Room Temperature Copper Seed Layer Deposition by Plasma-Enhanced Atomic Layer Deposition

2019 ◽  
Vol 35 (2) ◽  
pp. 125-132 ◽  
Author(s):  
Jiajun Mao ◽  
Eric Eisenbraun ◽  
Vincent Omarjee ◽  
Andrey Korolev ◽  
Christian Dussarrat
Keyword(s):  
Atomic Layer Deposition ◽  
Seed Layer ◽  
Room Temperature ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Copper Seed Layer

Atomic layer deposition of copper nitride film and its application to copper seed layer for electrodeposition

2014 ◽  
Vol 556 ◽  
pp. 434-439 ◽  
Author(s):  
Jae-Min Park ◽  
Kwangseon Jin ◽  
Byeol Han ◽  
Myung Jun Kim ◽  
Jongwan Jung ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Seed Layer ◽  
Atomic Layer ◽  
Nitride Film ◽  
Copper Nitride ◽  
Layer Deposition ◽  
Copper Seed Layer

Copper seed layer using atomic layer deposition for Cu interconnect

2010 ◽  
Author(s):  
Dae-Yong Moon ◽  
Tae-Suk Kwon ◽  
Byung-Woo Kang ◽  
Woong-Sun Kim ◽  
Baek Mann Kim ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Seed Layer ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Cu Interconnect ◽  
Copper Seed Layer

scholarly journals HfS2 thin films deposited at room temperature by an emerging technique, solution atomic layer deposition

2021 ◽  
Author(s):  
Yuanyuan Cao ◽  
Sha Zhu ◽  
Julien Bachmann
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Room Temperature ◽  
Atomic Layer ◽  
Two Dimensional ◽  
Molecular Precursors ◽  
Layer Deposition

The two-dimensional material and semiconducting dichalcogenide hafnium disulfide is deposited at room temperature by atomic layer deposition from molecular precursors dissolved in hexane.

ZnO Schottky Nanodiodes Processed From Plasma-Enhanced Atomic Layer Deposition at Near Room Temperature

2018 ◽  
Vol 65 (10) ◽  
pp. 4513-4519
Author(s):  
Mei Shen ◽  
Triratna P. Muneshwar ◽  
Kenneth C. Cadien ◽  
Ying Yin Tsui ◽  
Douglas W. Barlage
Keyword(s):  
Atomic Layer Deposition ◽  
Room Temperature ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Study on fabrication method of composite oxide by room temperature atomic layer deposition

Impact ◽  
2020 ◽  
Vol 2020 (5) ◽  
pp. 16-18
Author(s):  
Fumihiko Hirose
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Graduate School ◽  
Room Temperature ◽  
Atomic Layer ◽  
Science And Engineering ◽  
Layer Deposition ◽  
Potential Applications ◽  
Properties Of Materials ◽  
Conducting Research

Thin films can be used to improve the surface properties of materials, enhancing elements such as absorption, abrasion resistance and corrosion resistance, for example. These thin films provide the foundation for a variety of applications in various fields and their applications depend on their morphology and stability, which is influenced by how they are deposited. Thin films can be deposited in different ways. One of these is a technology called atomic layer deposition (ALD). Professor Fumihiko Hirose, a scientist based at the Graduate School of Science and Engineering, Yamagata University, Japan, is conducting research on the room temperature ALD of oxide metals. Along with his team, Professor Hirose has developed a new and improved way of performing ALD to create thin films, and the potential applications are endless.

Influence of O(3P)/O2 Flux on the Atomic Layer Deposition of B2O3 Using Trimethyl Borate at Room Temperature

2020 ◽  
Vol 124 (47) ◽  
pp. 25846-25858
Author(s):  
Aparna Pilli ◽  
Veronica Lee ◽  
Jessica Jones ◽  
Natasha Chugh ◽  
Jincheng Du ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Room Temperature ◽  
Atomic Layer ◽  
Trimethyl Borate ◽  
Layer Deposition

Introduction of an Al Seed Layer for Facile Adsorption of MoCl 5 during Atomic Layer Deposition of MoS 2

2020 ◽  
Vol 217 (15) ◽  
pp. 1901042
Author(s):  
Wonsik Ahn ◽  
Hyangsook Lee ◽  
Yeonchoo Cho ◽  
Kyung-Eun Byun ◽  
Hoijoon Kim ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Seed Layer ◽  
Atomic Layer ◽  
Layer Deposition
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