scholarly journals Epitaxial Growth of Germanium on Silicon for Light Emitters

2012 ◽  
Vol 2012 ◽  
pp. 1-8 ◽  
Author(s):  
Chengzhao Chen ◽  
Cheng Li ◽  
Shihao Huang ◽  
Yuanyu Zheng ◽  
Hongkai Lai ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Near Infrared ◽  
Lattice Mismatch ◽  
Chemical Vapor ◽  
Sige Layer ◽  
Infrared Light ◽  
Multiple Quantum ◽  
Light Emitters ◽  
Large Lattice ◽  
Large Lattice Mismatch

This paper describes the role of Ge as an enabler for light emitters on a Si platform. In spite of the large lattice mismatch of ~4.2% between Ge and Si, high-quality Ge layers can be epitaxially grown on Si by ultrahigh-vacuum chemical vapor deposition. Applications of the Ge layers to near-infrared light emitters with various structures are reviewed, including the tensile-strained Ge epilayer, the Ge epilayer with a delta-doping SiGe layer, and the Ge/SiGe multiple quantum wells on Si. The fundamentals of photoluminescence physics in the different Ge structures are discussed briefly.

Highly Mismatched Hetero-Epitaxial Growth of Cubic Sic on Si

1987 ◽  
Vol 97 ◽  
Author(s):  
Hiroyuki Matsunami
Keyword(s):  
Epitaxial Growth ◽  
Lattice Mismatch ◽  
Electronic Devices ◽  
Chemical Vapor ◽  
Buffer Layers ◽  
Optimum Conditions ◽  
Large Lattice ◽  
Impurity Doping ◽  
Large Lattice Mismatch

ABSTRACTSingle crystals of cubic SiC were hetero-epitaxially grown on Si by chemical vapor deposition (CVD) method. A carbonized buffer layer on Si is utilized to overcome the large lattice mismatch of 20 %. Optimum conditions to make the buffer layers and those structures are discussed. Crystal quality of the CVD grown cubic SiC is analyzed by using X-ray analyses and microscopic observations. Electrical properties controlled by impurity doping during epitaxial growth are described together with fundamental electronic devices.

Effect of Interdiffusion on the Subbands in an In0.65Gs0.35As/GaAs Multiple-quantum well Structure on GaAs Substrate at 1.55μm Operation Wavelength

1995 ◽  
Vol 417 ◽  
Author(s):  
M. C. Y. Chan ◽  
E. Herbert Li ◽  
K. S. Chan
Keyword(s):  
Quantum Well ◽  
Fiber Optics ◽  
Gaas Substrate ◽  
Lattice Mismatch ◽  
Multiple Quantum Well ◽  
Composition Profile ◽  
Device Performance ◽  
Multiple Quantum ◽  
Large Lattice ◽  
Large Lattice Mismatch

AbstractAnalysis of high indium concentration in interdiffused In0.65Gs0.35As/GaAs multiple quantum well (MQW) structure on GaAs Substrate is being studied. This material can achieve operating wavelengths around 1.5gtm Ifor applications in fiber optics communications. The large lattice mismatch problem (over 4.5% in this study) can be solved by using a linearly-graded InGaAs buffer layer for reducing any dislocation between the adjacent layers. Interdiffusion in the MQW structure can modify the composition profile in order to tailor the optical absorption and refraction properties. Results show that this system can have promising device performance operates at around 1.55μm and which base on the more matured and reliable GaAs technology.

GaAsN Alloys and GaN/GaAs Double-Hetero Structures

1995 ◽  
Vol 395 ◽  
Author(s):  
Michio Sato
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Lattice Mismatch ◽  
Chemical Vapor ◽  
Ternary Alloys ◽  
Large Lattice ◽  
Large Lattice Mismatch ◽  
The One ◽  
Metalorganic Chemical

