scholarly journals Monte Carlo Simulation of Non-Local Transport Effects in Strained Si on Relaxed Si1 – xGex Heterostructures

VLSI Design ◽  
1998 ◽  
Vol 8 (1-4) ◽  
pp. 253-256
Author(s):  
F. Gámiz ◽  
J. B. Roldán ◽  
J. A. López-Villanueva
Keyword(s):  
Monte Carlo ◽  
Performance Enhancement ◽  
Deep Submicron ◽  
Strained Si ◽  
Electron Transport Properties ◽  
Transport Effects ◽  
Non Local ◽  
Local Transport ◽  
Monte Carlo Simulator ◽  
The Impact

Electron transport properties of strained-Si on relaxed Si1 – xGex channel MOSFETs have been studied using a Monte Carlo simulator. The steady- and non-steady-state high-longitudinal field transport regimes have been described in detail. Electronvelocity- overshoot effects are studied in deep-submicron strained-Si MOSFETs, where they show an improvement over the performance of their normal silicon counterparts. The impact of the Si layer strain on the performance enhancement are described in depth in terms of microscopic magnitudes.

MONTE-CARLO SIMULATION OF ULTRA-THIN FILM SILICON-ON-INSULATOR MOSFETs

2013 ◽  
Vol 22 (01) ◽  
pp. 1350001
Author(s):  
FRANCISCO GÁMIZ ◽  
CARLOS SAMPEDRO ◽  
LUCA DONETTI ◽  
ANDRES GODOY
Keyword(s):  
Monte Carlo ◽  
Ground Plane ◽  
Silicon On Insulator ◽  
Slab Thickness ◽  
Short Channel ◽  
Fully Depleted ◽  
Ensemble Monte Carlo ◽  
Soi Devices ◽  
Monte Carlo Simulator ◽  
The Impact

State-of-the-Art devices are approaching to the performance limit of traditional MOSFET as the critical dimensions are shrunk. Ultrathin fully depleted Silicon-on-Insulator transistors and multi-gate devices based on SOI technology are the best candidates to become a standard solution to overcome the problems arising from such aggressive scaling. Moreover, the flexibility of SOI wafers and processes allows the use of different channel materials, substrate orientations and layer thicknesses to enhance the performance of CMOS circuits. From the point of view of simulation, these devices pose a significant challenge. Simulations tools have to include quantum effects in the whole structure to correctly describe the behavior of these devices. The Multi-Subband Monte Carlo (MSB-MC) approach constitutes today's most accurate method for the study of nanodevices with important applications to SOI devices. After reviewing the main basis of MSB-MC method, we have applied it to answer important questions which remain open regarding ultimate SOI devices. In the first part of the chapter we present a thorough study of the impact of different Buried OXide (BOX) configurations on the scaling of extremely thin fully depleted SOI devices using a Multi-Subband Ensemble Monte Carlo simulator (MS-EMC). Standard thick BOX, ultra thin BOX (UTBOX) and UTBOX with ground plane (UTBOX+GP) solutions have been considered in order to check their influence on short channel effects (SCEs). The simulations show that the main limiting factor for downscaling is the DIBL and the UTBOX+GP configuration is the only valid one to downscale SGSOI transistors beyond 20 nm channel length keeping the silicon slab thickness above the theoretical limit of 5 nm, where thickness variability and mobility reduction would play an important role. In the second part, we have used the multisubband Ensemble Monte Carlo simulator to study the electron transport in ultrashort DGSOI devices with different confinement and transport directions. Our simulation results show that transport effective mass, and subband redistribution are the main factors that affect drift and scattering processes and, therefore, the general performance of DGSOI devices when orientation is changed

scholarly journals Monte Carlo Simulation of a Submicron MOSFET Including Inversion Layer Quantization

VLSI Design ◽  
1998 ◽  
Vol 6 (1-4) ◽  
pp. 287-290
Author(s):  
J. B. Roldan ◽  
F. Gamiz ◽  
J. A. Lopez-Villanueva ◽  
J. E. Carceller
Keyword(s):  
Monte Carlo ◽  
Inversion Layer ◽  
Channel Length ◽  
Electron Velocity ◽  
Normal Operation ◽  
Electron Dynamics ◽  
Drift Diffusion ◽  
Operation Conditions ◽  
Non Local ◽  
Monte Carlo Simulator

A Monte Carlo simulator of the electron dynamics in the channel, coupled with a solution of the two-dimensional Poisson equation including inversion-layer quantization and drift-diffusion equations has been developed. This simulator has been applied to the study of electron transport in normal operation conditions for different submicron channel length devices. Some interesting non-local effects such as electron velocity overshoot can be observed.

scholarly journals A β-SiC MOSFET Monte Carlo Simulator Including Inversion Layer Quantization

VLSI Design ◽  
1998 ◽  
Vol 8 (1-4) ◽  
pp. 257-260 ◽  
Author(s):  
F. Gámiz ◽  
J. B. Roldán ◽  
J. A. López-Villanueva
Keyword(s):  
Monte Carlo ◽  
Phonon Scattering ◽  
Inversion Layer ◽  
Relaxation Times ◽  
Electron Velocity ◽  
Saturation Velocity ◽  
Electron Transport Properties ◽  
Effective Electric Field ◽  
Monte Carlo Simulator ◽  
Energy And Momentum

Electron transport properties in SiC quantized inversion layers have been studied by means of a Monte Carlo procedure. It has been observed that the contribution of polaroptical phonon scattering produces a significant influence of the effective-electric field on the high longitudinal field transport regime, this being the main difference of SiC with respect to standard Si inversion layers. The energy- and momentum-relaxation times have been calculated and the results suggest that electron velocity overshoot effects are less important than in Si MOSFETs. The electron mobility is not very different from their silicon counterparts, but the saturation velocity is higher.

A generalized Fick's law to describe non-local transport effects

2001 ◽  
Vol 26 (4) ◽  
pp. 275-279 ◽  
Author(s):  
P. Paradisi ◽  
R. Cesari ◽  
F. Mainardi ◽  
A. Maurizi ◽  
F. Tampieri
Keyword(s):  
Fick’S Law ◽  
Fick's Law ◽  
Transport Effects ◽  
Non Local ◽  
Local Transport
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