  
Nitrogen Ion ◽  
Ion Assistance ◽  
Carbon Based

The microstructure and the surface properties of samples coated by carbon-based nanolayer were investigated in an effort to increase the surface hardness and reduce the coefficient of friction of the Ti6Al4V alloy. Protective carbon-based nanolayers were fabricated by argon or nitrogen ion-beam assisted deposition at ion energy of 700 eV on Ti6Al4V substrates. The Raman spectra indicated that nanolayers had a diamond-like carbon character with sp2rich bonds. The TiC and TiN compounds formed in the surface area were detected by X-ray diffraction. Nanoscratch tests showed increased adhesion of a carbon-based nanolayer deposited with ion assistance in comparison with a carbon nanolayer deposited without ion assistance. The results showed that argon ion assistance leads to greater nanohardness than a sample coated by a carbon-based nanolayer with nitrogen ion assistance. A more than twofold increase in nanohardness and a more than fivefold decrease in the coefficient of friction were obtained for samples coated by a carbon-based nanolayer with ion assistance, in comparison with the reference sample.

Microstructural observation of a composite film of c-BN and h-BN phases

2000 ◽  
Vol 15 (11) ◽  
pp. 2292-2295 ◽  
Author(s):  
Young-Joon Park ◽  
Young-Joon Baik ◽  
Jae Hyoung Choi ◽  
Jeong Yong Lee ◽  
Jun-Hee Hahn
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Composite Film ◽  
Ion Beam ◽  
Ion Bombardment ◽  
Deposition Process ◽  
Microstructural Observation ◽  
Ion Beam Assisted Deposition

BN films consisting of c-BN and h-BN phases were synthesized using an ion-beam-assisted deposition process. In contrast to conventional observations, the c-BN and h-BN phases did not form separate layers, but were distributed in the form of nano-sized grains throughout the film thickness. No distinctly aligned h-BN layer was observed before the c-BN phase. Such a mixed character of the film was attributed to a localized ion bombardment effect instead of the macro-stress. Possibly because of the presence of scattered h-BN phases, the thin film described here possessed a low hardness of about 20 GPa and a low stress of about 5 GPa, compared with other reported c-BN-containing films.

Influence of nitrogen ion beam assisted deposition of Cr on tribological properties of tool steel NW1

Vacuum ◽  
2003 ◽  
Vol 70 (2-3) ◽  
pp. 411-416 ◽  
Author(s):  
P. Budzynski ◽  
P. Tarkowski ◽  
P. Żukowski ◽  
K. Kiszczak ◽  
W. Kasietczuk
Keyword(s):  
Tool Steel ◽  
Tribological Properties ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition ◽  
Nitrogen Ion

Effect of Microstructure on Microhardness of AlN Thin Films

2001 ◽  
Vol 695 ◽  
Author(s):  
Shuichi Miyabe ◽  
Masami Aono ◽  
Nobuaki Kitazawa ◽  
Yoshihisa Watanabe
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Beam Energy ◽  
Ion Beam ◽  
Columnar Structure ◽  
Granular Structure ◽  
Nano Indentation ◽  
Ion Beam Assisted Deposition ◽  
Film Microstructure ◽  
Nitrogen Ion

ABSTRACTAluminum nitride (AlN) thin films with columnar and granular structures were prepared by ion-beam assisted deposition method by changing nitrogen ion beam energy, and the effects of the film microstructure and film thickness on their microhardness were studied by using a nano-indentation system with the maximum force of 3 mN. For the columnar structure film of 600 nm in thickness, the microhardness is found to be approximately 24 GPa when the normalized penetration depth to the film thickness is about 0.1. For the granular structure film of 700 nm in thickness, the microhardness is found to be approximately 14 GPa. These results reveal that the microhardness of the AlN films strongly depends on the film microstructure, which can be controlled by regulating the nitrogen ion beam energy.