ABSTRACTTernary alloys; GaAsN (N<3%) were grown by plasma-assisted metalorganic chemical vapor deposition using triethylgallium, AsH3, and plasma-cracked NH3 or N2 as the precursors. More N atoms were incorporated into the alloys from N2 than NH3 at constant N/As ratios. Both photoluminescence peaks and optical absorption edges were redshifted from GaAs bandgap with increasing the N content, indicating the GaAsN alloys have narrower bandgaps than GaAs.GaN/GaAs double-hetero structures were grown by exposing GaAs surfaces to N-radical flux to replace surface As atoms by N atoms, and by growing GaAs on the thin GaN layers. When the GaN thickness exceeded one-monolayer, the GaN/GaAs interfaces and the GaAs cap layers deteriorated drastically. The one-monolayer-thick GaN embedded in GaAs attracts electrons and shows intense photoluminescence, whereas the GaN cluster is non-radiative, probably because of the defects caused by the large lattice-mismatch between GaN and GaAs.

scholarly journals Self-formed compositional superlattices triggered by cation orderings in m-plane Al1−xInxN on GaN

2020 ◽  
Vol 10 (1) ◽  
Author(s):  
Shigefusa F. Chichibu ◽  
Kohei Shima ◽  
Kazunobu Kojima ◽  
Yoshihiro Kangawa
Keyword(s):  
Near Infrared ◽  
Lattice Mismatch ◽  
Infrared Light ◽  
Light Emitters ◽  
Light Emitting ◽  
Spatially Resolved ◽  
Deep Ultraviolet ◽  
White Light Emitting Diodes ◽  
Step Flow Growth ◽  
Self Formation

Abstract Immiscible semiconductors are of premier importance since the source of lighting has been replaced by white light-emitting-diodes (LEDs) composed of thermodynamically immiscible InxGa1−xN blue LEDs and yellow phosphors. For realizing versatile deep-ultraviolet to near-infrared light-emitters, Al1−xInxN alloys are one of the desirable candidates. Here we exemplify the appearance and self-formation sequence of compositional superlattices in compressively strained m-plane Al1−xInxN films. On each terrace of atomically-flat m-plane GaN, In- and Al-species diffuse toward a monolayer (ML) step edge, and the first and second uppermost < $$\stackrel{-}{1}\stackrel{-}{1}20$$ 1 - 1 - 20 > cation-rows are preferentially occupied by Al and In atoms, respectively, because the configuration of one In-N and two Al-N bonds is more stable than that of one Al-N and two In-N bonds. Subsequent coverage by next < $$\stackrel{-}{1}\stackrel{-}{1}20$$ 1 - 1 - 20 > Al-row buries the < $$\stackrel{-}{1}\stackrel{-}{1}20$$ 1 - 1 - 20 > In-row, producing nearly Al0.5In0.5N cation-stripe ordering along [0001]-axis on GaN. At the second Al0.72In0.28N layer, this ordinality suddenly lessens but In-rich and In-poor < $$\stackrel{-}{1}\stackrel{-}{1}20$$ 1 - 1 - 20 >-rows are alternately formed, which grow into respective {0001}-planes. Simultaneously, approximately 5-nm-period Al0.70In0.30N/Al0.74In0.26N ordering is formed to mitigate the lattice mismatch along [0001], which grow into approximately 5-nm-period Al0.70In0.30N/Al0.74In0.26N {$$10\stackrel{-}{1}2$$ 10 1 - 2 } superlattices as step-flow growth progresses. Spatially resolved cathodoluminescence spectra identify the emissions from particular structures.

scholarly journals Investigations on the Optical Properties of InGaN/GaN Multiple Quantum Wells with Varying GaN Cap Layer Thickness

2020 ◽  
Vol 15 (1) ◽  
Author(s):  
Xiaowei Wang ◽  
Feng Liang ◽  
Degang Zhao ◽  
Zongshun Liu ◽  
Jianjun Zhu ◽  
...  
Keyword(s):  
Optical Properties ◽  
Quantum Wells ◽  
Layer Thickness ◽  
Stark Effect ◽  
Chemical Vapor ◽  
Multiple Quantum ◽  
Three Samples ◽  
Measurement Results ◽  
Cap Layer ◽  
The Difference

