X-ray reflectivity and diffraction investigation on TiN/SiNx nanolayered coatings deposited by magnetron sputtering

2007 ◽  
Vol 22 (4) ◽  
pp. 316-318
Author(s):  
Tao An ◽  
Hongwei Tian ◽  
Weitao Zheng
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Multilayer Coatings ◽  
Substrate Bias ◽  
Reactive Magnetron ◽  
Maximum Hardness ◽  
X Ray Diffraction ◽  
Substrate Bias Voltage ◽  
X Ray ◽  
Sharp Interfaces

Polycrystalline TiN/SiNx multilayer coatings were deposited by reactive magnetron sputtering from Ti and Si targets. Interfaces, structures, and mechanical properties of the multilayers were characterized using X-ray reflectivity (XRR), X-ray diffraction (XRD), and nanoindentation analyses. Results showed that substrate bias voltage had a significant influence on the structures and mechanical properties of the multilayer coatings, in which sharp interfaces are responsible for an enhancement of mechanical properties of the multilayer coatings. The maximum hardness occurs at the −80 V coating with the sharpest interface and the strongest [200] preferred orientation.

Microstructure and Mechanical Properties of Cr1-xAlxN Coating

2012 ◽  
Vol 531 ◽  
pp. 3-6
Author(s):  
C.L. Zhong ◽  
L.E. Luo
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Lattice Parameter ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Al Content ◽  
Compound Coating ◽  
Cubic Structure

A series of Cr1-xAlxN coatings were deposited by reactive magnetron sputtering. The content, microstructure and the hardness of the thin films were characterized respectively with energy dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD) and nanoindentor. The effect of Al content on the microstructure and hardness was studied. It was found that Cr1-xAlxN compound coating exhibits a cubic structure with (1 1 1) preferred orientations and that the lattice parameter of Cr1-xAlxN coatings decrease with the increase of Al content. The hardness of Cr1-xAlxN compound coating is higher than that of CrN and increases with the increase of Al content.

Microstructure, Mechanical Properties and Thermal Stability of TiAlN/Si3N4 Nano-Multilayer Films Deposited by Reactive Magnetron Sputtering

2009 ◽  
Vol 79-82 ◽  
pp. 489-492
Author(s):  
Jiang Ling Yue ◽  
Yan Sheng Yin ◽  
Ge Yang Li
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Layer Thickness ◽  
Multilayer Films ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si3n4 Layer ◽  
Superlattice Structure

A series of TiAlN/Si3N4 nano-multilayer films with various Si3N4 layer thicknesses were prepared by reactive magnetron sputtering. These multilayers were then annealed at temperatures ranging from 600 to 900°C in air for 1 hour. The composition, microstructure, and mechanical properties of the films were characterized by energy dispersive x-ray spectroscopy, x-ray diffraction, scanning electron microscopy, and nanoindentation. It reveals that under the template effect of TiAlN layers in multilayers, as-deposited amorphous Si3N4 is crystallized and grows coherently with TiAlN layers when Si3N4 layer thickness is below 0.6 nm. Correspondingly, the hardness and elastic modulus of the multilayers increase significantly. With further increase in the layer thickness, Si3N4 transforms into amorphous, resulting in a decrease of hardness and modulus. The TiAlN/Si3N4 nano-multilayers could retain their superlattice structure even up to 900°C. The small decrease in the hardness of multilayers annealed below 800°C was correlated to the release of compressive stress in multilayers. However, oxidation was found on the surface of multilayers when annealed at 800°C, which resulted in a marked decrease in the hardness of multilayers. The multilayers presented higher hardness as compared with the monolithic TiAlN film.

Microstructure and Mechanical Properties of Chromium Carbide Coatings Deposited by Magnetron Sputtering Technique

2019 ◽  
Vol 397 ◽  
pp. 118-124
Author(s):  
Linda Aissani ◽  
Khaoula Rahmouni ◽  
Laala Guelani ◽  
Mourad Zaabat ◽  
Akram Alhussein
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Structural Properties ◽  
Annealing Temperature ◽  
Diffusion Mechanism ◽  
X Ray Diffraction ◽  
Chromium Carbides ◽  
X Ray ◽  
Mechanical And Structural Properties

