Infinite Etch Selectivity during Etching of SiON with an Extreme Ultraviolet Resist Pattern in Dual-Frequency Capacitively Coupled Plasmas

B. S. Kwon; J. S. Kim; N.-E. Lee; S. K. Lee

doi:10.1149/1.3251010

Infinite Etch Selectivity during Etching of SiON with an Extreme Ultraviolet Resist Pattern in Dual-Frequency Capacitively Coupled Plasmas

Journal of The Electrochemical Society ◽

10.1149/1.3251010 ◽

2010 ◽

Vol 157 (1) ◽

pp. D21 ◽

Cited By ~ 1

Author(s):

B. S. Kwon ◽

J. S. Kim ◽

N.-E. Lee ◽

S. K. Lee

Keyword(s):

Extreme Ultraviolet ◽

Dual Frequency ◽

Capacitively Coupled ◽

Coupled Plasmas

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Infinite etch selectivity and line edge roughness variation during etching of silicon oxynitride with an extreme ultraviolet resist pattern in dual-frequency CH2F2∕H2∕Ar capacitively coupled plasmas

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3276701 ◽

2010 ◽

Vol 28 (1) ◽

pp. 120-127 ◽

Cited By ~ 2

Author(s):

B. S. Kwon ◽

J. S. Kim ◽

N.-E. Lee ◽

S. K. Lee

Keyword(s):

Extreme Ultraviolet ◽

Silicon Oxynitride ◽

Dual Frequency ◽

Line Edge Roughness ◽

Capacitively Coupled ◽

Edge Roughness ◽

Coupled Plasmas

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Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4906819 ◽

2015 ◽

Vol 33 (2) ◽

pp. 021310 ◽

Cited By ~ 2

Author(s):

Yu-Ru Zhang ◽

Stefan Tinck ◽

Peter De Schepper ◽

You-Nian Wang ◽

Annemie Bogaerts

Keyword(s):

Experimental Investigation ◽

Single Frequency ◽

Dual Frequency ◽

Capacitively Coupled ◽

Frequency Regime ◽

Coupled Plasmas

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Modification of Semianalytical Finite Element Model for Radio Frequency Sheaths in Single- and Dual-Frequency Capacitively Coupled Plasmas: II. Effects of Nonuniform Bulk Plasma Density and Charging at Dielectric Surface

Japanese Journal of Applied Physics ◽

10.7567/jjap.50.036001 ◽

2011 ◽

Vol 50 (3R) ◽

pp. 036001 ◽

Cited By ~ 2

Author(s):

Kazuki Denpoh ◽

Tatsuru Shirafuji

Keyword(s):

Finite Element ◽

Finite Element Model ◽

Radio Frequency ◽

Plasma Density ◽

Element Model ◽

Dielectric Surface ◽

Dual Frequency ◽

Capacitively Coupled ◽

Coupled Plasmas ◽

Bulk Plasma

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Control of ion energy and angular distributions in dual-frequency capacitively coupled plasmas through power ratios and phase: Consequences on etch profiles

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4915248 ◽

2015 ◽

Vol 33 (3) ◽

pp. 031302 ◽

Cited By ~ 19

Author(s):

Yiting Zhang ◽

Mark J. Kushner ◽

Saravanapriyan Sriraman ◽

Alexei Marakhtanov ◽

John Holland ◽

...

Keyword(s):

Angular Distributions ◽

Dual Frequency ◽

Ion Energy ◽

Capacitively Coupled ◽

Energy And Angular Distributions ◽

Coupled Plasmas

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Phase modulation in pulsed dual-frequency capacitively coupled plasmas

Journal of Applied Physics ◽

10.1063/1.4884225 ◽

2014 ◽

Vol 115 (23) ◽

pp. 233303 ◽

Cited By ~ 9

Author(s):

De-Qi Wen ◽

Quan-Zhi Zhang ◽

Wei Jiang ◽

Yuan-Hong Song ◽

Annemie Bogaerts ◽

...

Keyword(s):

Phase Modulation ◽

Dual Frequency ◽

Capacitively Coupled ◽

Coupled Plasmas

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The effect of realistic heavy particle induced secondary electron emission coefficients on the electron power absorption dynamics in single- and dual-frequency capacitively coupled plasmas

Plasma Sources Science and Technology ◽

10.1088/1361-6595/aa7c88 ◽

2017 ◽

Vol 26 (8) ◽

pp. 085006 ◽

Cited By ~ 24

Author(s):

M Daksha ◽

A Derzsi ◽

S Wilczek ◽

J Trieschmann ◽

T Mussenbrock ◽

...

Keyword(s):

Electron Emission ◽

Secondary Electron ◽

Heavy Particle ◽

Secondary Electron Emission ◽

Dual Frequency ◽

Power Absorption ◽

Capacitively Coupled ◽

Coupled Plasmas

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Modification of Semianalytical Finite Element Model for Radio Frequency Sheaths in Single- and Dual-Frequency Capacitively Coupled Plasmas: II. Effects of Nonuniform Bulk Plasma Density and Charging at Dielectric Surface

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.036001 ◽

2011 ◽

Vol 50 ◽

pp. 036001 ◽

Cited By ~ 1

Author(s):

Kazuki Denpoh ◽

Tatsuru Shirafuji

Keyword(s):

Finite Element ◽

Finite Element Model ◽

Radio Frequency ◽

Plasma Density ◽

Element Model ◽

Dielectric Surface ◽

Dual Frequency ◽

Capacitively Coupled ◽

Coupled Plasmas ◽

Bulk Plasma

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Sheath Model for Dual-Frequency Capacitively Coupled Plasmas

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.5533 ◽

2004 ◽

Vol 43 (8A) ◽

pp. 5533-5539 ◽

Cited By ~ 16

Author(s):

Kazuki Denpoh ◽

Go Wakayama ◽

Kenichi Nanbu

Keyword(s):

Dual Frequency ◽

Capacitively Coupled ◽

Coupled Plasmas

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Electrical properties improvement of high-k HfO2 films by combination of C4F8 dual-frequency capacitively coupled plasmas treatment with thermal annealing

Applied Surface Science ◽

10.1016/j.apsusc.2014.05.021 ◽

2014 ◽

Vol 311 ◽

pp. 117-123 ◽

Cited By ~ 2

Author(s):

H.Y. Zhang ◽

C. Ye ◽

C.G. Jin ◽

M.Z. Wu ◽

Y.Y. Wang ◽

...

Keyword(s):

Electrical Properties ◽

Thermal Annealing ◽

Dual Frequency ◽

Capacitively Coupled ◽

High K ◽

Coupled Plasmas

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Space and phase resolved ion energy and angular distributions in single- and dual-frequency capacitively coupled plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4822100 ◽

2013 ◽

Vol 31 (6) ◽

pp. 061311 ◽

Cited By ~ 12

Author(s):

Yiting Zhang ◽

Mark J. Kushner ◽

Nathaniel Moore ◽

Patrick Pribyl ◽

Walter Gekelman

Keyword(s):

Angular Distributions ◽

Dual Frequency ◽

Ion Energy ◽

Capacitively Coupled ◽

Energy And Angular Distributions ◽

Coupled Plasmas

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