Kinetics of Thermal Chemical Vapor Deposition and Microstructures of Carbon Films Using Propane/Ammonia Mixtures

Liang-Hsun Lai; Dan-Yun Wu; Hsiang-Chun Hsueh; Sham-Tsong Shiue

doi:10.1149/2.0051408jss

Kinetics of Thermal Chemical Vapor Deposition and Microstructures of Carbon Films Using Propane/Ammonia Mixtures

ECS Journal of Solid State Science and Technology ◽

10.1149/2.0051408jss ◽

2014 ◽

Vol 3 (8) ◽

pp. M45-M53 ◽

Cited By ~ 1

Author(s):

Liang-Hsun Lai ◽

Dan-Yun Wu ◽

Hsiang-Chun Hsueh ◽

Sham-Tsong Shiue

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Thermal Chemical Vapor Deposition ◽

Kinetics Of

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Kinetics of silicon epitaxy using SiH4in a rapid thermal chemical vapor deposition reactor

Applied Physics Letters ◽

10.1063/1.102719 ◽

1990 ◽

Vol 56 (7) ◽

pp. 629-631 ◽

Cited By ~ 109

Author(s):

M. Liehr ◽

C. M. Greenlief ◽

S. R. Kasi ◽

M. Offenberg

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor ◽

Thermal Chemical Vapor Deposition ◽

Silicon Epitaxy ◽

Kinetics Of

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Patterned Arrays of Vertically Aligned Carbon Nanotube Microelectrodes on Carbon Films Prepared by Thermal Chemical Vapor Deposition

Analytical Chemistry ◽

10.1021/ac801552a ◽

2008 ◽

Vol 80 (22) ◽

pp. 8835-8839 ◽

Cited By ~ 19

Author(s):

Xianming Liu ◽

Keith H. R. Baronian ◽

Alison J. Downard

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Thermal Chemical Vapor Deposition ◽

Vertically Aligned

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Remote Hydrogen Plasma Chemical Vapor Deposition from (Dimethylsilyl)(trimethylsilyl)methane. 1. Kinetics of the Process; Chemical and Morphological Structure of Deposited Silicon−Carbon Films

Chemistry of Materials ◽

10.1021/cm021250c ◽

2003 ◽

Vol 15 (8) ◽

pp. 1749-1756 ◽

Cited By ~ 29

Author(s):

A. M. Wróbel ◽

A. Walkiewicz-Pietrzykowska ◽

J. E. Klemberg-Sapieha ◽

Y. Nakanishi ◽

T. Aoki ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Hydrogen Plasma ◽

Morphological Structure ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Silicon Carbon ◽

Kinetics Of

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Effects of Ethylene/Nitrogen Mixtures on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

Journal of The Electrochemical Society ◽

10.1149/2.083206jes ◽

2012 ◽

Vol 159 (6) ◽

pp. D367-D374 ◽

Cited By ~ 3

Author(s):

Liang-Hsun Lai ◽

Ke-Jie Huang ◽

Sham-Tsong Shiue ◽

Jing-Tang Chang ◽

Ju-Liang He

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Deposition Rates ◽

Thermal Chemical Vapor Deposition

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The effect of substrate size on characteristics of carbon films deposited on glass plate substrates by thermal chemical vapor deposition

physica status solidi (a) ◽

10.1002/pssa.200824496 ◽

2009 ◽

Vol 206 (7) ◽

pp. 1537-1540 ◽

Cited By ~ 1

Author(s):

Po-Yu Chen ◽

Sham-Tsong Shiue ◽

Hung-Yi Lin

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Glass Plate ◽

Chemical Vapor ◽

Carbon Films ◽

Thermal Chemical Vapor Deposition ◽

Substrate Size

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Effects of Ethylene/Ammonia Mixtures on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

ECS Journal of Solid State Science and Technology ◽

10.1149/2.023304jss ◽

2013 ◽

Vol 2 (4) ◽

pp. N80-N88 ◽

Cited By ~ 4

Author(s):

Liang-Hsun Lai ◽

Huei-Cheng Li ◽

Sham-Tsong Shiue ◽

Tsong-Jen Yang ◽

Hung-Yi Lin

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Deposition Rates ◽

Thermal Chemical Vapor Deposition

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Effects of Ammonia Addition on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

Journal of The Electrochemical Society ◽

10.1149/1.3591106 ◽

2011 ◽

Vol 158 (7) ◽

pp. D445 ◽

Cited By ~ 8

Author(s):

Chia-Ya Lin ◽

Liang-Hsun Lai ◽

Yu-Xian Liu ◽

Sham-Tsong Shiue ◽

Hung-Yi Lin

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Deposition Rates ◽

Thermal Chemical Vapor Deposition ◽

Ammonia Addition

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The individual effect of coating thicknesses and deposition temperatures on Raman spectra of carbon films deposited on silica glass fibers by thermal chemical vapor deposition

Journal of the Chinese Institute of Engineers ◽

10.1080/02533839.2009.9671553 ◽

2009 ◽

Vol 32 (5) ◽

pp. 711-715 ◽

Cited By ~ 2

Author(s):

Shin‐Shueh Chen ◽

Sham‐Tsong Shiue ◽

Tsong‐Jen Yang ◽

Kai‐Jen Cheng ◽

Po‐Yu Chen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Raman Spectra ◽

Vapor Deposition ◽

Silica Glass ◽

Glass Fibers ◽

Chemical Vapor ◽

Carbon Films ◽

Individual Effect ◽

Thermal Chemical Vapor Deposition ◽

The Individual

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Effects of Propane/Nitrogen Mixtures on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

ECS Journal of Solid State Science and Technology ◽

10.1149/2.037311jss ◽

2013 ◽

Vol 2 (11) ◽

pp. M44-M51 ◽

Cited By ~ 2

Author(s):

Liang-Hsun Lai ◽

Shao-En Chiou ◽

Hsiang-Chun Hsueh ◽

Sham-Tsong Shiue

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Deposition Rates ◽

Thermal Chemical Vapor Deposition

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The effects of deposition temperatures on the characteristics of nitrogenated carbon films deposited onp‐type silicon substrates by thermal chemical vapor deposition

Journal of the Chinese Institute of Engineers ◽

10.1080/02533839.2010.9671677 ◽

2010 ◽

Vol 33 (6) ◽

pp. 891-897

Author(s):

Chia‐Ya Lin ◽

Sham‐Tsong Shiue

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Silicon Substrates ◽

Thermal Chemical Vapor Deposition ◽

Type Silicon ◽

Nitrogenated Carbon

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