Ion-Beam-Assisted Deposition of Metal Nanocluster thin Films with Nonlinear Optical Properties

1995 ◽  
Vol 396 ◽  
Author(s):  
C. M. Cotell ◽  
C.A. Carosella ◽  
S.R. Flom ◽  
S. Schiestel ◽  
N. Haralampus ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Nonlinear Optical ◽  
Uv Spectroscopy ◽  
Ion Beam ◽  
Ion Bombardment ◽  
Plan View ◽  
Ion Beam Assisted Deposition ◽  
Metal Nanocluster ◽  
Post Deposition

AbstractMetal nanocluster thin films (∼200 nm thickness) consisting of noble metal (Au) clusters (5-30 nm) in an active metal oxide (Nb2O5) matrix were deposited by evaporation or ion beam assisted deposition (IBAD). In some cases the films were given a post-deposition anneal. The microstructure of the films was examined by plan view and cross sectional transmission electron microscopy (TEM). The size of the metal nanoclusters was found to depend upon the temperature of the post-deposition anneal as well as the conditions of ion bombardment. Ion bombardment was found to stabilize smaller size particles. The linear optical properties of the films, as measured by VIS/UV spectroscopy, show particle size-dependent surface plasmon resonance effects. The nonlinear optical (NLO) properties of the nanoclusters in oxidized niobium were probed experimentally using degenerate four wave mixing (DFWM) and nonlinear transmission (NLT). The DFWM measurements yielded signals that showed strong evidence of saturation and give large values of χ(3)xxxxl. NLT measurements demonstrated that the nonlinear absorption coefficient and, hence, Imχ(3)xxxx was negative. Time resolved DFWM measurements exhibited dynamics that decayed on a several picosecond time scale. The magnitude and the picosecond dynamics of the NLO response were compared to those observed in gold nanoclusters formed by ion implantation in other media. The advantages of the IBAD method for fabricating third order NLO films include the ability to deposit films of arbitrary active region thicknesses and, more importantly, high cluster densities.

Thermal Annealing Investigation of the Optical Properties of Si1-xNx Films Fabricated by Ion Beam Assisted Deposition

1988 ◽  
Vol 128 ◽  
Author(s):  
E. P. Donovan ◽  
C. A. Carosella ◽  
D. Van Vechten
Keyword(s):  
Optical Properties ◽  
Ion Beam ◽  
Optical Filters ◽  
Beam Current ◽  
Index Of Refraction ◽  
Silicon Substrates ◽  
Atom Fraction ◽  
Ion Beam Assisted Deposition ◽  
Deposition Parameters ◽  
Nitrogen Ion

ABSTRACTThe annealing behavior of the optical properties of silicon nitride films (Si1-xNx) is described for films fabricated by ion beam assisted deposition. The data are needed for the precise manufacture of optical filters, where the index of refraction must be predicted from deposition parameters and film annealing history.The reflection of homogeneous, amorphous samples deposited on (100) silicon substrates was measured from 500 to 3120 nm. Fits to the interference spectra were obtained over the range 1000 to 3120 nm to obtain the index of refraction vs wavelength as a function of film nitrogen content. Nitrogen atom fraction was varied from.2 to.58 by variation of the incident relative fluxes of nitrogen ion beam current to evaporant silicon flux. The films were annealed in argon at 450 C, 600 C, 750 C, and 1100 C and the measurements repeated. The systematic shifts in index of refraction with annealing temperature are described.

Formation of β-C3N4 grains by nitrogen-ion-beam-assisted deposition

1996 ◽  
Vol 84 (1-3) ◽  
pp. 388-391 ◽  
Author(s):  
X.W. Su ◽  
H.W. Song ◽  
F.Z. Cui ◽  
W.Z. Li ◽  
H.D. Li
Keyword(s):  
Ion Beam ◽  
Ion Beam Assisted Deposition ◽  
Nitrogen Ion
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