Abstract Three InGaN/GaN MQWs samples with varying GaN cap layer thickness were grown by metalorganic chemical vapor deposition (MOCVD) to investigate the optical properties. We found that a thicker cap layer is more effective in preventing the evaporation of the In composition in the InGaN quantum well layer. Furthermore, the quantum-confined Stark effect (QCSE) is enhanced with increasing the thickness of GaN cap layer. In addition, compared with the electroluminescence measurement results, we focus on the difference of localization states and defects in three samples induced by various cap thickness to explain the anomalies in room temperature photoluminescence measurements. We found that too thin GaN cap layer will exacerbates the inhomogeneity of localization states in InGaN QW layer, and too thick GaN cap layer will generate more defects in GaN cap layer.

scholarly journals Enhanced luminescence/photodetecting bifunctional devices based on ZnO:Ga microwire/p-Si heterojunction by incorporating Ag nanowires

2021 ◽  
Author(s):  
Mingming Jiang ◽  
Yang Liu ◽  
Ruiming Dai ◽  
Kai Tang ◽  
Peng Wan ◽  
...  
Keyword(s):  
Band Gap ◽  
Carrier Mobility ◽  
Lattice Mismatch ◽  
Semiconductor Materials ◽  
Large Lattice ◽  
Ag Nanowires ◽  
Large Lattice Mismatch ◽  
Enhanced Luminescence ◽  
Indirect Band Gap

Suffering from the indirect band gap, low carrier mobility, and large lattice mismatch with other semiconductor materials, one of the current challenges in Si-based materials and structures is to prepare...

Blue Shifting of Hydrogenated Silicon Carbide Multiple Quantum Wells

2011 ◽  
Vol 480-481 ◽  
pp. 629-633
Author(s):  
Wen Teng Chang ◽  
Yu Ting Chen ◽  
Chung Chin Kuo
Keyword(s):  
Silicon Carbide ◽  
Quantum Wells ◽  
Quantum Confinement Effect ◽  
Chemical Vapor ◽  
Blue Shift ◽  
Multiple Quantum Wells ◽  
Multiple Quantum ◽  
Plasma Chemical ◽  
Hydrogenated Silicon ◽  
Plasma Chemical Vapor Deposition

Five-period hydrogenated silicon carbide (SiC) multiple quantum wells with silicon dioxide (SiO2) or silicon nitride (SiN) dielectric that were synthesized by high density plasma chemical vapor deposition were studied using photoluminescence (PL) spectroscopy to understand its blue shift. Rapid thermal annealing induced significant blue shifting in the PL spectra after fluorine ion implantation due to crystallization. The thinning of the SiC causes blue shift due to the quantum confinement effect. The higher PL intensity of the amorphous SiC:H in SiO2 than in SiC/SiN may be attributed to the high number of non-radiative sites on its surface. Annealing with nitrogen may cause impurities in SiC/SiO2, thereby broadening the PL peak.

UV Emission Mechanisms in Quaternary AlInGaN Epilayers and Multiple Quantum Wells

2002 ◽  
Vol 722 ◽  
Author(s):  
Mee-Yi Ryu ◽  
C. Q. Chen ◽  
E. Kuokstis ◽  
J. W. Yang ◽  
G. Simin ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Light Emitting Diode ◽  
Chemical Vapor ◽  
Excitation Power ◽  
Multiple Quantum Wells ◽  
Multiple Quantum ◽  
Excitation Power Density ◽  
Light Emitting ◽  
Uv Emission ◽  
Alloy Disorder

AbstractWe present the results on investigation and analysis of photoluminescence (PL) dynamics of quaternary AlInGaN epilayers and AlInGaN/AlInGaN multiple quantum wells (MQWs) grown by a novel pulsed metalorganic chemical vapor deposition (PMOCVD). The emission peaks in both AlInGaN epilayers and MQWs show a blueshift with increasing excitation power density. The PL emission of quaternary samples is attributed to recombination of carriers/excitons localized at band-tail states. The PL decay time increases with decreasing emission photon energy, which is a characteristic of localized carrier/exciton recombination due to alloy disorder. The obtained properties of AlInGaN materials grown by a PMOCVD are similar to those of InGaN. This indicates that the AlInGaN system is promising for ultraviolet applications such as the InGaN system for blue light emitting diode and laser diode applications.

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