Control of ion energy and angular distributions in dual-frequency capacitively coupled plasmas through power ratios and phase: Consequences on etch profiles

2015 ◽  
Vol 33 (3) ◽  
pp. 031302 ◽  
Author(s):  
Yiting Zhang ◽  
Mark J. Kushner ◽  
Saravanapriyan Sriraman ◽  
Alexei Marakhtanov ◽  
John Holland ◽  
...  
Sign in / Sign up

Export Citation Format

Share Document