From the hard and anti-corrosions coatings, we found the chromium carbides, these components were discovered by large studies; like thin films since years ago. They were pointed a good quality for the protection of steel, because of their thermal and mechanical properties for this reason, it was used in many fields for protection. Plus: their hardness and their important function in mechanical coatings. The aim of this work joins a study of the effect of the thermal treatment on mechanical and structural properties of the Cr/steel system. Thin films were deposited by cathodic magnetron sputtering on the steel substrates of 100C6, contain 1% wt of carbon. Samples were annealing in vacuum temperature interval between 700 to 1000 °C since 45 min, it forms the chromium carbides. Then pieces are characterising by X-ray diffraction, X-ray microanalysis and scanning electron microscopy. Mechanical properties are analysing by Vickers test. The X-ray diffraction analyse point the formation of the Cr7C3, Cr23C6 carbides at 900°C; they transformed to ternary carbides in a highest temperature, but the Cr3C2 doesn’t appear. The X-ray microanalysis shows the diffusion mechanism between the chromium film and the steel sample; from the variation of: Cr, Fe, C, O elements concentration with the change of annealing temperature. The variation of annealing temperature shows a clean improvement in mechanical and structural properties, like the adhesion and the micro-hardness.

Properties of Nanosized Tin Oxide Thin Film Prepared by Reactive Magnetron Sputtering

2007 ◽  
Author(s):  
Xiao Di Liu ◽  
Dacheng Zhang
Keyword(s):  
Magnetron Sputtering ◽  
Quartz Glass ◽  
Tin Oxide ◽  
Reactive Magnetron Sputtering ◽  
Oxide Thin Film ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
Different Temperatures

Nanosized tin oxide thin films were fabricated on silicon and quartz glass substrates by direct current reactive magnetron sputtering method, and then were calcined at different temperatures ranging from 400°C to 900°C. The results analyzed by X ray photoemission spectra (XPS), scanning electron microscope (SEM), Spectroscopic ellipsometer, Powder X-ray diffraction (XRD), and HP4145B semiconductor parameter analyzer measurements show that the sample with quartz glass substrate and calcinated at 650°C possesses better properties and suitable to be used in our gas sensor.

Deposition of aluminum Oxynitride Films by Magnetron Sputtering: Effect of Bombardment and Substrate Heating on Structural and Mechanical Properties

1995 ◽  
Vol 388 ◽  
Author(s):  
Russell V. Smilgys ◽  
Eric Takamura ◽  
Irwin L. Singer ◽  
Steven W. Robey ◽  
Douglas A. Kirkpatrick
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Aluminum Oxynitride ◽  
X Ray Diffraction ◽  
Etch Pits ◽  
X Ray ◽  
Substrate Heating ◽  
Glass Substrates ◽  
Planar Magnetron ◽  
Continuous Indentation

ABSTRACTAluminum oxynitride films, 1 μm thick, are deposited onto glass substrates by planar magnetron sputtering from an alumina target in a mixture of nitrogen and argon. one set of films is deposited onto glass substrates that are heat sunk to a holder, whose temperature is held below 100°C. a second set of films is deposited onto glass substrates that are mechanically clamped to a holder, whose temperature is allowed to rise up to 250°C. Characterization by continuous indentation testing, secondary electron microscopy, and x-ray diffraction reveals significant differences in mechanical properties and surface structure between the two sets of films. Films deposited with holder cooling have a smooth surface and no evidence of crystallinity; films deposited without holder cooling have etch pits on their surface that vary with position across the substrate. the later films show crystallinity and have twice the hardness and a 60% greater elastic modulus.

Microstructural Evolution during Tempering of 16Cr-5Ni Stainless Steel: Effects on Final Mechanical Properties

2013 ◽  
Vol 762 ◽  
pp. 176-182 ◽  
Author(s):  
Massimo De Sanctis ◽  
Renzo Valentini ◽  
Gianfranco Lovicu ◽  
Antonella Dimatteo ◽  
Randa Ishak ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Stainless Steel ◽  
Microstructural Evolution ◽  
Maximum Hardness ◽  
X Ray Diffraction ◽  
Structural Behaviour ◽  
X Ray ◽  
Transmission Electron ◽  
Normative Requirements ◽  
Double Tempering

In this work, the structural behaviour during tempering of two different heats of 16Cr-5Ni supermartensitic stainless steel has been studied by means of dilatometry, transmission electron microscopy and X-ray diffraction. A thermomechanical simulator (Gleeble 3800) has been also used to characterize the effects on final mechanical properties of different tempering temperatures in the range 600 °C to 700 °C and the influence of sub-zero cooling on industrial double tempering treatments. It has been found that the pre-existence of retained austenite in as-quenched conditions can induce significant differences in the microstructural evolution during tempering and on the final mechanical properties of industrial components, thus inducing problems in controlling final maximum hardness allowable by normative requirements.

