scholarly journals A Comparison of Modifications Induced by Li3+and Ag14+Ion Beam in Spectroscopic Properties of Bismuth Alumino-Borosilicate Glass Thin Films

2013 ◽  
Vol 2013 ◽  
pp. 1-11 ◽  
Author(s):  
Ravneet Kaur ◽  
Surinder Singh ◽  
Om Prakash Pandey
Keyword(s):  
Thin Films ◽  
Borosilicate Glass ◽  
Ion Irradiation ◽  
Ion Beam ◽  
Glass Network ◽  
Spectroscopic Properties ◽  
Optical Parameters ◽  
Spectroscopic Techniques ◽  
Structural And Optical Properties ◽  
Before And After

Ion irradiation effects on the glass network and structural units have been studied by irradiating borosilicate glass thin film samples with 50 MeV Li3+and 180 MeV Ag14+swift heavy ions (SHI) at different fluence rates ranging from 1012 ions/cm2to 1014 ions/cm2. Glass of the composition (65-x) Bi2O3-10Al2O3-(65-y) B2O3-25SiO2(x= 45, 40;y= 20, 25) has been prepared by melt quench technique. To study the effects of ionizing radiation, the glass thin films have been prepared from these glasses and characterized using XRD, FTIR, and UV-Vis spectroscopic techniques. IR spectra are used to study the structural arrangements in the glass before and after irradiation. The values of optical band gap, Urbach energy, and refractive index have been calculated from the UV-Vis measurements. The variation in optical parameters with increasing Bi2O3content has been analyzed and discussed in terms of changes occurring in the glass network. A comparative study of the influence of Li3+ion beam on structural and optical properties of the either glass system with Ag14+ion is done. The results have been explained in the light of the interaction that SHI undergo on entering the material.

Correlation between changes in nanoscale structural and optical properties upon swift heavy ion irradiation of SiNx thin films

2021 ◽  
Vol 129 (3) ◽  
pp. 035108
Author(s):  
Harsh Gupta ◽  
Ravi K. Bommali ◽  
Santanu Ghosh ◽  
Himanshu Srivastava ◽  
Arvind Srivastava ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Ion Irradiation ◽  
Heavy Ion ◽  
Structural And Optical Properties ◽  
Swift Heavy Ion Irradiation ◽  
Heavy Ion Irradiation ◽  
Swift Heavy Ion

Effects of MeV Si Ions Modification on the Thermoelectric Properties of SiO2/SiO2+Cu Multilayer Thin Films

2010 ◽  
Vol 1267 ◽  
Author(s):  
John Chacha ◽  
S. Budak ◽  
Cydale Smith ◽  
Marcus Pugh ◽  
Kudus Ogbara ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Conductivity ◽  
Electrical Conductivity ◽  
Seebeck Coefficient ◽  
Ion Beam ◽  
Absolute Temperature ◽  
Conductivity Increase ◽  
Before And After ◽  
The Cross ◽  
Thermoelectric Thin Films

AbstractThe performance of the thermoelectric materials and devices is shown by a dimensionless figure of merit, ZT = S2σT/K, where S is the Seebeck coefficient, σ is the electrical conductivity, T is the absolute temperature and K is the thermal conductivity. ZT can be increased by increasing S, increasing σ, or decreasing K. We have prepared 100 alternating multi-nano layer of SiO2/SiO2+Cu superlattice films using the ion beam assisted deposition (IBAD). The 5 MeV Si ions bombardments have been performed at the different fluences using the AAMU Pelletron ion beam accelerator to make quantum clusters in the multi-layer superlattice thin films to decrease the cross plane thermal conductivity increase the cross plane Seebeck coefficient and cross plane electrical conductivity. To characterize the thermoelectric thin films before and after Si ion bombardments we have measured the cross-plane Seebeck coefficient, the cross-plane electrical conductivity, and the cross-plane thermal conductivity for different fluences.

