Non-Equilibrium Hole Transport in Deep Sub-Micron
Well-Tempered Si p-MOSFETs
Keyword(s):
As MOSFETs are scaled to deep submicron dimensions non-equilibrium, near ballistic, transport in p-MOSFETs becomes important. Recent experimental data indicates that as MOSFETs are scaled the performance gap between n and p-channel shrinks. Nonequilibrium transport effects and performance potentials of ‘Well Tempered’ Si p- MOSFETs with gate lengths of 50 and 25 nm are studied. Monte Carlo and calibrated Drift Diffusion simulations of these devices provide a quantitative estimate of the importance and the influence of non-equilibrium transport on submicron device performance. A possible explanation for the closing performance gap between n- and p-channel MOSFETs is offered.
2021 ◽
Vol ahead-of-print
(ahead-of-print)
◽
2015 ◽
Vol 3
(43)
◽
pp. 21537-21544
◽
2012 ◽
Vol 59
(1)
◽
pp. 206-211
◽