scholarly journals Low-Energy Plasma Focus Device as an Electron Beam Source

2014 ◽  
Vol 2014 ◽  
pp. 1-9 ◽  
Author(s):  
Muhammad Zubair Khan ◽  
Yap Seong Ling ◽  
Ibrar Yaqoob ◽  
Nitturi Naresh Kumar ◽  
Lim Lian Kuang ◽  
...  

A low-energy plasma focus device was used as an electron beam source. A technique was developed to simultaneously measure the electron beam intensity and energy. The system was operated in Argon filling at an optimum pressure of 1.7 mbar. A Faraday cup was used together with an array of filtered PIN diodes. The beam-target X-rays were registered through X-ray spectrometry. Copper and lead line radiations were registered upon usage as targets. The maximum electron beam charge and density were estimated to be 0.31 μC and13.5×1016/m3, respectively. The average energy of the electron beam was 500 keV. The high flux of the electron beam can be potentially applicable in material sciences.

1974 ◽  
Vol 18 ◽  
pp. 184-196 ◽  
Author(s):  
R. L. Gullickson ◽  
R. H. Barlett

AbstractThe plasma focus device, a form of linear pinch discharge, produces an intense x-ray and neutron (D2) burst from a magnetically heated dense plasma. Rapidly changing magnetic fields at pinch time generate large axial electric fields which accelerate electrons and ions. In the experiments reported here the x-ray production during the plasma pinch of a 96 kilojoule (at 20 kV) plasma focus device was measured.The purpose of these experiments was to evaluate the energy in accelerated electrons in the plasma focus device and to learn how to enhance these electron hursts. Well focused, megampere electron beams at a few hundred kilovolts, lasting less than 10 nanoseconds have applications in fusionable pellet heating experiments. (1) X-rays were monitored to evaluate these electron bursts using a defocusing bent crystal spectrometer, doubly diffused silicon (PIN) detectors, with Ross filters, thermoluminescent dosimeters (TLDs) with filters, and x-ray pinhole photography.Thermoluminescent dosimeters indicated maximum x-ray yields of 140 joules above 3 keV at 57.3 kilojoules stored energy (16 kV) for a conversion efficiency to x-rays of 0.2%. 40 joules are above 60 keV and 15 joules above 80 keV. The hard x-ray pulse typically rises in 3 ns and frequently has a pulse width less than 10 ns. The low energy x-ray spectrum consists almost entirely of lines from the high Z anode insert, and the high energy spectrum is characteristic of a nonthermal power law distribution with an exponent of 2.2 ± 0.8. Peak hard x-ray production is obtained at 1 torr deuterium in contrast to peak neutron production (3 x 1010) at 5 torr. The addition of argon reduces total x-ray yield and increases the relative fraction of soft x-rays.These measurements suggest that the plasma focus produces 1200 joules of electrons with an average energy of 150 keV, in 10 nanoseconds with a stored energy of 57.3 kilojoules. This is a power of 1.2 × 1011 watts and power density of 1.5 × 1013 watts cm−2.


2013 ◽  
Vol 79 (5) ◽  
pp. 777-782 ◽  
Author(s):  
R. A. BEHBAHANI ◽  
F. M. AGHAMIR

AbstractThe post-pinch generation of electron beam in a low energy Mather-type plasma focus (PF) device has been investigated. A fast-calibrated Rogowski coil was used to monitor the emission of electron beam. A two-channel diode X-ray spectrometer along with suitable filters provided the records of energy spectrum of X-ray radiation. Single time-period emissions of electron beam with duration of 100 to 20 ns were recorded in the high range of the device operating pressure (0.8–2 mbar). However, in the low range regime (0.2–0.8 mbar), occurrence of single spike electron beam with duration of 150 ± 50 ns, as well as multi-emission of electrons with duration of 400 ± 50 ns, was visible. A multi-peak of tube voltage along with multi-time-period radiation of X-rays dominated by copper lines (Cukα and Cukβ) was noticeable in the low-pressure range. The generated electron beam during the post-pinch phase of anomalous resistances is suspected to be the main source of X-ray radiation. This can also be related to the turbulence of the plasma column during the occurrence of anomalous resistances.


2007 ◽  
Vol 16 (2) ◽  
pp. 250-256 ◽  
Author(s):  
T Zhang ◽  
J Lin ◽  
A Patran ◽  
D Wong ◽  
S M Hassan ◽  
...  

1997 ◽  
Vol 25 (3) ◽  
pp. 455-459 ◽  
Author(s):  
H. Kelly ◽  
A. Lepone ◽  
A. Marquez

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