Effect of oxygen partial pressure on the structural and optical properties of ion beam sputtered TiO2 thin films

2016 ◽  
Vol 619 ◽  
pp. 86-90 ◽  
Author(s):  
Firdous A. Tantray ◽  
Arpana Agrawal ◽  
Mukul Gupta ◽  
Joseph T. Andrews ◽  
Pratima Sen
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Ion Beam ◽  
Structural And Optical Properties ◽  
Tio2 Thin Films ◽  
Effect Of Oxygen

Nitrogen‐ion irradiation during the deposition of C1−xNx thin films by ion beam sputtering technique

1996 ◽  
Vol 14 (3) ◽  
pp. 777-780 ◽  
Author(s):  
Satoshi Kobayashi ◽  
Keiko Miyazaki ◽  
Shinji Nozaki ◽  
Hiroshi Morisaki ◽  
Shigeo Fukui ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Irradiation ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Nitrogen Ion

scholarly journals Microstructural and plasmonic modifications in Ag–TiO2 and Au–TiO2 nanocomposites through ion beam irradiation

2014 ◽  
Vol 5 ◽  
pp. 1419-1431 ◽  
Author(s):  
Venkata Sai Kiran Chakravadhanula ◽  
Yogendra Kumar Mishra ◽  
Venkata Girish Kotnur ◽  
Devesh Kumar Avasthi ◽  
Thomas Strunskus ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Nanocomposite Films ◽  
Beam Irradiation ◽  
Ion Beam Irradiation ◽  
Structural Modifications ◽  
Transmission Electron ◽  
Nanocomposite Thin Films ◽  
Before And After ◽  
Metal Volume

The development of new fabrication techniques of plasmonic nanocomposites with specific properties is an ongoing issue in the plasmonic and nanophotonics community. In this paper we report detailed investigations on the modifications of the microstructural and plasmonic properties of metal–titania nanocomposite films induced by swift heavy ions. Au–TiO2 and Ag–TiO2 nanocomposite thin films with varying metal volume fractions were deposited by co-sputtering and were subsequently irradiated by 100 MeV Ag8+ ions at various ion fluences. The morphology of these nanocomposite thin films before and after ion beam irradiation has been investigated in detail by transmission electron microscopy studies, which showed interesting changes in the titania matrix. Additionally, interesting modifications in the plasmonic absorption behavior for both Au–TiO2 and Ag–TiO2 nanocomposites were observed, which have been discussed in terms of ion beam induced growth of nanoparticles and structural modifications in the titania matrix.

Study of Swift Heavy Ion Irradiation Induced Nanophases of TiO2

2013 ◽  
Vol 24 ◽  
pp. 133-139 ◽  
Author(s):  
Madhavi Thakurdesai ◽  
A. Mahadkar ◽  
Varsha Bhattacharyya
Keyword(s):  
Thin Films ◽  
Ion Irradiation ◽  
Ion Beam ◽  
Heavy Ion ◽  
High Energy ◽  
X Ray Diffraction ◽  
Force Microscopy ◽  
Atomic Force ◽  
Transmission Electron ◽  
Non Equilibrium

Ion beam irradiation is a unique non-equilibrium technique for phase formation and material modification. Localized rise in temperature and ultra fast (~1012 s) dissipations of impinging energy make it an attractive tool for nanostructure synthesize. Dense electronic excitation induced spatial and temporal confinement of high energy in a narrow dimension leads the system to a highly non-equilibrium state and the system then relaxes dynamically inducing nucleation of nanocrystals along the latent track. In the present investigation, amorphous thin films of TiO2 are irradiated by 100 MeV Ag ion beam. These irradiated thin films are characterized by Atomic Force Microscopy (AFM), Glancing Angle X-ray Diffraction (GAXRD), Transmission Electron Microscopy (TEM) and UV-VIS absorption spectroscopy. AFM and TEM studies indicate formation of circular nanoparticles of size 10±2 nm in a film irradiated at a fluence of 1×1012 ions.cm-2. Nanophase formation is also inferred from the blueshift observed in UV-VIS absorption band edge.

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