Observation of Impurity Redistribution During Thermal Oxidation of Silicon Using the MOS Structure
1965 ◽
Vol 112
(3)
◽
pp. 308
◽
1967 ◽
Vol 114
(12)
◽
pp. 1297
◽
1982 ◽
Vol 21
(Part 1, No. 4)
◽
pp. 579-585
◽
1960 ◽
Vol 39
(4)
◽
pp. 933-946
◽
Keyword(s):
Keyword(s):
1974 ◽
Vol 121
(4)
◽
pp. 588
◽
2020 ◽
Vol 21
(5)
◽
pp. 385-389