scholarly journals HfS2 thin films deposited at room temperature by an emerging technique, solution atomic layer deposition

2021 ◽  
Author(s):  
Yuanyuan Cao ◽  
Sha Zhu ◽  
Julien Bachmann
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Room Temperature ◽  
Atomic Layer ◽  
Two Dimensional ◽  
Molecular Precursors ◽  
Layer Deposition

The two-dimensional material and semiconducting dichalcogenide hafnium disulfide is deposited at room temperature by atomic layer deposition from molecular precursors dissolved in hexane.

scholarly journals Study on fabrication method of composite oxide by room temperature atomic layer deposition

Impact ◽  
2020 ◽  
Vol 2020 (5) ◽  
pp. 16-18
Author(s):  
Fumihiko Hirose
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Graduate School ◽  
Room Temperature ◽  
Atomic Layer ◽  
Science And Engineering ◽  
Layer Deposition ◽  
Potential Applications ◽  
Properties Of Materials ◽  
Conducting Research

Thin films can be used to improve the surface properties of materials, enhancing elements such as absorption, abrasion resistance and corrosion resistance, for example. These thin films provide the foundation for a variety of applications in various fields and their applications depend on their morphology and stability, which is influenced by how they are deposited. Thin films can be deposited in different ways. One of these is a technology called atomic layer deposition (ALD). Professor Fumihiko Hirose, a scientist based at the Graduate School of Science and Engineering, Yamagata University, Japan, is conducting research on the room temperature ALD of oxide metals. Along with his team, Professor Hirose has developed a new and improved way of performing ALD to create thin films, and the potential applications are endless.

scholarly journals Tuning electronic properties in LaNiO3 thin films by B-site Cu-substitution

2020 ◽  
Vol 8 (36) ◽  
pp. 12662-12668
Author(s):  
Henrik H. Sønsteby ◽  
Erik Skaar ◽  
Jon E. Bratvold ◽  
John W. Freeland ◽  
Angel Yanguas-Gil ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Electronic Properties ◽  
Room Temperature ◽  
Atomic Layer ◽  
Transition Temperatures ◽  
Metal Insulator Transition ◽  
Metal Insulator ◽  
Cu Substitution ◽  
Layer Deposition

Cu-Substitution in LaNiO3 by atomic layer deposition provides films spanning six orders of magnitude in resistivity, with metal insulator transition temperatures from 0 K to room temperature.

A chemisorbed interfacial layer for seeding atomic layer deposition on graphite

Nanoscale ◽  
2021 ◽  
Author(s):  
Anton Brown ◽  
John Greenwood ◽  
César Lockhart de la Rosa ◽  
Miriam Candelaria Rodriguez Gonzalez ◽  
Ken Verguts ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Hybrid Materials ◽  
Interfacial Layer ◽  
Atomic Layer ◽  
Two Dimensional ◽  
Layer Deposition ◽  
Two Dimensional Materials ◽  
Inert Surface

The integration of graphene, and more broadly two-dimensional materials, into devices and hybrid materials often requires the deposition of thin films on their usually inert surface. As a result, strategies...

scholarly journals Electron-enhanced atomic layer deposition of silicon thin films at room temperature

2018 ◽  
Vol 36 (1) ◽  
pp. 01A118 ◽  
Author(s):  
Jaclyn K. Sprenger ◽  
Huaxing Sun ◽  
Andrew S. Cavanagh ◽  
Steven M. George
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Room Temperature ◽  
Atomic Layer ◽  
Silicon Thin Films ◽  
Layer Deposition

Recent Progress in Atomic Layer Deposition of Multifunctional Oxides and Two-Dimensional Transition Metal Dichalcogenides

2016 ◽  
Vol 04 (04) ◽  
pp. 1640010 ◽  
Author(s):  
Hongfei Liu
Keyword(s):  
Thin Films ◽  
Transition Metal ◽  
Atomic Layer Deposition ◽  
Recent Progress ◽  
Transition Metal Dichalcogenides ◽  
Atomic Layer ◽  
Two Dimensional ◽  
Layer Deposition ◽  
Metal Dichalcogenides ◽  
Multifunctional Oxides

Atomic layer deposition (ALD) has long been developed for conformal coating thin films on planar surfaces and complex structured substrates based on its unique sequential process and self-limiting surface chemistry. In general, the coated thin films can be dielectrics, semiconductors, conductors, metals, etc., while the targeted surface can vary from those of particles, wires, to deep pores, through holes, and so on. The ALD coating technique, itself, was developed from gas-phase chemical vapor deposition, but now it has been extended even to liquid phase coating/growth. Because the thickness of ALD growth is controlled in atomic level ([Formula: see text]0.1[Formula: see text]nm), it has recently been employed for producing two-dimensional (2D) materials, typically semiconducting nanosheets of transition metal dichalcogenides (TMDCs). In this paper, we briefly introduce recent progress in ALD of multifunctional oxides and 2D TMDCs with the focus being placed on suitable ALD precursors and their ALD processes (for both binary compounds and ternary alloys), highlighting the remaining challenges and promising potentials.

scholarly journals Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature

2018 ◽  
Vol 36 (1) ◽  
pp. 01A109 ◽  
Author(s):  
Julian Pilz ◽  
Alberto Perrotta ◽  
Paul Christian ◽  
Martin Tazreiter ◽  
Roland Resel ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Material Properties ◽  
Room Temperature ◽  
Atomic Layer ◽  
Zno Thin Films ◽  
Layer Deposition

UV-enhanced atomic layer deposition of ZrO2 thin films at room temperature

2010 ◽  
Vol 518 (22) ◽  
pp. 6432-6436 ◽  
Author(s):  
Byoung H. Lee ◽  
Sangho Cho ◽  
Jae K. Hwang ◽  
Su H. Kim ◽  
Myung M. Sung
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Room Temperature ◽  
Atomic Layer ◽  
Layer Deposition

Electron-Enhanced Atomic Layer Deposition of Boron Nitride Thin Films at Room Temperature and 100 °C

2018 ◽  
Vol 122 (17) ◽  
pp. 9455-9464 ◽  
Author(s):  
Jaclyn K. Sprenger ◽  
Huaxing Sun ◽  
Andrew S. Cavanagh ◽  
Alexana Roshko ◽  
Paul T. Blanchard ◽  
...  
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Atomic Layer Deposition ◽  
Room Temperature ◽  
Atomic Layer ◽  
Layer Deposition

Atomic layer deposition of B2O3 thin films at room temperature

2006 ◽  
Vol 514 (1-2) ◽  
pp. 145-149 ◽  
Author(s):  
Matti Putkonen ◽  
Lauri Niinistö
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Room Temperature ◽  
Atomic Layer ◽  
Layer Deposition
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