Investigation on AZO Films Deposited by Radio-Frequency Reactive Magnetron Sputtering

2013 ◽  
Vol 320 ◽  
pp. 35-39
Author(s):  
Cheng Long Kang ◽  
Jin Xiang Deng ◽  
Min Cui ◽  
Chao Man ◽  
Le Kong ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Microscope ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Rf Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Doped Zno ◽  
Scanning Electron

The Al2O3-doped ZnO(AZO) films were deposited on the glasses by means of RF magnetron sputtering technology. The films were characterized by scanning electron microscope (SEM), X-ray diffraction (XRD) and Profile-system respectively. The effect of substrate temperature on the structure of the AZO films is investigated.As a result, the properties of the AZO thin films are remarkably influenced by the substrate temperature , especially in the range of 200°C to 500 °C. The film prepared at the substrate temperature of 400°C possesses the best crystalline.

Synthesis and Characterization of Quaternary Ti-Si-C-N Film Deposited by Middle Frequency Magnetron Sputtering

2012 ◽  
Vol 581-582 ◽  
pp. 540-543
Author(s):  
Jin Long Jiang ◽  
Di Chen ◽  
Wei Jun Zhu
Keyword(s):  
Magnetron Sputtering ◽  
Elastic Recovery ◽  
Amorphous Structure ◽  
Columnar Structure ◽  
Maximum Hardness ◽  
X Ray Diffraction ◽  
X Ray ◽  
Large Particles ◽  
Si Wafer

Quaternary Ti-Si-C-N films were deposited Si wafer by middle frequency magnetron sputtering Ti80Si20 twin-targets in mixture atmosphere of Ar, CH4 and N2. Scanning electron microscopy (SEM) and x-ray diffraction (XRD) results indicate that the films present an amorphous structure with no columnar structure. These films are quite uniform and dense without large particles. The film deposited at 10 sccm CH4 and 10 sccm N2 flow rates exhibits a maximum hardness of 18.9 GPa and high elastic recovery of 97%.

Microstructural and Mechanical Properties of TiAlN and Ti3AlN Films Deposited by Reactive Magnetron Sputtering

2015 ◽  
Vol 816 ◽  
pp. 283-288 ◽  
Author(s):  
Hao Huang ◽  
Zhen Xi Li ◽  
Min Juan Wang ◽  
Chuan Xie
Keyword(s):  
Mechanical Properties ◽  
Residual Stress ◽  
Magnetron Sputtering ◽  
Compressive Stress ◽  
Solid Solubility ◽  
Single Phase ◽  
Reactive Magnetron Sputtering ◽  
Substrate Bias ◽  
Reactive Magnetron ◽  
High Substrate

Two series of TiAlN and Ti3AlN films have been deposited on Si (100) substrates by reactive magnetron sputtering TiAl and Ti3Al targets in Ar/N2 mixture. The effects of incoming ions energies controlled by Vb on the microstructure, morphologies, residual stress and hardness have been explored by XRD, SEM, AFM, surface profiler and nanoindentation. The results showed that single phase cubic Ti-Al-N solid solubility formed by Al atoms replacing some Ti atoms in the cubic TiN lattice occured in both TiAlN and Ti3AlN films. As substrate bias increased, the preferred orientation firstly changed from (111) to (200), and then returned to (111) at higher substrate bias. At the same time, high substrate bias promoted the densification of films and presence of high compressive stress, which is benefit for improvement of hardness.

Substrate Surface Dependence of the Microstructure of μc-Si,Ge:H Deposited by Reactive Magnetron Sputtering (RMS)

1995 ◽  
Vol 405 ◽  
Author(s):  
S. M. Cho ◽  
K. Christensen ◽  
D. Wolfe ◽  
H. Ying ◽  
D. R. Lee ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Substrate Surface ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
X Ray ◽  
Transmission Electron ◽  
Film Microstructure ◽  
Substrate Surfaces

AbstractWe have investigated on the effect of different substrate surfaces in changing the microstructure of μc-SixGe1-x:H films prepared by reactive magnetron sputtering. Films were deposited on hydrogen terminated Si(111), Si(100) surfaces, and surfaces chemical and plasma oxides. The thin film microstructure was characterized by Fourier transform infrared spectroscopy (FTIR), high resolution transmission electron microscopy (HRTEM), X-ray diffraction (XRD), and Raman scattering.

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